A laser beam profiler unit for measuring an intensity distribution of a laser beam oscillated from a laser oscillator includes a magnifying optical system for magnifying a spot diameter of the laser beam oscillated from the laser oscillator and focused by a condensing lens, a first transmission prism for attenuating the laser beam, a second transmission prism for further attenuating a laser beam reflected by the first transmission prism, an image capturing element for detecting the laser beam reflected by the second transmission prism, and an analyzer for analyzing an intensity distribution of a spot of the laser beam from data of the laser beam detected by the image capturing element.

An image sensor module includes a circuit board, an image sensor, and a turning prism. The circuit board has first and second side sections each extending in a respective plane transverse to a plane of a center section to define a module interior volume. The image sensor has a bottom plane mounted on an inner face of the circuit board within the module interior volume. The turning prism has a mounting surface secured to a top plane of the image sensor. An electronic component arrangement is operatively mounted on the inner face of the circuit board between the image sensor and a circuit board rearward end. A number of wires providing power and data connections to the circuit board are operatively connected to contacts located on the circuit board in the interior volume between the electronic component arrangement and the circuit board rearward end.

The invention relates to a beam analysis device (10) for determining the axial position of the focal point (71) of an energy beam or a sample beam (70) decoupled from an energy beam, comprising a beam-shaping device (12), a detector (40), and an analysis device (45). The beam-shaping device (12) is designed to release two sub-beams (72, 73) from the sample beam (70) on a plane of the sub-beam release process (19). The cross-sections of the two sub-beams (72, 73) are defined by sub-apertures (32, 33) which are delimited from each other and which are arranged at a distance k to each other in a first lateral direction (31). The beam-shaping device (12) is designed to image the two sub-beams (72, 73) in order to form two beam spots (92, 93) on the detector and deflect at least one of the two sub-beams (72, 73) in a second lateral direction (37) which is oriented transversely to the first lateral direction (31) in order to form a distance w in the second lateral direction (37) between the two beam spots (92, 93). The analysis device (45) is designed to determine the distance a along the first lateral direction (31) between positions of the two beam spots (92, 93) on the detector (40) and to determine the axial position of the beam focus (71) on the basis of the distance a and/or to determine a change in the axial position of the beam focus (71) on the basis of a change in the distance a. The invention also relates to a corresponding method for determining the axial position of a beam focus (71).

Described herein is a method and apparatus for an optical system configured to output redundant outputs, where the optical system includes at least one optical device configured to receive an optical signal; at least one optical transducer, wherein each at least one optical transducer is configured to receive the optical signal from the at least one optical device and convert the optical signal to an electrical signal; and at least one electronic device configured to receive each electrical signal and output the redundant outputs.

Target devices for characterizing terahertz imaging systems are provided. The target devices include a terahertz resolution pattern having spatially distributed resolution features and one or more prism assemblies configured to provide a variable contrast level within the resolution features when used with terahertz radiation. Each prism assembly includes first and second prisms arranged in a Frustrated Total Internal Reflection (FTIR) configuration.

Embodiments of the present invention include a backscatter reductant anamorphic beam sampler. The beam sampler can be implemented to measure a power of a reference beam generated by an electromagnetic radiation source in proportion to a power of a working beam. The beam sampler can provide astigmatic correction to a divergence of the working beam along one axis orthogonal to a direction of propagation. The beam sampler can further be implemented to prevent backscatter reentrant radiation from impinging upon a photodetector of the beam sampler resulting in a reduction of error and instability in an assay of the working beam.

Light detection systems for measuring light (e.g., in a flow stream) are described. Light detection systems according to embodiments include a light scatter detector, a brightfield photodetector and an optical adjustment component configured to convey light to the light scatter detector and to the brightfield photodetector. Systems and methods for measuring light emitted by a sample (e.g., in a flow stream) and kits having a light scatter detector, a brightfield photodetector and a beam splitter component are also provided.

An optical parameter measurement device and a corresponding method are provided. A light beam from a to-be-tested display panel is split by a beam-splitting assembly into at least two testing light beams. A voltage value corresponding to a first testing light beam is measured by a trans-impedance amplification circuit corresponding to a first optical sensor. Next, an integration time period is determined by a control circuit according to voltage values from the trans-impedance amplification circuit and a predetermined relational model between voltage values corresponding to the light intensities and integration time periods. A voltage value corresponding to a second testing light beam is finely measured by the integration circuit corresponding to a second optical sensor within the integration time period. Finally, the display brightness value of the to-be-tested display panel is determined by the control circuit according to a voltage value from the integration circuit within the integration time period.

Embodiments of the present invention include a backscatter reductant anamorphic beam sampler. The beam sampler can be implemented to measure a power of a reference beam generated by an electromagnetic radiation source in proportion to a power of a working beam. The beam sampler can provide astigmatic correction to a divergence of the working beam along one axis orthogonal to a direction of propagation. The beam sampler can further be implemented to prevent backscatter from impinging upon a photodetector of the beam sampler resulting in a reduction of error and instability in measurements taken by the beam sampler.

Described are an apparatus and a method for manufacturing a three-dimensional body comprising mutually oriented devices. In accordance with the invention, a substrate having a first and a second substrate region is provided. A first device is provided in the first substrate region. A second device is provided in the first or in the second substrate region. The substrate is bent along at least one bending edge in order to obtain a three-dimensional body. In accordance with the invention, the first device and the second device are oriented to each other by the bending in order to provide a communications path between the same.