Provided is an imprint method of performing an imprint process including a contacting step of bringing a mold into contact with an imprint material on a substrate, a curing step of curing the imprint material, and a separating step of separating the mold from the cured imprint material. The method includes acquiring global alignment information, performing a pre-alignment measurement including moving, based on the acquired global alignment information, a second shot region to a measurement position at which a measurement device performs measurement, and measuring a first relative positional shift between the second shot region and the mold using the measurement device, and moving, based on the global alignment information and the measured first relative positional shift, a first shot region to an imprint position at which the imprint process is performed, and starting the contacting step.

A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.

According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

A forming method of forming an imprint material on a first substrate and a second substrate using a mold is provided. A first forming step of forming an imprint material on the first substrate held by a first substrate holding unit is performed. The second substrate held by a second substrate holding unit is measured. An imprint material on the second substrate held by the first substrate holding unit. A detecting step is performed to detect an imprint material formed on the first substrate held by the second substrate holding unit. The detecting step is performed in a state where the second forming step is performed, after the measuring step is performed in a state where the first forming step is performed.

An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.

In an alignment apparatus, a measurement device includes an illuminator that illuminates a first original-side mark and a second original-side mark arranged in an original and a first substrate-side mark and second substrate-side mark arranged in a substrate. The measurement device performs coarse measurement based on light beams from the first original-side mark and the first substrate-side mark by causing the illuminator to illuminate the first original-side mark and the first substrate-side mark under a first condition, and performs fine measurement based on light beams from the second original-side mark and the second substrate-side mark by causing the illuminator to illuminate the second original-side mark and the second substrate-side mark under a second condition.

A measurement device for measuring a relative position between alignment marks includes an illumination unit capable of illuminating the alignment marks at a plurality of wavelengths, a detection unit that detects light from the alignment marks, a processing unit that obtain the relative position between the alignment marks, and an adjustment unit that adjusts a relative amount between light amounts of the plurality of wavelengths so that a relative value between detection light amounts of light from the alignment marks falls within a predetermined range.

Systems and methods for managing multi-objective alignments in imprinting (e.g., single-sided or double-sided) are provided. An example system includes rollers for moving a template roll, a stage for holding a substrate, a dispenser for dispensing resist on the substrate, a light source for curing the resist to form an imprint on the substrate when a template of the template roll is pressed into the resist on the substrate, a first inspection system for registering a fiducial mark of the template to determine a template offset, a second inspection system for registering the imprint on the substrate to determine a wafer registration offset between a target location and an actual location of the imprint, and a controller for controlling to move the substrate with the resist below the template based on the template offset, and determine an overlay bias of the imprint on the substrate based on the wafer registration offset.

An imprint apparatus executes imprint processing of curing imprint material in a state in which the imprint material supplied onto a substrate and a mold are in contact with each other. The imprint apparatus includes a modulator configured to modulate incident light, a first optical system configured to guide first light from a first light source to the modulator, and second light from a second light source that has a wavelength different from that of the first light to the modulator, and a second optical system configured to guide modulated light modulated by the modulator to the substrate.

The present invention provides an imprint apparatus that forms a pattern in an imprint material on a substrate using a mold including a pattern region, the apparatus comprising: a stage configured to be movable while holding the substrate; and a dispenser configured to discharge the imprint material, wherein a sensor, a receptor, and a mark are provided around a holding region where the substrate is held, in an upper surface of the stage, and the upper surface of the stage includes a first region that passes below the pattern region during movement of the stage between a position below the dispenser and a position below the mold, and a second region that does not pass below the pattern region during the movement, and the sensor, the receptor, and the mark are arranged in the second region.