Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

Provided is an imaging device including: an imaging unit (130) that generates a one frame image by sequentially receiving each reflected light reflected by a subject by intermittently and sequentially irradiating the subject with each irradiation light having a different wavelength according to a position of the moving subject, temporarily and sequentially holding signal information based on the reflected light of each wavelength, and collectively reading the held signal information; and a combining unit (140) that generates a combined image by cutting a subject image corresponding to the reflected light of each wavelength from the one frame image and superimposing a plurality of the cut subject images.

Various surface and structural defects are currently inspected visually. This method is labor intensive, requiring large maintenance man hours, and is prone to errors. To streamline this process, herein is described an automated inspection system and apparatus based on several optical technologies that drastically reduces inspection time, provides accurate detection of defects, and provides a digital map of the location of defects. The technology uses a sensor that includes a pattern projection generator for generating a pattern image on the structural surface and a camera for detecting the pattern image generated by the pattern projection generator on the structural surface. Furthermore, the technology utilizes an image processing and correction apparatus for performing a pattern image and structural surface defect map correction and generate a distortion corrected defect map for a surface scan area on the structure that is incident on the sensor.

An optical sorter includes a first light source disposed on a first side, a second light source disposed on a second side, an optical sensor configured to detect light during a plurality of scan periods including a first scan period and a second scan period, a determination part configured to determine a foreign object and/or a defective product, and a light source control part. The light source control part is configured to control the first light source and the second light source during the first scan period so as to turn on the first light source and/or the second light source in a first lighting pattern, which is a lighting pattern arbitrarily selected from a lighting pattern in which the first light source and the second light source are at least partially on, a lighting pattern in which only one of the first light source and the second light source is at least partially on, and a lighting pattern in which only the other of the first light source and the second light source is at least partially on, and is also configured to control the first light source and the second light source during the second scan period so as to turn on the first light source and/or the second light source in a second lighting pattern, which is a lighting pattern selected arbitrarily except for the first lighting pattern.

A device to detect defects in a finished surface by analyzing images thereof taken under lighting of different colors includes a supporting mechanism, a transmitting mechanism, a detecting mechanism, and a processor. The transmitting mechanism carries and transmits the product. The detecting mechanism includes a detecting frame, and a light source assembly. The processor connects to a camera assembly, and preprocesses images obtained of the long side surfaces, of the width side surfaces, and of the chamfered side surfaces of the product to detect any defects of these surfaces of the product.

Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

A multispectral light assembly for an illumination system includes a multispectral light source configured to generate a plurality of different wavelengths of light and a light pipe positioned in front of the multispectral light source and configured to provide color mixing for two or more of the plurality of different wavelengths. The multispectral light assembly also includes a diffusive surface on the light pipe and a projection lens positioned in front of the diffusive surface. A processor device may be in communication with the multispectral light assemblies and may be configured to control activation of the multispectral light source.

A hand-held test device and a method for testing an object having at least one retrore-flective region and at least one fluorescent region, e.g. an item of high-visibility clothing. The hand-held test device includes a white light LED, a UV LED, a connnon photoreceiver, and a control unit. In a reflection test mode, a reflective region is briefly irradiated with white light and reflects onto the photoreceiver. In at least one fluorescence test mode, ultraviolet light is emitted by the onto a fluorescent region, which generates fluorescent light of a corresponding colour via the fluorescence, which is received by the photoreceiver. In all test modes, a receive sig corresponding with the irradiation strength is generated at the photoreceiver and transmitted to the control unit for evaluation, e.g. for carrying out a threshold value comparison with a predefined threshold value for the receive signal. Every test mode can preferably have a separate predefined threshold value for this purpose.

According to an aspect there is provided an illumination system for illumination of a sample in a container, such as a well of a microplate or a petri dish, the container comprising a bottom surface and side walls which together define a volume for receiving the sample, the illumination system comprising: at least one light source; a mask comprising an opaque portion, preventing light from passing through the mask, and an at least partially transparent portion, allowing light to pass through the mask; wherein the illumination system is adapted to be positioned such that the light generated by the light source, passing through the mask, illuminates the sample in the container; and wherein the light source and the mask are configured such that a shape, a size, and a position of a projection of the light passing through the mask, onto a plane of the bottom surface, match a shape, a size, and a position of the bottom surface.

According to the embodiment, an optical inspection method for a surface state of a subject includes acquiring and discriminating. The acquiring includes acquiring a color vector of a color corresponding to a wavelength spectrum in a color coordinate system of n dimensions (n is a natural number equal to or larger than 1), which is equal to or smaller than a number of a plurality of color channels of pixels of an image sensor, with optical imaging using a wavelength spectrum selection portion that selectively allows a plurality of wavelength spectra different from one another from a surface of the subject to pass. The discriminating includes discriminating the surface state of the subject based on a direction of the color vector in the color coordinate system.