A memory controller includes, in one embodiment, a memory interface and a controller circuit. The memory interface is configured to interface with a memory interface configured to interface with a memory having a plurality of memory blocks. Each memory block has a plurality of strings. The controller circuit is configured to perform a string defect leakage check on one of the memory blocks during a first programming operation of the one memory block, determine whether the one memory block has one or more string to string shorts based on the string defect leakage check, and resolve the string to string shorts in response to determining that the one of the memory blocks has the string to string shorts.

Semiconductor memory having both volatile and non-volatile modes and methods of operation. A semiconductor storage device includes a plurality of memory cells each having a floating body for storing, reading and writing data as volatile memory. The device includes a floating gate or trapping layer for storing data as non-volatile memory, the device operating as volatile memory when power is applied to the device, and the device storing data from the volatile memory as non-volatile memory when power to the device is interrupted.

A memory device includes a first bit line configured to supply a first bit line bias voltage, a memory cell transistor having a first operating voltage, a selection transistor having a second operating voltage and configured to control the supply of the first bit line bias voltage to a source of the memory cell transistor, and a second bit line connected to a drain of the memory cell transistor. A level of the first operating voltage is about equal to a level of the second operating voltage.

A memory control method, a memory storage device, and a memory control circuit unit are provided. The memory control method includes: programming multiple first memory cells in a first physical erasing unit in a rewritable non-volatile memory module; and applying an electronic pulse to at least one word line in the rewritable non-volatile memory module. The at least one word line is coupled to multiple second memory cells in the first physical erasing unit. The second memory cells include the first memory cells. The electronic pulse is not configured to read, program, or erase the second memory cells.

NOR memory strings may be used for implementations of logic functions involving many Boolean variables, or to generate analog signals whose magnitudes are each representative of the bit values of many Boolean variables. The advantage of using NOR memory strings in these manners is that the logic function or analog signal generation may be accomplished within one simultaneous read operation on the NOR memory strings.

The application provides a Content Addressable Memory (CAM) cell, a CAM memory device and an operation method thereof. The CAM cell includes: a plurality of parallel-coupled flash memory cells: wherein a storage data of the CAM cell is based on a combination of a plurality of threshold voltages of the parallel-coupled flash memory cells.

An operation method of a multi-bits read only memory includes a step of applying a gate voltage to a conductive gate, a first voltage to a first electrode, and a second voltage to a second electrode. The multi-bits read only memory of the present invention includes a substrate and a transistor structure with the conductive gate mounted between the first electrode and the second electrode. A multiplicity of M nanowire channels is mounted between the first electrode and the second electrode, and M is a positive integer greater than one. The present invention breaks multiple states of the multi-bits read only memory. The multiple states are programmable and include an i.sup.th state, and 1 <i <M . The aforementioned states allow storage of multiple bits on the read only memory, instead of just storing a single bit on the read only memory.

A 3-dimensional array of NOR memory strings being organized by planes of NOR memory strings, in which (i) the storage transistors in the NOR memory strings situated in a first group of planes are configured to be programmed, erased, program-inhibited or read in parallel, and (ii) the storage transistors in NOR memory strings situated within a second group of planes are configured for storing resource management data relating to data stored in the storage transistors of the NOR memory strings situated within the first group of planes, wherein the storage transistors in NOR memory strings in the second group of planes are configured into sets.

A method for forming a semiconductor memory structure includes following operations. A plurality of doped regions are formed in a semiconductor substrate. The doped regions are separated from each other. A stack including a plurality of first insulating layers and a plurality of second insulating layers alternately arranged is formed over the semiconductor substrate. A first trench is formed in the stack. The second insulating layers are replaced with a plurality of conductive layers. A second trench is formed. A charge-trapping layer and a channel layer are formed in the second trench. An isolation structure is formed to fill the second trench. A source structure and a drain structure are formed at two sides of the isolation structure.

A semiconductor device and methods of fabricating the same are disclosed. Generally, the method includes forming a tunnel-dielectric for a memory transistor over a surface of a substrate, forming a nitride charge-trapping layer over the tunnel-dielectric, and forming a gate-dielectric for a field-effect transistor over the surface of the substrate. Forming the gate-dielectric can include performing a number of oxidation processes to form a thick gate-oxide while concurrently forming a blocking-dielectric including an oxide layer over the charge-trapping layer of the memory transistor. In one embodiment, performing the oxidation processes includes performing an in-situ-steam-generation process to form the thick gate-oxide and the oxide layer of the blocking-dielectric, followed by a thermal oxidation process to increase a thickness of the thick gate-oxide and the oxide layer without altering a substantially uniform stoichiometric concentration of nitrogen across a thickness of the charge-trapping layer from the tunnel-dielectric to the blocking-dielectric.