Provided is a neural network device including a plurality of word lines extending in a first direction, a plurality of bit lines extending in a second direction intersecting the first direction, and a plurality of memory cells arranged at points where the plurality of word lines and the plurality of bit lines intersect one another. Each of the plurality of memory cells includes at least two ferroelectric memories connected in parallel along a word line corresponding to each of the plurality of memory cells.

Methods, systems, and devices for deck-level shunting in a memory device are described. A memory device may include memory arrays arranged in a stack of decks over a substrate, and a combination of deck selection circuitry and shunting circuitry may be distributed among the decks to leverage common substrate-based circuitry, such as logic or addressing circuitry. For example, each memory array of a stack may include a set of digit lines and deck selection circuitry, such as deck selection transistors or other switching circuitry, operable to couple the set of digit lines with a column decoder that may be shared among multiple decks. Each memory array of a stack also may include shunting circuitry, such as shunting transistors or other switching circuitry operable to couple the set of digit lines with a plate node, thereby equalizing a voltage across the memory cells of the respective memory array.

Various aspects relate to a memory cell including: a thermally insulating layer disposed over one or more metallization layers of a metallization; an embedding structure disposed over the thermally insulating layer; and a spontaneously polarizable capacitor structure disposed at least partially within the embedding structure, wherein the spontaneously polarizable capacitor structure comprises a spontaneously polarizable memory element; wherein the thermally insulating layer is configured as a heat barrier to reduce a heat transfer through the embedding structure into the one or more metallization layers.

Some embodiments include an apparatus having horizontally-spaced bottom electrodes supported by a supporting structure. Leaker device material is directly against the bottom electrodes. Insulative material is over the bottom electrodes, and upper electrodes are over the insulative material. Plate material extends across the upper electrodes and couples the upper electrodes to one another. The plate material is directly against the leaker device material. The leaker device material electrically couples the bottom electrodes to the plate material, and may be configured to discharge at least a portion of excess charge from the bottom electrodes to the plate material. Some embodiments include methods of forming apparatuses which include capacitors having bottom electrodes and top electrodes, with the top electrodes being electrically coupled to one another through a conductive plate. Leaker devices are formed to electrically couple the bottom electrodes to the conductive plate.

Embodiments of a memory, and calibration and operation methods thereof for reading data in memory cells are disclosed. In an example, first data from a plurality of memory cells is sensed, each of the first data corresponding to a first bit. Measurements of first currents converted from voltages of the first data are obtained. Second data from the plurality of memory cells is sensed, each of the second data corresponding to a second bit which is different from the first bit. Measurements of second currents converted from voltages of the second data are obtained. One or more parameters corresponding to one or more components of a charge sharing circuit are adjusted until each of a plurality of reference currents provided by a plurality of transistors is within a predetermined range of a nominal value determined based on the measurements of first currents and the measurements of second currents.

A ferroelectric device includes a substrate, a first electrode on the substrate, and a hexagonal ferroelectric material on the first electrode. The first electrode comprises a single crystal epitaxial material. By using a single crystal epitaxial material for an electrode to a hexagonal ferroelectric material, a high-quality material interface may be provided between these layers, thereby improving the performance of the ferroelectric device by allowing for a reduced coercive field.

Methods, systems, and devices for sense timing coordination are described. In some systems, to sense the logic states of memory cells, a memory device may generate an activation signal and route the activation signal over a signal line (e.g., a dummy word line) located at a memory array level of the memory device to one or more sense amplifiers. Based on receiving the activation signal, a sense amplifier may latch and determine the logic state of a corresponding memory cell. A first sense amplifier may sense a state of a first memory cell at a first time and a second sense amplifier may sense a state of a second memory cell at a second time in response to the same activation signal due to a propagation delay of the activation signal routed over the signal line (e.g., and corresponding to a propagation delay for activating a word line).

A memory cell arrangement is provided that may include: a plurality of electrode layers, wherein each of the plurality of electrode layers comprises a plurality of through holes, each of the plurality of through holes extending from a first surface to a second surface of a respective electrode layer; a plurality of electrode pillars, wherein each of the plurality of electrode pillars comprises a plurality of electrode portions, wherein each of the plurality of electrode portions is disposed within a corresponding one of the plurality of through holes; wherein the respective electrode layer and a respective electrode portion of the plurality of electrode portions form a first electrode and a second electrode of a capacitor and wherein at least one memory material portion is disposed in each of the plurality of through holes in a gap between the respective electrode layer and the respective electrode portion.

A low power sequential circuit (e.g., latch) uses a non-linear polar capacitor to retain charge with fewer transistors than traditional CMOS sequential circuits. In one example, a sequential circuit includes pass-gates and inverters, but without a feedback mechanism or memory element. In another example, a sequential uses load capacitors (e.g., capacitors coupled to a storage node and a reference supply). The load capacitors are implemented using ferroelectric material, paraelectric material, or linear dielectric. In one example, a sequential uses minority, majority, or threshold gates with ferroelectric or paraelectric capacitors. In one example, a sequential circuit uses minority, majority, or threshold gates configured as NAND gates.

Self-referencing memory device, techniques, and methods are described herein. A self-referencing memory device may include a ferroelectric memory cell. The self-referencing memory device may be configured to determine a logic state stored in a memory cell based on a state signal generated using the ferroelectric memory cell and a reference signal generated using the ferroelectric memory cell. The biasing of the plate line of the ferroelectric memory cell may be used to generate the voltage need to generate the state signal during a first time period of an access operation and to generate the reference signal during a second time period of the access operation. Procedures and operations related to a self-referencing memory device are described.