Patent classifications
G03F7/70858
EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method
An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
Humidifier and air conditioner
The present invention provides a humidifier capable of preventing water generated by dew condensation of vapor from being combined with air, so that an air humidity can be stably controlled. A humidifier according to the present invention includes a storage tank that stores water, the storage tank being opened upward, a heater that heats the water in the storage tank, and a guide plate that is disposed above the storage tank, on at least one of one side and the other side in a first direction extending along a horizontal direction with respect to a center of the storage tank. The guide plate extends in an inclined manner such that an upper part thereof is positioned closer to the center of the storage tank in the first direction than a lower part thereof.
Stage driving apparatus, lithography apparatus, and method of manufacturing article
The present invention provides a stage driving apparatus for driving a stage, comprising: a linear motor including a stator which includes a coil array obtained by alternately arraying first phase coils and second phase coils, and a movable element placed on the stage; and a control unit configured to control the linear motor by controlling an energization state of the coil array, wherein in a stopping period during which the stage is stopped in a predetermined position, the control unit holds a position of the stage in the predetermined position by turning on the first phase coil among the coil array, and generates heat by turning on the second phase coil arranged in a position where no thrust is given to the movable element among the coil array.
DROPLET GENERATOR AND METHOD OF SERVICING A PHOTOLITHOGRAPHIC TOOL
A photolithographic apparatus includes a droplet generator, a droplet generator maintenance system, and a controller communicating with the droplet generator maintenance system. The droplet generator maintenance system operatively communicates with the droplet generator, a coolant distribution unit, a gas supply unit, and a supporting member. The gas supply unit includes a heat exchange assembly and an air heating assembly. The coolant distribution unit is configured to control the temperature of the droplet generator within the acceptable droplet generator range.
Apparatus and method for treating substrate
An apparatus for treating a substrate includes a housing having a treatment space therein, a plate that supports the substrate in the housing, a heating unit having a heating wire that is provided inside the plate and that heats the substrate, a main temperature sensor that directly measures temperatures of the plate, and an auxiliary temperature sensor that measures temperatures of the heating wire.
MATERIAL MANAGEMENT METHOD AND SYSTEM
A method includes: storing a carrier containing material in a storage; recording environmental data of the storage to a database while the material is in the storage; generating a forecast for the material in the carrier based on the environmental data; receiving a request for the material from a semiconductor fabrication tool; and providing the carrier to the semiconductor fabrication tool based on the forecast.
Lithographic apparatus and device manufacturing method
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Cleaning apparatus and methods of cleaning
The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.
Droplet generator and method of servicing a photolithographic tool
A photolithographic apparatus includes a droplet generator, a droplet generator maintenance system, and a controller communicating with the droplet generator maintenance system. The droplet generator maintenance system operatively communicates with the droplet generator, a coolant distribution unit, a gas supply unit, and a supporting member. The gas supply unit includes a heat exchange assembly and an air heating assembly. The coolant distribution unit is configured to control the temperature of the droplet generator within the acceptable droplet generator range.
LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD
A light source apparatus includes a holder configured to hold a lamp including a metal base having a cylindrical surface, a condensing mirror configured to condense light generated by the lamp, and a nozzle including an ejection hole configured to eject a gas to cool the metal base. A distance between a straight line including a center axis of the ejection hole and a center axis of the metal base ranges from not less than ½ of a radius of the cylindrical surface to not more than the radius.