Methods of filtering a feed comprising a liquid or a gas for or during the production of electronics, nanosystems or ultrapure water include filtering said feed using at least one filter assembly, wherein said at least one filter assembly includes at least one isoporous block copolymer filtration membrane.

A substrate treating apparatus includes a plurality of solution treating units for performing solution treatment of substrates, and a plurality of individual gas supply devices provided to correspond individually to the solution treating units, each for supplying gas at a variable rate only to one of the solution treating units. The solution treating units perform the solution treatment by supplying treating solutions to the substrates. The individual gas supply devices supply gas only to the solution treating units corresponding thereto. The individual gas supply devices supply the gas at adjustable rates to the solution treating units. The rate of gas supply to the solution treating units can therefore be varied for each solution treating unit.

The present disclosure is directed to a thermal developing assembly that is configured to reduce (or eliminate) the reactivity of contaminants and/or unreacted photosensitive material associated with forming a relief image on a photosensitive printing element during thermal development. The thermal developing assembly is configured to reduce (or eliminate) the reactivity of a byproduct associated with forming a relief image on a photosensitive printing element, the byproduct including but not limited to, contaminants within vapors (e.g., fumes), contaminants within condensate, unreacted photosensitive material, and combinations thereof.

The present disclosure is directed to a thermal developing assembly that is configured to reduce (or eliminate) the reactivity of contaminants and/or unreacted photosensitive material associated with forming a relief image on a photosensitive printing element during thermal development. The thermal developing assembly is configured to reduce (or eliminate) the reactivity of a byproduct associated with forming a relief image on a photosensitive printing element, the byproduct including but not limited to, contaminants within vapors (e.g., fumes), contaminants within condensate, unreacted photosensitive material, and combinations thereof.

A method of manufacturing a semiconductor device and a semiconductor processing system are provided. The method includes the following steps. A photoresist layer is formed on a substrate in a lithography tool. The photoresist layer is exposed in the lithography tool to form an exposed photoresist layer. The exposed photoresist layer is developed to form a patterned photoresist layer in the lithography tool by using a developer. An ammonia gas by-product of the developer is removed from the lithography tool.

A substrate treating apparatus includes a plurality of solution treating units for performing solution treatment of substrates, and a plurality of individual gas supply devices provided to correspond individually to the solution treating units, each for supplying gas at a variable rate only to one of the solution treating units. The solution treating units perform the solution treatment by supplying treating solutions to the substrates. The individual gas supply devices supply gas only to the solution treating units corresponding thereto. The individual gas supply devices supply the gas at adjustable rates to the solution treating units. The rate of gas supply to the solution treating units can therefore be varied for each solution treating unit.

A device for recycling a used water-based developer after development of a flexographic original printing plate having a photosensitive resin layer containing a water-dispersible synthetic rubber-based polymer. the device including a centrifugal separator having a rotating body for separating a resin flocculate from the used water-based developer, wherein a cross-sectional shape of the rotating body in a vertical direction including a rotation shaft of the rotating body substantially has a cylindrical or truncated-conical outline, and wherein the rotating body has a slit to allow the used water-based developer after the centrifugation to flow out. Preferably, when a total area of an opening of the slit open to the inside of the rotating body is defined as A cm.sup.2, and an internal volume of the rotating body is defined as B cm.sup.3, a value of a slit opening area ratio (B/A) is in a range of 30000 to 140000.

Provided are a treatment device and a treatment method capable of easily reusing a used rinsing liquid, and reducing the amount of waste liquid. A treatment device has: a developing portion which is provided with a developing unit which performs development by removing a non-exposed portion of a flexographic printing plate precursor after imagewise exposure using a developer containing a washing solution; a rinsing portion which is provided with a rinsing liquid supply portion which supplies a rinsing liquid containing substantially only water as a component to at least a surface of the flexographic printing plate precursor after development, from which the non-exposed portion of the flexographic printing plate precursor has been removed; a developer storage portion which has a developer storage tank which stores the developer which is used for the development in the developing portion; a first liquid feeding path through which the developer after development is fed to the developer storage tank of the developer storage portion; and a second liquid feeding path different from the first liquid feeding path, through which the rinsing liquid supplied by the rinsing portion is fed to the developer storage tank of the developer storage portion, and the developing portion repeatedly uses the developer stored in the developer storage tank of the developer storage portion to perform the development.

A cleaner and a cleaning device are disclosed. The cleaner includes: a guide rail; a lifting lever, one end of which is disposed on the guide rail and capable of moving along the guide rail; a feed pipe, disposed inside the lifting lever; and a nozzle, disposed on an end portion of one end of the lifting lever away from the guide rail and communicated with the feed pipe. The lifting lever is configured to allow the nozzle to be away from or close to the guide rail.

A cleaner and a cleaning device are disclosed. The cleaner includes: a guide rail; a lifting lever, one end of which is disposed on the guide rail and capable of moving along the guide rail; a feed pipe, disposed inside the lifting lever; and a nozzle, disposed on an end portion of one end of the lifting lever away from the guide rail and communicated with the feed pipe. The lifting lever is configured to allow the nozzle to be away from or close to the guide rail.