Disclosed is a three-dimensional flash memory including a back gate, which includes word lines extended and formed in a horizontal direction on a substrate so as to be sequentially stacked, and strings penetrating the word lines and extended and formed in one direction on the substrate. Each of the strings includes a channel layer extended and formed in the one direction, and a charge storage layer extended and formed in the one direction to surround the channel layer, the channel layer and the charge storage layer constitute memory cells corresponding to the word lines, and the channel layer includes a back gate extended and formed in the one direction, with at least a portion of the back gate surrounded by the channel layer, and an insulating layer extended and formed in one direction between the back gate and the channel layer.

Some embodiments include apparatuses in which one of such apparatus includes a first memory cell including a first transistor having a first channel region coupled between a data line and a conductive region, and a first charge storage structure located between the first data line and the conductive region, and a second transistor having a second channel region coupled to and located between the first data line and the first charge storage structure; a second memory cell including a third transistor having a third channel region coupled between a second data line and the conductive region, and a second charge storage structure located between the second data line and the conductive region, and a fourth transistor having a fourth channel region coupled to and located between the second data line and the second charge storage structure; a conductive line forming a gate of each of the first, second, third, and fourth transistors; and a conductive structure located between the first and second charge storage structures and electrically separated from the conductive region.

Retention characteristics after rewriting can be improved.

A flash memory includes a plurality of sectors each of which includes a plurality of memory cells. In a case in which a fluctuation range of a threshold voltage in a memory cell on which a write operation is performed is greater than a fluctuation range of a threshold voltage in a memory cell on which an erase operation is performed, after one sector is used, when another sector is used, a write operation is performed on all the memory cells of the one sector.

A metal oxide semiconductor field effect transistors (MOSFET) memory array, including a complementary metal oxide semiconductor (CMOS) cell including an n-type MOSFET having a modified gate dielectric; and an n-type or p-type MOSFET having an unmodified gate dielectric layer, where the modified gate dielectric layer incorporates an oxygen scavenging species.

A memory device that includes a pair of non-volatile memory cells, a first memory cell including a first memory gate and a first select gate, and a second memory cell including a second memory gate and a second select gate. The first and second memory cells share a source line, and the first and second memory gates are not connected to one another.

A semiconductor device may include an insulating layer, a bulk pattern, a stack structure, and a channel pattern. A first trench may be formed in the insulating layer. A bulk pattern may be located in the first trench and includes a metal pattern and an electron hole source. The stack structure may be located on the insulating layer and includes conductive layers and insulating layers, which are alternately stacked. The channel pattern may penetrate the stack structure, and may be supplied with electron holes from the bulk pattern.

A memory cell of a charge-trapping non-volatile memory includes a semiconductor substrate, a well region, a first doped region, a second doped region, a gate structure, a protecting layer, a charge trapping layer, a dielectric layer, a first conducting line and a second conducting line. The first doped region and the second doped region are formed under a surface of the well region. The gate structure is formed over the surface of the well region. The protecting layer formed on the surface of the well region. The charge trapping layer covers the surface of the well region, the gate structure and the protecting layer. The dielectric layer covers the charge trapping layer. The first conducting line is connected with the first doped region. The second conducting line is connected with the second doped region.

A NOR flash memory comprising a memory cell having a three-dimensional structure for saving power consumption is provided. The flash memory of the present invention includes a pillar part, a charge accumulating part, an insulating part, a control gate and a selecting gate. The pillar part extends in a vertical direction from a surface of a substrate and includes a conductive semiconductor material. The charge accumulating part is formed by surrounding the pillar part. The insulating part is formed by surrounding the pillar part. The control gate is formed by surrounding the charge accumulating part. The selecting gate is formed by surrounding the insulating part. One end of the pillar part is electrically connected to a bit line via a contact hole and another one end of the pillar part is electrically connected to a conductive region formed on the surface of the substrate.

A non-volatile semiconductor memory device in which, while voltage from a first control line is applied, as a memory gate voltage, to a sub control line through a switching transistor, another switching transistor can block voltage application to a corresponding sub control line. Thus, while a plurality of memory cells are arranged in one direction along the first control line, the number of memory cells to which a memory gate voltage is applied can reduced by the switching transistor, which reduces the occurrence of disturbance, accordingly. The sub control line to which the memory gate voltage is applied from the first control line is used as the gates of memory transistors, and thus the sub control line and the gates are disposed in a single wiring layer, thereby achieving downsizing as compared to a case in which the sub control line and the gates are disposed in separate wiring layers.

One embodiment includes obtaining programming order information for the memory area from a first table based on address information. The programming order information indicates an order in which the memory area was programmed. The embodiment further includes determining an estimated elapsed time by accessing a second table based on the obtained programming order information. The estimated elapsed time indicating time that has elapsed since the portion of the memory area was last programmed. The embodiment includes controlling the memory based on the estimated elapsed time.