Provided are a treatment device and a treatment method capable of easily reusing a used rinsing liquid, and reducing the amount of waste liquid. A treatment device has: a developing portion which is provided with a developing unit which performs development by removing a non-exposed portion of a flexographic printing plate precursor after imagewise exposure using a developer containing a washing solution; a rinsing portion which is provided with a rinsing liquid supply portion which supplies a rinsing liquid containing substantially only water as a component to at least a surface of the flexographic printing plate precursor after development, from which the non-exposed portion of the flexographic printing plate precursor has been removed; a developer storage portion which has a developer storage tank which stores the developer which is used for the development in the developing portion; a first liquid feeding path through which the developer after development is fed to the developer storage tank of the developer storage portion; and a second liquid feeding path different from the first liquid feeding path, through which the rinsing liquid supplied by the rinsing portion is fed to the developer storage tank of the developer storage portion, and the developing portion repeatedly uses the developer stored in the developer storage tank of the developer storage portion to perform the development.

A method is disclosed for producing a recycled developer from a waste developer generated by development of a water-developable flexographic printing original plate that has a photosensitive resin layer made from a photosensitive resin composition containing a water-dispersible resin. The method includes: leaving the waste developer to stand still in a tank so as to emerge and flocculate the photosensitive resin composition dispersed in the waste developer and thus form a solid-liquid mixed phase containing a resin flocculate beneath a liquid surface of the waste developer; and discharging the solid-liquid mixed phase containing the resin flocculate from an outlet formed on a side surface of the tank and obtaining, as a recycled developer, a liquid left in the tank, characterized in that a level of the waste developer in the tank at the time of starting the discharge is higher than the lowest position of an aperture of the outlet.

A method of manufacturing a semiconductor device is as below. An exposed photoresist layer is developed using a developer supplied by a developer supplying unit. An ammonia gas by-product of the developer is discharged through a gas outlet of the developer supplying unit into a treating tool. The ammonia gas by-product is retained in the treating tool. A concentration of the ammonia gas by-product is monitored.

Disclosed is a developing device for developing a substrate, comprising: a developing tank, a recovery box and a conveying unit provided right above the developing tank and configured to convey the substrate; wherein the developing tank comprises a first tank, a second tank and a third tank, which are spaced and are sequentially arranged; the recovery box comprises a first box and a second box; the first tank is communicated with the first box; as the substrate is arranged in the second tank, the second tank is communicated with the first box; as the substrate is arranged in the third tank, the third tank is communicated with the second box. The developing device can solve the technical problems of separately recovering the developers doped with different photoresist concentrations during the development of the substrate to reduce the cost of diluting the developer concentration in the recovery box.

An object of the present invention is to provide a chemical liquid manufacturing method which makes it possible to manufacture a chemical liquid having an excellent defect inhibition performance. The chemical liquid manufacturing method of an embodiment of the present invention is a method for manufacturing a chemical liquid containing an organic solvent by using a manufacturing device. The chemical liquid manufacturing method has a setup step including a step A of washing the manufacturing device by using a washing solution and a step B of extracting the washing solution from the manufacturing device and a preparation step of preparing the chemical liquid in the manufacturing device, in which in the setup step, the step A and the step B are repeatedly performed until the washing solution extracted from the manufacturing device satisfies the following condition 1 after the step A and the step B.

Condition 1: in a case where a substrate is coated with the washing solution, a change in density of particles, which have a particle diameter equal to or smaller than 20 nm, on the substrate before and after the coating with the washing solution is equal to or smaller than 0.5 particles/cm2.

Disclosed is a substrate treating apparatus including a first liquid treatment chamber that performs a liquid treatment to a substrate, a second liquid treatment chamber that is disposed below the first liquid treatment chamber and performs a liquid treatment to a substrate, a first feed channel that supplies gases to the first liquid treatment chamber, and a second feed channel that supplies gases to the second liquid treatment chamber. The first feed channel includes a first vertical member that extends substantially vertically. The second feed channel includes a second vertical member that extends substantially vertically. The first vertical member and the second vertical member both extend to a position lower in level than the second liquid treatment chamber.

A method for processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous processing solution including a first dispersing agent while the photosensitive flexographic printing plate is being subjected to mechanical cleaning. Used aqueous processing solution containing the removed photopolymer is returned back into a processing solution tank. A secondary processing unit is used to wash the developed relief image with secondary aqueous processing solution including a second dispersing agent to remove debris from the developed relief image. Used secondary aqueous processing solution containing the removed photopolymer is directed into the processing solution tank. A portion of the aqueous processing solution from the processing solution tank is removed to keep a volume of aqueous processing solution in the processing solution tank below a predefined maximum volume.

A processing system includes a processing unit that processes the flexographic printing plate with a processing liquid. The processing unit includes a hollow tube having a length extending across a cross-track dimension of the flexographic printing plate. A processing liquid supply system supplies pressurized processing liquid into an interior of the hollow tube. A plurality of pressure-compensating emitters is distributed along the length of the tube which deliver processing liquid onto a surface of the flexographic printing plate, wherein processing liquid flows from the interior of the hollow tube through the pressure-compensating emitters at a controlled flow rate.

A substrate processing apparatus includes a spin chuck that holds a substrate, a processing liquid supply unit that supplies a first processing liquid having first specific gravity and a second processing liquid having second specific gravity smaller than the first specific gravity to a surface to be processed of the substrate held by the spin chuck, a collection tank that stores the used first and second processing liquids that have been supplied to the substrate, and a processing liquid separating mechanism that separates the first processing liquid and the second processing liquid based on specific gravity, the first and second processing liquids being stored in the collection tank.

A method for processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous processing solution including a first dispersing agent while the photosensitive flexographic printing plate is being subjected to mechanical cleaning. Used aqueous processing solution containing the removed photopolymer is returned back into a processing solution tank. A secondary processing unit is used to wash the developed relief image with secondary aqueous processing solution including a second dispersing agent to remove debris from the developed relief image. Used secondary aqueous processing solution containing the removed photopolymer is directed into the processing solution tank. A portion of the aqueous processing solution from the processing solution tank is removed to keep a volume of aqueous processing solution in the processing solution tank below a predefined maximum volume.