An arrangement (100), a method and a computer program product for system-integrated calibration of facet mirrors (18, 19) of a microlithographic illumination system (20). Beam paths (103) between a radiation source (101) and a radiation detector (102) are created by the facet mirrors (18, 19), with respectively only one pivotable micromirror (18, 19) of each facet mirror (18, 19) affecting said beam path. By methodically pivoting one of the micromirrors (18, 19) affecting the beam path (10), it is possible, based on the radiation detector (102), to find a specific optimal pivot position, the underlying orientation of the micromirror (18, 19) of which can also be calculated geometrically. By comparing the calculated orientation with the orientation ascertained by a tilt sensor on the micromirror (18, 19), it is possible to calibrate the tilt sensor or micromirror (18, 19) of the facet mirror (18, 19).

The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.

A catadioptric projection objective for reproducing a pattern arranged in an object plane of the projection objective in an image plane of the projection objective parallel to the object plane comprises a plurality of optical elements comprises lenses and concave mirrors arranged between the object plane and the image plane along an optical axis. The projection objective is a double-field projection objective to reproduce a first effective object field outside the optical axis in the object plane along a first projection beam path in a first effective image field outside the optical axis in the image plane and at the same time to reproduce a second effective object field, opposite the first object field in relation 10 to the first optical axis, outside the optical axis in the object plane along a second projection beam path in a second effective image field outside the optical axis in the image plane.

An illumination system for a microlithography projection illumination facility for illuminating a sample arranged in a region of an object plane of a downstream projection lens with illumination light generated from light from a primary light source is a double-field illumination system for receiving a single light beam coming from the primary light source and generating therefrom two illumination beams. A first illumination beam is guided along a first illumination beam path to a first illumination field outside the optical axis of the projection lens in the exit plane of the illumination system. At the same time, a second illumination beam is guided along a second illumination beam path to a second illumination field opposite the first illumination field relative to the optical axis and outside the optical axis in the exit plane.

The present invention relates to photohardenable compositions and methods of forming an object, the method preferably including a photohardenable composition described herein. Preferred photohardenable compositions and methods include a photohardenable resin component, a first photoinitiator that is activatable by exposure to light at a first wavelength and light at a second wavelength, and a second photoinitiator that is activatable by exposure to light at a third wavelength, wherein the first, second, and third wavelengths are not the same, and the third wavelength is shorter than the first wavelength and the second wavelength. Preferred first photoinitators include photoswitchable photoinitiators. Preferably the second light-activated photoinitiator comprises a free-radical photoinitiator. Hardenable resin compositions and methods of forming an object including the hardenable resin composition are also disclosed.

For controlling an intensity distribution of an illumination radiation impinging on an object field, an illumination apparatus for a projection exposure apparatus for microlithography includes a mechanism for spatially displacing an illumination beam relative to a first facet mirror of an illumination optical unit.

The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.

A calibration apparatus is provided. The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned layer includes a first exposure area and remaining exposure areas, and each of the first and the remaining exposure areas includes a first checking mark. The calibration apparatus also includes a measurement device configured to obtain a first exposure value of the first checking mark of the first exposure area by measuring the first checking mark of the first exposure area. The calibration apparatus also includes a processing module configured to calculate first calculated values of the first checking marks of the remaining exposure areas according to the first exposure value and a standard file. The illumination device is adjusted by an adjustment device of the lithography apparatus according to the first calculated values during a lithography process.

An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

The invention relates to techniques for producing an HOE by replication of a master HOE. In particular, techniques that allow variable surface shape during replication are described. A curved trajectory is used for exposure.