Disclosed is a stateful logic-in-memory using silicon diodes. More particularly, the stateful logic-in-memory according to an embodiment of the present invention includes a plurality of silicon diodes, each of the silicon diodes includes an anode region, a first channel region, a second channel region and a cathode region and is included as a memory cell.

The array of diodes comprises a matrix plane of diodes arranged according to columns in a first direction and according to rows in a second direction orthogonal to the first direction. The said diodes comprise a cathode region of a first type of conductivity and an anode region of a second type of conductivity, the said cathode and anode regions being superposed and disposed on an insulating layer situated on top of a semiconductor substrate.

A device is disclosed that includes a driver, a sinker, a memory column, a reference column, a reference resistor and a sensing unit. At least one of the driver and the sinker has a trimmable resistance. For write operation, one of resistive memory cells is conducted based on a row location in the memory column thereof, the driver provides a write current flowing therethrough and the trimmable resistance is trimmed based on the row location. For read operation, the sensing unit senses a read current of the memory column and a reference current of the reference column and the reference resistor when one of the resistive memory cells and a positionally corresponding one of the reference bit cells are conducted.

Techniques are provided for managing voltages applied to memory cells in a cross-point array during a write operation (e.g., to transition from a resistive state into a conductive state). The techniques apply to thyristor memory cells and non-thyristor memory cells. Bitlines, connected by a wordline, are preconditioned to a voltage level, by a precondition device, to write data to one or more memory cells at intersections of the bitlines and the wordline. Each bitline is coupled to a high impedance device, a detect device, a precondition device and a clamp device. When a memory cell on a first bitline transitions from a resistive state into a conductive state, it pulls a voltage level of the first-bit line level low. A first clamp device maintains the voltage level at a level to de-bias the first bitline from the wordline, while other memory cells to be written along the wordline remain biased.

Techniques are provided for managing voltages applied to memory cells in a cross-point array during a write operation (e.g., to transition from a resistive state into a conductive state). The techniques apply to thyristor memory cells and non-thyristor memory cells. Bitlines, connected by a wordline, are preconditioned to a voltage level, by a precondition device, to write data to one or more memory cells at intersections of the bitlines and the wordline. Each bitline is coupled to a high impedance device, a detect device, a precondition device and a clamp device. When a memory cell on a first bitline transitions from a resistive state into a conductive state, it pulls a voltage level of the first-bit line level low. A first clamp device maintains the voltage level at a level to de-bias the first bitline from the wordline, while other memory cells to be written along the wordline remain biased.

According to one embodiment, a semiconductor integrated circuit includes a memory cell including first and second electrodes and a resistance change film therebetween, and a control circuit controlling a potential difference between the first and second electrodes. The control circuit reversibly changes the memory cell to a first resistive state by applying a first potential to the first electrode and by applying a second potential smaller than the first potential to the second electrode. The control circuit reversibly changes the memory cell to a second resistive state by applying a third potential to the first electrode and by applying a fourth potential smaller than the third potential to the second electrode.

A semiconductor integrated circuit includes: first and second wiring lines; resistive change memories disposed intersection regions of the first and second wiring lines; and a control circuit controlling the first and second drivers to select one of the first wiring lines and one of the second wiring lines, the control circuit changing a resistance of the selected one of the resistive change memories from the first resistive state to the third resistive state, and then changing the resistive state of the selected one of the resistive change memories from the third resistive state to the second resistive state.

The present disclosure provides a method for manufacturing a semiconductor device. The method includes providing a substrate. The substrate comprises a first well region having a first conductive type. The method also includes forming a first gate structure on the substrate. The method further includes forming a first doped region in the substrate. The first doped region has a second conductive type different from the first conductive type. The first gate structure and the first doped region are included in a first transistor. In addition, the method includes forming a capacitor structure electrically coupled to the first doped region of the substrate. The method also includes forming a second doped region in the substrate. The second doped region has the second conductive type, the second doped region and the first well region collectively serve a diode, and the second doped region is electrically coupled to the first electrode of the capacitor structure and the first doped region.

A complementary storage unit and a method of preparing the same, and a complementary memory. The complementary storage unit includes: a control transistor, a pull-up diode and a pull-down diode. The control transistor is configured to control reading and writing of the storage unit. One end of the pull-up diode is connected to a positive selection line, and the other end thereof is connected to a source end of the control transistor, so as to control a high-level input. One end of the pull-down diode is connected to a negative selection line, and the other end thereof is connected to the source end of the control transistor, so as to control a low-level input. The pull-up diode and the pull-down diode are symmetrically arranged in a first direction.

Provided is a dynamic memory structure and an operating method thereof. The dynamic memory structure includes a write gating device, a read gating device, and a capacitor. A first terminal of the write gating device, a first terminal of the read gating device, and a first terminal of the capacitor are connected together; a second terminal of the write gating device is a data writing end; a second terminal of the read gating device is a data reading end; and a second terminal of the capacitor is a gating end and connected to a word line. The write gating device and the read gating device are both unidirectionally conducted, and conduction modes of the write gating device and the read gating device are both threshold-on. A conduction threshold voltage of the write gating device is less than a conduction threshold voltage of the read gating device.