A hyperspectral camera based on a continuously variable film filter and a coating method thereof can solve interference between partial bands of the hyperspectral camera based on the continuously variable film filter. The hyperspectral camera includes: a camera body and a detector chip, wherein a continuously variable film is coated on the detector chip; a semi-transmission half-cut filter is provided in front of the continuously variable film, and a distance between the semi-transmission half-cut filter and the continuously variable film is 0 mm. According to the present invention, the semi-transparent half-cut filter and the detector chip are integrated without any gap therebetween. As a result, optical interference caused by incident light sequentially passing through the semi-transparent half-cut filter and the detector chip is greatly reduced, which can reduce distortion of spectral signals, and finally satisfy wide-band application requirements which can be truly realized based on such technology.

An optical element (7, 8) for the VUV wavelength range includes a substrate (7a, 8a), and a coating (15) applied to the substrate (7a, 8a). The coating (15) has at least one fluorine scavenger layer (17, 17a, . . . , 17n) having a fluoride material (M.sup.x+F.sub.x.sup.−) doped with at least one preferably metallic dopant ion (A.sup.x+). Also described are an optical arrangement that includes at least one such optical element (7, 8), as well as a method for producing such an optical element (7, 8).

An optical element for a lithography system comprises an optical surface and a photoresistor having an electric photoresistor value that varies according to an amount of light incident on a region of the optical surface.

A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wavelength range in an EUV spectral region includes a substrate (SUB) and a stack of layers (SL). The stack of layers has layers having a low index material and layers having a high index material. The low index material has a lower real part of the refractive index than does the high index material at a given operating wavelength in the first wavelength range. The stack of layers also includes a spectral purity filter on the stack of layers. The spectral purity filter is effective as an anti-reflection layer for ultraviolet (UV) radiation from a second wavelength range in a UV spectral region to increase an EUV-UV-reflectivity ratio of the multilayer mirror. The spectral purity filter (SPF) includes a non-diffractive graded-index anti-reflection layer (GI-AR) effective to reduce reflectivity in the second wavelength range.

A lithography exposure system includes a light source, a substrate stage, and a mask stage between the light source and the substrate stage along an optical path from the light source to the substrate stage. The lithography exposure system further comprises a reflector along the optical path. The reflector comprises: a first layer having a first material and a first thickness; a second layer having the first material and a second thickness different from the first thickness; and a third layer between the first layer and the second layer, and having a second material different from the first material.

An EUV reflective structure includes a substrate and multiple pairs of a Si layer and a Mo layer. The Si layer includes a plurality of cavities.

A gamma ray generator includes a rotational shaft, a plurality of holders and a plurality of gamma ray sources. The holders are connected to the rotational shaft. The gamma ray sources are disposed in the holders respectively, wherein the holders respectively have an upper portion and a lower portion connecting to the upper portion, and the gamma ray source is placed at an interface between the upper portion and the lower portion.

An image sensor for a position sensor apparatus for ascertaining a position of at least one mirror of a lithography apparatus includes: a plurality of integrated optical waveguides; a plurality of incoupling areas; a multiplexer apparatus; and an image reconstruction apparatus.

An apparatus (100) for receiving input radiation (108) and broadening a frequency range of the input radiation so as to provide broadband output radiation (110). The apparatus comprises a fiber (102), wherein the fiber (102) may comprise a hollow core (104) for guiding radiation propagating through the fiber (102). The apparatus (100) further comprises an apparatus for providing a gas mixture (106) within the hollow core (104). The gas mixture (106) comprises a hydrogen component, and a working component, wherein the working component is for broadening a frequency range of a received input radiation (108) so as to provide the broadband output radiation (110). The apparatus may be included in a radiation source.

A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.