Patent classifications
G05D16/2013
PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS
A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
VAPORIZATION SYSTEM AND CONCENTRATION CONTROL MODULE USED IN THE SAME
Provided is a concentration control module that improve responsiveness of concentration control of a vaporization system, and is used in a vaporization system. The concentration control module includes a concentration measuring part configured to measure a concentration of a source gas; a valve provided in a lead-out pipe configured to lead out the source gas from the tank; a pressure target value calculating part configured to calculate a pressure target value inside the tank by using a concentration target value of the source gas, and a concentration measured value of the concentration measuring part; a delay filter configured to generate a pressure control value by applying a predetermined time delay to the pressure target value obtained by the pressure target value calculating part; and a valve control part configured to feedback-control the valve by using a deviation between the pressure control value obtained by the delay filter, and a pressure inside the tank.
Method and device for detecting switching value of pressure switch
A method and a device for detecting the switching value of a pressure switch. The device comprises: a pressure generator in communication with a pressure switch by means of pressure piping, a pressure control element, a pressure sensor, and a controller provided with a data processing unit. The pressure sensor is installed on the pressure piping and is electrically connected to the controller. The pressure control element is electrically connected to the pressure generator to control the pressure generator, and is electrically connected to the controller. The pressure sensor transfers the pressure change of the pressure piping to the controller in real time, the data processing unit acquires the value of the pressure change and generates a control instruction according to a preset pressure change rule, and the pressure control element controls the pressure generator to change the pressure within the piping. The device and the method are used to complete the detection of the switching value of a pressure switch, fast detection is achieved, the detection accuracy is improved, the repeatability of the detection result is good, the manual operation cost is reduced and the operation is reliable.
SYSTEM AND METHOD FOR EQUALIZING PRESSURE IN IONIZATION CHAMBER OF RADIATION DEVICE
A system for equalizing a pressure in an ionization chamber of a radiation device is provided. The system may include the ionization chamber including: a chamber housing including one or more chamber walls; a chamber volume inside the chamber housing, the chamber volume being filled with a radiation sensitive material; and a pressure adjustment apparatus operably coupled to the chamber volume via at least one wall of the one or more chamber walls, the pressure adjustment apparatus being configured to equalize a first pressure of the radiation sensitive material inside the chamber volume and a second pressure of ambient air outside the chamber housing.
Cleaning liquid supplying system, substrate processing apparatus and substrate processing system
According to one embodiment, provided is a cleaning liquid supplying system including: a circulation line in which cleaning liquid flows, first end of the circulation line being connected to a supply port of a cleaning liquid supplying apparatus, second end of the circulation line being connected to a collection port of the cleaning liquid supplying apparatus; a branch pipe branched from the circulation line and connected to a substrate cleaning unit; a valve provided on the branch pipe and configured to control supply of cleaning liquid from the circulation line to the substrate cleaning unit; and a flow rate adjuster configured to adjust a flow rate of the cleaning liquid flowing in the circulation line.
SYSTEMS AND METHODS FOR STABILIZING REACTION CHAMBER PRESSURE
A reactor system may comprise a first gas source; a second gas source; and a reaction chamber fluidly coupled to the first and second gas sources, wherein a first gas and a second may be supplied to the reaction chamber from the first and second gas sources, respectively, to achieve stability of a reaction chamber pressure. The reactor system may further comprise an exhaust line fluidly coupled to and downstream from the reaction chamber; a vent line fluidly coupled to the first and/or second gas source, and to the exhaust line, wherein the vent line bypasses the reaction chamber; a pressure monitor coupled to the vent line configured to monitor a vent line pressure within the vent line; and/or a vent line conductance control valve coupled to the vent line and configured to adjust in response to feedback from the pressure monitor.
METHOD OF MEASURING A MINIMUM PRESSURE FOR GAS BUBBLE GENERATION OF A CAPILLARY TRUBE, AND RELATED METHODS
A method of measuring a minimum pressure for gas bubble generation (MPGBG) value of a capillary tube is disclosed. The capillary tube has an inlet and an output portion including an outlet. The inlet is connected to a regulated pneumatic system, configured to supply a gas to the inlet under pressure. The output portion is immersed in a liquid. The gas is supplied to the inlet under a range of pressures including a higher pressure range and a lower pressure range. In the higher pressure range, gas bubbles are generated in the liquid from the outlet. In the lower pressure range, no gas bubbles are generated in the liquid from the outlet. A value of the minimum pressure for gas bubble generation (MPGBG) for the liquid is determined.
Other methods include a method of measuring and storing MPGBG values of capillary tubes, methods of selecting at least one capillary tube from a plurality of capillary tubes, and a method of cutting a capillary tube to a desired MPGBG value.
System and method for equalizing pressure in ionization chamber of radiation device
A system for equalizing a pressure in an ionization chamber of a radiation device is provided. The system may include the ionization chamber including: a chamber housing including one or more chamber walls; a chamber volume inside the chamber housing, the chamber volume being filled with a radiation sensitive material; and a pressure adjustment apparatus operably coupled to the chamber volume via at least one wall of the one or more chamber walls, the pressure adjustment apparatus being configured to equalize a first pressure of the radiation sensitive material inside the chamber volume and a second pressure of ambient air outside the chamber housing.
Discretized Valve State Control For Multi-Level Hydraulic Systems
An actuation pressure to actuate one or more hydraulic actuators may be determined based on a load on the one or more hydraulic actuators of a robotic device. Based on the determined actuation pressure, a pressure rail from among a set of pressure rails at respective pressures may be selected. One or more valves may connect the selected pressure rail to a metering valve. The hydraulic drive system may operate in a discrete mode in which the metering valve opens such that hydraulic fluid flows from the selected pressure rail through the metering valve to the one or more hydraulic actuators at approximately the supply pressure. Responsive to a control state of the robotic device, the hydraulic drive system may operate in a continuous mode in which the metering valve throttles the hydraulic fluid such that the supply pressure is reduced to the determined actuation pressure.
Methods and systems for improving the operation of transmissions for motor vehicles
The “factory installed” hydraulic circuitry of an automotive transmission is modified to increase line pressure to permit heavy duty and high performance applications of the transmission, and to prevent the onboard computer from sensing and counteracting the increased line pressure. The “factory installed” Torque Converter Clutch (TCC) regulator valve is modified to prevent over pressuring of this valve which would otherwise result from the increased line pressure. The “factory installed” Torque Converter Clutch control valve is modified to compensate for the increase in line pressure to adjust the application of the valve to prevent rough or abrupt gear shifts and provide smooth application of the torque converter clutch.