Patent classifications
G11C13/0011
CONTROLLING VOLTAGE RESISTANCE THROUGH METAL-OXIDE DEVICE
Embodiments of the present invention provide a computer system, a voltage resistance controlling apparatus, and a method that comprises at least two electrodes on proximal endpoints; a first layer disposed on the at least two electrodes, wherein the first layer is a made of a metal-oxide; a second layer disposed on the second layer, wherein the second first layer is made of an electrically conductive metal-oxide; a forming contact disposed on the second layer, wherein a combination of the forming contact disposed on the first layer disposed on the second layer operatively connects the at least two electrodes; and a computer system operatively connected to the forming contact, wherein the computer system is configured to apply a predetermined voltage to the first layer and the second layer respectively and display an overall resistance increase using a user interface.
NON-VOLATILE ANALOG RESISTIVE MEMORY CELLS IMPLEMENTING FERROELECTRIC SELECT TRANSISTORS
A device includes a non-volatile analog resistive memory cell. The non-volatile analog resistive memory device includes a resistive memory device and a select transistor. The resistive memory device includes a first terminal and a second terminal. The resistive memory device has a tunable conductance. The select transistor is a ferroelectric field-effect transistor (FeFET) device which includes a gate terminal, a source terminal, and a drain terminal. The gate terminal of the FeFET device is connected to a word line. The source terminal of the FeFET device is connected to a source line. The drain terminal of the FeFET device is connected to the first terminal of the resistive memory device. The second terminal of the resistive memory device is connected to a bit line.
Variable resistance memory device
A variable resistance memory device includes lower conductive lines on a substrate, upper conductive lines on the lower conductive lines to cross the lower conductive lines, and memory cells between the lower conductive lines and the upper conductive lines. The lower conductive lines are extended in a first direction and are spaced apart from each other in a second direction crossing the first direction. Each of the lower conductive lines include a first line portion extended in the first direction, a second line portion offset from the first line portion in the second direction and extended in the first direction, and a connecting portion connecting the first line portion to the second line portion.
Configurable non-volatile arithmetic memory operators
The Non-Volatile Arithmetic Memory Operator (NV-AMO) including a non-volatile memory cell for storing non-volatile data and a first input terminal for receiving volatile variable data is applied to perform the arithmetic operations over the volatile variable data and the non-volatile data. The NV-AMO can also be configured multiple-times for new computations. The constructions of NV-AMO in Arithmetic Logic Units (ALU) can be applied in DSP (Digital Signal Processor) computations and DNN (Deep Neural Network) computations.
NON VOLATILE RESISTIVE MEMORY LOGIC DEVICE
A resistance switching RAM logic device is presented. The device includes a pair of resistance switching RAM cells that may be independently programed into at least a low resistance state (LRS) or a high resistance state (HRS). The resistance switching RAM logic device may further include a shared output node electrically connected to the pair of resistance switching RAM cells. A logical output may be determined from the programmed resistance state of each of the resistance switching RAM cells.
THRESHOLD SWITCH STRUCTURE AND MEMORY CELL ARRANGEMENT
Various aspects relate to a threshold switch structure and a use of such threshold switch structure as a threshold switch in a memory cell arrangement, the threshold switch structure including: a first electrode, a second electrode, a switch element in direct physical contact with the first electrode and the second electrode, the switch element including a layer of a spontaneously polarizable material. The first electrode, the second electrode, and the switch element are configured to allow for a switching of the switch element between a first electrical conductance state and a second electrical conductance state as a function of a voltage drop provided over the switch element by the first electrode and the second electrode.
Electrical distance-based remapping in a memory device
Memory device systems and methods for using methods include multiple access lines arranged in a grid. Multiple memory cells are located at intersections of the access lines in the grid. Multiple drivers are included with each configured to transmit a corresponding signal to respective memory cells of the multiple memory cells. Remapping circuitry is configured to remap a near memory cell of the multiple memory cells to a far memory cell of the multiple memory cells. The near memory cell is relatively nearer to a respective driver of the multiple drivers than the far memory cell is to a respective driver of the multiple drivers.
Trench formation scheme for programmable metallization cell to prevent metal redeposit
Some embodiments relate to a memory device. The memory device includes a top electrode overlying a bottom electrode. A data storage layer overlies the bottom electrode. The bottom electrode cups an underside of the data storage layer. The top electrode overlies the data storage layer. A top surface of the bottom electrode is aligned with a top surface of the top electrode.
Arrays of Memory Cells and Methods of Forming an Array of Vertically Stacked Tiers of Memory Cells
An array of vertically stacked tiers of memory cells includes a plurality of horizontally oriented access lines within individual tiers of memory cells and a plurality of horizontally oriented global sense lines elevationally outward of the tiers. A plurality of select transistors is elevationally inward of the tiers. A plurality of pairs of local first and second vertical lines extends through the tiers. The local first vertical line within individual of the pairs is in conductive connection with one of the global sense lines and in conductive connection with one of the two source/drain regions of one of the select transistors. The local second vertical line within individual of the pairs is in conductive connection with another of the two source/drain regions of the one select transistor. Individual of the memory cells include a crossing one of the local second vertical lines and one of the horizontal access lines and programmable material there-between. Other aspects and implementations, including methods, are disclosed.
MEMORY-BASED VECTOR-MATRIX MULTIPLICATION
A memory device includes a memory array arranged in rows and columns; memory cell layers at each row and column intersection, where each memory cell layer is configured to be set to a predetermined conductance state; a row control circuit that is configured to apply voltages to the rows by applying sub-voltages on each row, where each sub-voltage corresponds to a different memory cell layer, and where each sub-voltage is proportional to the voltage on the corresponding row; and a sensing circuit that is configured to determine a column current flowing through a selected column in response to the application of the voltages to the rows, where the column current is a sum of currents through each memory cell layer that corresponds to the selected column.