Patent classifications
G01B11/0658
Film thickness measurement device, film thickness measurement method, film thickness measurement program, and recording medium for recording film thickness measurement program
A film thickness measurement device includes a light output unit that outputs measurement light, a spectroscopic detection unit that detects detection light, and an analysis unit that compares a measured reflectance for each wavelength of a measurement object with a theoretical reflectance and analyzes a film thickness of a first film and a film thickness of a second film. The analysis unit acquire candidates for optimal solutions of the film thicknesses using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a first wavelength range and determines the optimal solutions of the film thicknesses out of the candidates for the optimal solutions using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a second wavelength range.
QUALITY CONTROL OF SUBSTRATE COATINGS
The present invention relates to devices and methods for detecting the amount (degree, extent) of material coating a medical device or substrate, in particular the present invention relates to devices and methods for detecting the amount of vaccine material coating a microarray patch.
Silicone detectability under UV light
A method of detecting a presence, location, quality, thickness or cure extent of an organopolysiloxane includes applying an organopolysiloxane on a component, which includes a hydrochromic pigment. The method includes exciting the hydrochromic pigment with a light source and measuring the emissions of the hydrochromic pigment.
FILM THICKNESS MEASUREMENT DEVICE, FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT PROGRAM, AND RECORDING MEDIUM FOR RECORDING FILM THICKNESS MEASUREMENT PROGRAM
A film thickness measurement device includes a light output unit that outputs measurement light, a spectroscopic detection unit that detects detection light, and an analysis unit that compares a measured reflectance for each wavelength of a measurement object with a theoretical reflectance and analyzes a film thickness of a first film and a film thickness of a second film. The analysis unit acquire candidates for optimal solutions of the film thicknesses using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a first wavelength range and determines the optimal solutions of the film thicknesses out of the candidates for the optimal solutions using a result of comparison between the measured reflectance and the theoretical reflectance for each wavelength of the measurement object in a second wavelength range.
Metrology for OLED manufacturing using photoluminescence spectroscopy
An apparatus for determining a characteristic of a photoluminescent (PL) layer comprises: a light source that generates an excitation light that includes light from the visible or near-visible spectrum; an optical assembly configured to direct the excitation light onto a PL layer; a detector that is configured to receive a PL emission generated by the PL layer in response to the excitation light interacting with the PL layer and generate a signal based on the PL emission; and a computing device coupled to the detector and configured to receive the signal from the detector and determine a characteristic of the PL layer based on the signal.
Oxide film thickness measurement device and method
An oxide layer thickness measurement device according to the present invention stores, for each of layer thickness measurement sub-ranges constituting a layer thickness measurement range, layer thickness conversion information representing a correlation between a layer thickness and an emissivity where a ratio of a change in the emissivity to a change in the layer thickness in the layer thickness measurement sub-range falls within a set extent. Emitting light luminances of a surface of a steel sheet are measured at respective measurement wavelengths different from each other, and a temperature of the surface of the steel sheet is measured to thereby calculate the emissivity at each of the measurement wavelengths. Calculated in connection with the emissivity calculated at each of the measurement wavelength are the layer thickness corresponding to the emissivity at the measurement wavelength, and a ratio at the layer thickness by using the layer thickness conversion information corresponding to the measurement wavelength. The calculated thickness is extracted as a candidate value for an actual layer thickness when the calculated ratio is within the preset extent assigned for the layer thickness conversion information.
METROLOGY FOR OLED MANUFACTURING USING PHOTOLUMINESCENCE SPECTROSCOPY
An apparatus for determining a characteristic of a photoluminescent (PL) layer comprises: a light source that generates an excitation light that includes light from the visible or near-visible spectrum; an optical assembly configured to direct the excitation light onto a PL layer; a detector that is configured to receive a PL emission generated by the PL layer in response to the excitation light interacting with the PL layer and generate a signal based on the PL emission; and a computing device coupled to the detector and configured to receive the signal from the detector and determine a characteristic of the PL layer based on the signal.
SILICONE DETECTABILITY UNDER UV LIGHT
A method of detecting a presence, location, quality, thickness or cure extent of an organopolysiloxane includes applying an organopolysiloxane on a component, which includes a hydrochromic pigment. The method includes exciting the hydrochromic pigment with a light source and measuring the emissions of the hydrochromic pigment.
Inspection apparatus, inspection method, computer program and recording medium
An inspection apparatus is provided with: an irradiating device configured to irradiate a sample in which a plurality of layers are laminated with a terahertz wave; a detecting device configured to detect the terahertz wave from the sample to obtain a detected waveform; and an estimating device configured to estimate a position of a first boundary surface on the basis of a second boundary surface pulse wave and a library, the second boundary surface pulse wave appearing in the detected waveform to correspond to a second boundary surface that is farther from an outer surface than the first boundary surface, the library representing an estimated waveform of the terahertz wave from the sample.
Optical Arrangement for an Inspection Apparatus
An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.