A method of manufacturing a display device including: preparing a substrate having a display area and a non-display area; and forming an alignment mark disposed in the non-display area of the substrate. The alignment mark includes a quadrangular-shaped center portion and a plurality of measurement portions that surround the center portion, the plurality of measurement portions including four or more measurement portions, and each of the measurement portions including sides that are parallel with two sides of the quadrangular-shaped center portion.

A method is disclosed of generating a die tensor of a wafer from a Computer-Aided Design (CAD) file. According to the method, a segmentation engine segments a wireframe image obtained from the CAD file into a plurality of entities. An image transformation engine performs a transform on each of the plurality of entities based on at least one of the wireframe image, metrology, a design specification, process information, and optical information. The transform is performed iteratively based on the optical information. A stitch engine generates a die tensor, having a predefined number of slices, by combining each of the transformed plurality of entities.

A method is disclosed of generating a die tensor of a wafer from a Computer-Aided Design (CAD) file. According to the method, a segmentation engine segments a wireframe image obtained from the CAD file into a plurality of entities. An image transformation engine performs a transform on each of the plurality of entities based on at least one of the wireframe image, metrology, a design specification, process information, and optical information. The transform is performed iteratively based on the optical information. A stitch engine generates a die tensor, having a predefined number of slices, by combining each of the transformed plurality of entities.

A sensor fabricated from a plurality of layers on a semiconductor wafer. The sensor comprises a plurality of sensor elements arranged in stitching blocks and having a plurality of vertically arranged read-out lines, a plurality of vertically arranged select/reset lines, and a plurality of horizontally arranged select/reset lines, running from a right-hand edge to an oppositely disposed left hand edge and being connected to ones of the plurality of vertically arranged select/reset lines, plurality of read-out circuits connected to the plurality of vertically arranged read-out lines, and ones of the plurality of vertically arranged read-out lines swerve at one of the bottom or top edges of the stitching blocks, such that ones of the plurality of vertically arranged read-out lines in a first one of the plurality of stitching blocks connect to a displaced one of the vertical lines in a second abutting one of the plurality of stitching blocks.

A method for assigning features into at least first features and second features, the first features being for at least one first patterning device configured for use in a lithographic process to form corresponding first structures on a substrate and the second features being for at least one second patterning device configured for use in a lithographic process to form corresponding second structures on a substrate, wherein the method including assigning the features into the first features and the second features based on a patterning characteristic of the features.

In an exposure apparatus, on a substrate holder (34), a plurality of grating areas (RG) is arranged mutually apart in the X-axis direction, and a plurality of heads (66a to 66d) that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.

A method for determining a correction for control of at least one manufacturing apparatus used in a manufacturing process for providing structures to a region on a substrate, the region including a plurality of sub-regions. The method includes obtaining measurement data relating to a process parameter of the manufacturing process for the region; and determining a correction for the manufacturing apparatus based on the measurement data. The correction is configured to maintain the process parameter within a specified range across a boundary between two of the sub-regions and/or to better correct the process parameter across the boundary between two of the sub-regions with respect to within the remainder of the region.

A display device including: a substrate having display area and a non-display area; and an alignment mark disposed in the non-display area of the substrate. The alignment mark includes a quadrangular-shaped center portion and a plurality of measurement portions that surround the center portion, the plurality of measurement portions including four or more measurement portions, and each of the measurement portions including sides that are parallel with two sides of the quadrangular-shaped center portion.

In some embodiments, a method for forming an integrated circuit is provided. The method includes forming a first layer over a semiconductor wafer, the first layer having a first portion and a second portion. The first portion is patterned by projecting a first image field over the first portion of the first layer, where the first portion of the first layer corresponds to the first image field. The second portion is patterned by projecting a second image field over the second portion of the first layer, where the second portion of the first layer corresponds to the second image field. A second layer is formed over the first layer. The second layer is patterned by projecting a third image field over the second layer, where the third image field covers a majority of the first portion and a majority of the second portion of the first layer.

Embodiments of the present disclosure relate to methods for positioning masks in a propagation direction of a light source. The masks correspond to a pattern to be written into a photoresist layer of a substrate. The masks are positioned by stitching a first mask and a second mask. The first mask includes a set of first features having first feature extensions extending therefrom at first feature interfaces. The second mask includes a set of second features having second feature extensions extending therefrom at second feature interfaces. Each first feature extension stitches with each corresponding second feature extension to form each stitched portion of a first stitched portion of the first pair of masks. The stitched portion of the first pair of masks defines a portion of the pattern to be written into the photoresist layer.