A method and associated system for applying an optimized processing treatment to items in an industrial treatment line are described. First, settings for a value of a working parameter in the treatment line are defined. The settings are associated with value ranges of a parameter representative of an external property of items. Then, a value of the parameter representative of the external property of the item is measured. A setting for the value of the working parameter associated with a value range from the set of value ranges comprising the measured value is compared to the current setting of the working parameter. When a difference is detected between the associated setting and the current setting, the current setting is changed to the associated setting.

Embodiments of the present disclosure disclose a method and device for planning a wall surface polishing path, an apparatus and medium. The method includes: obtaining protruding points of a wall surface to be polished, and dividing the wall surface to be polished into at least two regions; determining a candidate protruding point in the next region of the region where a current protruding point is located; comparing, if the region where the current protruding point is located includes an untraversed protruding point, a first distance between the untraversed protruding point and the current protruding point, with a second distance between the candidate protruding point and the current protruding point; determining the protruding point corresponding to a minimum distance in the first distance and the second distance as a next operation point of the current protruding point; and determining the wall surface polishing path based on the current protruding point and the next operation point of the current protruding point. The technical solution in the embodiments of the present disclosure solves the problem that a polishing path of a current polishing device covers a region with no need for polishing, and achieves effects of optimizing an operation path of a polishing device, improving polishing efficiency, and reducing polishing costs.

A method for controlling the polishing of a gemstone includes: obtaining a three-dimensional model of the gemstone; fixing the gemstone in a dop, wherein an initial facet to be polished is aligned; obtaining at least one image of the initial facet; based on the obtained at least one image and the obtained three-dimensional model, determining at least first setting parameters for a first planned facet positioned between the initial facet and a desired final polished facet; setting the dop for obtaining a polished gemstone having a polished facet approaching the first planned facet; obtaining at least one image of the polished facet; based on the obtained at least one image of the polished facet and the three-dimensional model, determining at least further setting parameters for a further planned facet; setting the dop for obtaining a polished gemstone having a polished facet approaching the further planned facet.

Disclosed herein is an impedance control system for a robot arm. The system is able to provide at least two different levels of stiffness/compliance, and values for stiffness/compliance in the can be independently defined and set in at least first and second directions. Specifically, this allows the stiffness in said first direction to be set at a lower value than the stiffness in said second direction within the control system.

In certain embodiments, device inspection or repair may be facilitated via signal-based determinations. In some embodiments, one or more flaws may be detected on a portion of a device via an optical sensor. Based on the detection, a physical structure may be caused to physically interact with the portion of the user device. Information indicating signals from the physical interaction may be obtained. Based on the signal information, a determination of whether a repair process should be performed on the device may be effectuated. The device may be assigned to be repaired via the repair process based on the determination indicating that the repair process should be performed on the device. In some embodiments, the signal information may be provided to a prediction model to determine whether the repair process should be performed on the device.

A design method of a semiconductor manufacturing apparatus which can satisfy a specification required by a user is disclosed. The design method of the semiconductor manufacturing apparatus includes creating a program setting file; creating a program installer from the program setting file; operating a processing unit of the semiconductor manufacturing apparatus; specifying a sensor corresponding to the processing unit based on the operation of the processing unit; creating a sensor setting file storing information obtained by specifying the sensor; comparing a content of a requirement specification and a content of the sensor setting file to confirm a consistency between the content of the requirement specification and the content of the sensor setting file; and introducing a program into a memory of a controller by the program installer when the content of the requirement specification and the content of the sensor setting file are consistent with each other.

At least one magnetic medium is loaded into a cavity of a build piece. The build piece is created by an additive manufacturing process. The magnetic medium is magnetically moved in the cavity.

A method of generating training spectra for training of a neural network includes measuring a first plurality of training spectra from one or more sample substrates, measuring a characterizing value for each training spectra of the plurality of training spectra to generate a plurality of characterizing values with each training spectrum having an associated characterizing value, measuring a plurality of dummy spectra during processing of one or more dummy substrates, and generating a second plurality of training spectra by combining the first plurality of training spectra and the plurality of dummy spectra, there being a greater number of spectra in the second plurality of training spectra than in the first plurality of training spectra. Each training spectrum of the second plurality of training spectra having an associated characterizing value.

A method of generating training spectra for training of a neural network includes generating a plurality of theoretically generated initial spectra from an optical model, sending the plurality of theoretically generated initial spectra to a feedforward neural network to generate a plurality of modified theoretically generated spectra, sending an output of the feedforward neural network and empirically collected spectra to a discriminatory convolutional neural network, determining that the discriminatory convolutional neural network does not discriminate between the modified theoretically generated spectra and empirically collected spectra, and thereafter, generating a plurality of training spectra from the feedforward neural network.

A method is disclosed for providing a component. During this method, a first object is additive manufactured. The first object is scanned using computed tomography to provide first object scan data. The first object scan data is compared to first object reference data to provide machining data. The first object is machined using the machining data to provide a second object.