A semiconductor device includes a substrate, a circuit having a transistor formed on the substrate, an oscillation circuit generating a frequency signal, a substrate voltage generation circuit generating a substrate voltage in accordance with the frequency signal from the oscillation circuit, and a control circuit varying a frequency of the frequency signal from the oscillation circuit during a stand-by period of the circuit.

A reliability aware negative bit-line write assist (RA-NBL) circuit comprises a coupling capacitor to provide a negative bump for write assist, and a control input generator control charging of the coupling capacitor, such that the negative bump is high at a low voltage, and the negative bump is low at a high voltage.

To provide a semiconductor device which can be stably operated while achieving a reduction of the power consumption. A semiconductor device includes a CPU, a system controller which designates an operation speed of the CPU, P-type SOTB transistors, and N-type SOTB transistors. The semiconductor device is provided with an SRAM which is connected to the CPU, and a substrate bias circuit which is connected to the system controller and is capable of supplying substrate bias voltages to the P-type SOTB transistors and the N-type SOTB transistors. Here, when the system controller designates a low speed mode to operate the CPU at a low speed, the substrate bias circuit supplies the substrate bias voltages to the P-type SOTB transistors and the N-type SOTB transistors.

An SRAM circuit that includes a biasing circuit adapted to selectively bias the transistors of the SRAM array to lower the threshold voltage of selected transistors. The SRAM circuit includes well voltages and positive voltages that are selectively different, and substrate voltages and ground voltages that are selectively different.

Methods, systems, and devices for back-bias optimization are described. An apparatus, such as an electronic apparatus, may include a first substrate region and a second substrate region. The apparatus may also include a voltage generator that is disposed on the first substrate region and that includes an output terminal coupled with a conductive path. The apparatus may also include a set of clamp circuits disposed on the second substrate region. The set of clamp circuits may be configured selectively couple the conductive path with a voltage supply.

A semiconductor device is provided. The semiconductor can apply different voltages to sources and bases (bulks, N-type well) of pull-up transistors and improves write margin of memory cells. An SRAM of the invention includes P-well regions PW_1 and PW_2, an N-well region NW, a first metal wire M1, and a second metal wire M2. The P-well regions PW_1 and PW_2 extend in a first direction, and pull-down transistors and accessing transistors are formed therein. The N-well region NW extends in first direction, and pull-up transistors are formed therein. The first metal wire M1 extends in the first direction on the N-well region NW and is electrically connected to the N-well region NW. The second metal wire M2 extends in a second direction orthogonal to the first direction and electrically connected to a common S/D region of a pair of pull-up transistors that are formed in the N-well region NW.

Body bias can be applied to optimize performance in a non-volatile storage system. Body bias can be set in an adaptive manner to reduce an error count of an error correcting and/or detecting code when reading data from non-volatile storage elements. Also, a body bias level can be increased or decreased as a number of programming cycles increases. Also, body bias levels can be set and applied separately for a chip, plane, block and/or page. A body bias can be applied to a first set of NAND strings for which operations are being performed by controlling a first voltage provided to a source side of the first set of NAND strings and a second voltage provided to a p-well. A source side of a second set of NAND strings for which operations are not being performed is floated or receives a fixed voltage.

Along with the miniaturization of the semiconductor memory device, the resistor and parasitic capacitance of the wires become large, which prevents the semiconductor memory device from being speeded up. In a semiconductor memory device having a semiconductor substrate having a main surface, a first memory cell row having a plurality of first memory cells arranged in parallel to a first direction in plan view on the main surface, a first word line connected to the plurality of first memory cells, a first word line driver for changing a potential of the first word line, and a control circuit for outputting a first predecode signal to the first word line driver via the first predecode line in response to a clock signal and an address signal, a repeater is inserted between the control circuit and the first word line driver.

Apparatus and methods are disclosed for providing a bias, comprising a bias generator circuit including a high voltage (HV) circuit configured to generate a regulated high voltage (HV) from an HV line and provide the regulated HV at an HV regulated line and a low voltage (LV) circuit configured to generate a low voltage (LV) differential from the HV line and to provide the LV differential at an LV line, wherein the LV circuit is configured to direct current used to generate the LV differential into the HV regulated line.

In a semiconductor storage device including a plurality of memory cells formed at a laminated substrate including a support layer, an insulating layer on the support layer, and a semiconductor layer on the insulating layer, the plurality of memory cells each include a floating gate transistor and a selection transistor. The floating gate transistor includes a first source region, a first drain region, a first body region, a first body contact region, a floating gate insulating film, and a floating gate electrode, and the selection transistor includes a second source region, a second drain region, a second body region, a second body contact region insulated from the first body contact region, a selection gate insulating film, and a selection gate electrode.