A lithographic system for projecting an image onto a workpiece using radiation is provided. The lithographic system includes: a support structure for supporting a workpiece; a radiation source for providing radiation to project an image on the workpiece; a reticle positioned between the radiation source and the workpiece; and a mask positioned adjacent the reticle, the mask being configured to block radiation from the radiation source, the mask including a heat removal apparatus.

A lithographic system for projecting an image onto a workpiece using radiation is provided. The lithographic system includes: a support structure for supporting a workpiece; a radiation source for providing radiation to project an image on the workpiece; a reticle positioned between the radiation source and the workpiece; and a mask positioned adjacent the reticle, the mask being configured to block radiation from the radiation source, the mask including a heat removal apparatus.

An apparatus for generating a laminar flow includes an injection nozzle and a suction nozzle. The injection nozzle and the suction nozzle are operable to form the laminar flow for blocking particles from contacting a proximate surface of an object. The injection nozzle includes a main outlet to blow out the laminar flow and is configured to generate a Coanda flow along an external surface of the injection nozzle. The suction nozzle is configured to provide a gas pressure gradient for the laminar flow.

An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the fractions are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.

The invention provides a light generating method and system, the method including: generating first light, the first light being capable of forming a first area, a second area, and a third area, and intensity of the first light in the first area being higher than that in the second area and the third area, respectively; generating second light, the second light being capable of simultaneously irradiating the first area and the second area; generating third light, the third light being capable of simultaneously irradiating the first area and the third area; and controlling intensity of the second light and the third light, respectively. The light generating method and system provided by the invention can not only generate light having a super-resolution that may approach infinitesimal in theory but also employ light output by a laser as the only original light source, featuring extremely low costs and freedom from the diffraction limit of the light source, showing a great prospect of applications in the field of lithography.

In one embodiment, a semiconductor manufacturing apparatus includes a stage on which a substrate is to be installed. The apparatus further includes a light source configured to generate light. The apparatus further includes a shaper including a rotating portion provided with an opening configured to shape the light from the light source, the shaper being configured to irradiate a photomask with the light which has passed through the opening. The apparatus further includes a controller configured to change a width of the light passing through the opening by rotating the rotating portion while scanning the substrate by the light which has passed through the photomask.

A reticle-masking structure is provided. The reticle-masking structure includes a magnetic substrate and a paramagnetic part disposed on the magnetic substrate. The paramagnetic part includes a plurality of fractions disposed on a plurality of protrusion structures. In some embodiments, the protrusion structures are irregularly arranged. A method for forming a reticle-masking structure and an extreme ultraviolet apparatus are also provided.

An apparatus for generating a laminar flow includes an injection nozzle and a suction nozzle. The injection nozzle and the suction nozzle are operable to form the laminar flow for blocking particles from contacting a proximate surface of an object. The injection nozzle includes a main outlet to blow out the laminar flow and is configured to generate a Coanda flow along an external surface of the injection nozzle. The suction nozzle is configured to provide a gas pressure gradient for the laminar flow.

A cantilever linear motion reference device employing two-layer air suspension. By means of a two-layer force sealed air suspension structure, the invention realizes two-dimensional air suspension support and motion guiding and improves the rotational stiffness per unit for an air suspension working surface. By combining accurate driving and feedback control, the invention achieves high speed, high acceleration, high frequency motion, and enables construction of a small-volume, long cantilever, high torque load two-dimensional motion reference device.