Patent classifications
G11B7/1372
System and method for forming diffracted optical element having varied gratings
Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
Image display device and light guiding device with diffraction elements
An image display device includes an image light generation unit configured to generate image light, a projection system optical unit configured to project the image light, a correction system optical unit configured to correct aberrations, a first diffraction element configured to deflect the image light incident on a first incident surface, and a second diffraction element configured to deflect the image light incident on a second incident surface. The projection system optical unit, the second diffraction element, the correction system optical unit, and the first diffraction element are arranged in this order in a direction of the image light emitted from the image light generation unit, and the image light deflected and dispersed into rays of respective wavelengths by the second diffraction element is focused by the first diffraction element.
Image display device and light guiding device with diffraction elements
An image display device includes an image light generation unit configured to generate image light, a projection system optical unit configured to project the image light, a correction system optical unit configured to correct aberrations, a first diffraction element configured to deflect the image light incident on a first incident surface, and a second diffraction element configured to deflect the image light incident on a second incident surface. The projection system optical unit, the second diffraction element, the correction system optical unit, and the first diffraction element are arranged in this order in a direction of the image light emitted from the image light generation unit, and the image light deflected and dispersed into rays of respective wavelengths by the second diffraction element is focused by the first diffraction element.
Data read/write apparatus and electronic device
The technology of this application relates to a data read/write apparatus and an electronic device, which relate to the data storage field, and can improve data read/write performance. The data read/write apparatus includes a first laser, configured to output a first optical pulse based on a control signal, where the control signal is a signal obtained based on to-be-written data, a dispersion compensator, configured to perform dispersion compensation on the first optical pulse to output a second optical pulse, and an optical fiber lens, connected to the dispersion compensator by using an optical fiber, and configured to focus the second optical pulse onto an optical storage medium, to write the to-be-written data to the optical storage medium.
Data read/write apparatus and electronic device
The technology of this application relates to a data read/write apparatus and an electronic device, which relate to the data storage field, and can improve data read/write performance. The data read/write apparatus includes a first laser, configured to output a first optical pulse based on a control signal, where the control signal is a signal obtained based on to-be-written data, a dispersion compensator, configured to perform dispersion compensation on the first optical pulse to output a second optical pulse, and an optical fiber lens, connected to the dispersion compensator by using an optical fiber, and configured to focus the second optical pulse onto an optical storage medium, to write the to-be-written data to the optical storage medium.
SYSTEM AND METHOD FOR FORMING DIFFRACTED OPTICAL ELEMENT HAVING VARIED GRATINGS
Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
SYSTEM AND METHOD FOR FORMING DIFFRACTED OPTICAL ELEMENT HAVING VARIED GRATINGS
Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
Data storage using light of spatially modulated phase and polarization
An optical data-storage system comprises a laser, an imaging optic, and associated computer logic. The laser is configured to emit a pulsed wavefront having uniform phase and polarization. The imaging optic is configured to modulate the phase and polarization of different portions of the wavefront by different amounts, and to diffract light from the different portions to a substrate with writeable optical properties. The logic is configured to receive data and to control modulation of the phase and polarization such that the light diffracted from the imaging optic writes the data to the substrate.
Data storage using light of spatially modulated phase and polarization
An optical data-storage system comprises a laser, an imaging optic, and associated computer logic. The laser is configured to emit a pulsed wavefront having uniform phase and polarization. The imaging optic is configured to modulate the phase and polarization of different portions of the wavefront by different amounts, and to diffract light from the different portions to a substrate with writeable optical properties. The logic is configured to receive data and to control modulation of the phase and polarization such that the light diffracted from the imaging optic writes the data to the substrate.
Optical information recording medium having first and second pit row of identical reflectance
In a case where (i) a reflectance calculated from a reflected light amount obtained from a longest pit (P1max) or a longest space (S1max) in a first pit row is defined as a first reflectance and (ii) a reflectance calculated from a reflected light amount obtained from a longest pit (P2max) or a longest space (S2max) in the second pit row is defined as a second reflectance, the first pit row is formed such that the first reflectance becomes substantially identical with the second reflectance.