The invention relates to a device (1) for measuring the surface condition of a component (4, 5, 6). Said device (1) comprises a measurement member (2) comprising at least one sensor (21, 22, 23) capable of measuring at least one datum relating to the surface condition of the component (4, 5, 6) and at least one transmitter (24) capable of transmitting the datum from the sensor (21, 22, 23). The measurement device (1) also comprises a support (3) for the measurement member (2), the support comprising means for connecting same to the component (4, 5, 6).

To suitably determine a measurement cycle at which to measure cracks that occur in structures formed from concrete or the like. Resolution Means: A measurement cycle determination device (2) includes a related information acquisition unit (41) that acquires at least one of geographic information including items related to a geography of a site where a structure is located, weather information including items related to weather at the site, and structure information including items related to the structure; a crack information acquisition unit (42) that acquires crack information related to a crack that has occurred in the structure; a measurement cycle determination unit (44) that determines, on the basis of at least one of the geographic information, the weather information, the structure information, and the crack information, a measurement cycle at which to measure a width of the crack; and a measurement cycle output unit (46) that outputs a measurement cycle signal indicating measurement cycle information related to the determined measurement cycle.

A shrimp processing system conveys raw peeled shrimps to an imaging chamber in which shrimp bits and shrimps with residual shell are detected and diverted from the stream of acceptable shrimps allowed to pass on to downstream processing. An ultraviolet (UV) light source in the imaging chamber is constantly on. A visual inspection system takes images of the passing stream of shrimp when a white-light source is turned on to illuminate an exposure region to detect bits, clumps of shrimps, and acceptable individual shrimps. The visual inspection system takes images of the passing stream when the white-light source is turned off and the exposure region is subjected only to ultraviolet radiation. The visual inspection system detects shrimps with residual shell in the V images. Shrimp bits and shrimps with residual shell are diverted from the stream of shrimps by air jet nozzles to corresponding reject destinations.

According to an embodiment, an optical apparatus includes an illumination unit, a light-receiving unit and a processing unit. The illumination unit can illuminate an object with a plurality of pattern rays including rays with different wavelengths simultaneously. The light-receiving unit includes a pixel that can receive the rays from the object to disperse at least two of the different wavelengths included in the pattern rays. The processing unit acquires information on the object based on a result of the pixel of the light-receiving unit receiving the pattern rays with which the illumination unit illuminates the object simultaneously.

The invention relates to a luminaire element (10, 11) for an inspection tunnel (100), in particular for checking shiny surfaces, in particular painted surfaces, comprising at least two, preferably strip-like, arrangements (12) of light sources (13) in a luminaire housing (14) having at least two edge regions (15) lying opposite one another along a longitudinal extension (L) of the luminaire housing (14), wherein the strip-like arrangements (12) of the light sources (13) are formed along the longitudinal extension (L) at the edge regions (16), wherein a light exit surface (20) of the luminaire housing (14) has a higher radiation intensity along the edge regions (16) than in a central region (30). The invention further relates to a luminaire strip (50) having an arrangement of luminaire elements (10, 11) of this kind and to an inspection tunnel having an arrangement of a plurality of luminaire strips (50).

Provided are a structure inspection method and a structure inspection system capable of easily detecting an abnormal location and inspecting an internal state of the abnormal location in detail. The structure inspection method includes: a step of capturing a thermal image of a surface of a structure with an infrared camera; a step of detecting a first region estimated to have an internal abnormality, on the basis of the thermal image; and a step of measuring an internal state of the first region in a case where the first region is detected. In the step of measuring the internal state of the first region, the internal state of the first region is measured by capturing an image that visualizes the internal state of the first region using an electromagnetic wave or an ultrasonic wave.

A method for inspection of multiple features of patterned objects in the manufacture of electrical circuits, the method including performing defect detection on the patterned object, employing an optical defect detection machine (ODDM) and employing the ODDM to measure at least one of spatial coordinates and physical attributes of at least some of the multiple features.

Method for optically inspecting containers, where the containers are transported to an inspection unit with an illumination unit and with a camera, where light emitted from a planar light-emitting surface of the illumination unit is transmitted or reflected via said containers, where the camera records in at least one camera image at least one of the respective containers and the light transmitted or reflected via them, where the light emitted from the light-emitting surface is locally encoded on the basis of a wavelength property and is recorded by the camera in such a way that different emission locations of the light-emitting surface can be distinguished from one another in the at least one camera image, and that the image processing unit evaluates the at least one camera image for location information of the emission locations, in order to distinguish the defects from the foreign objects.

An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

An optical inspection device includes: a barrel; a first light source unit at a first side of the barrel and configured to irradiate light of a first wavelength range through a first light path; a second light source unit at a second side of the barrel, the second side being different from the first side, and configured to irradiate light of a second wavelength range that is different from the first wavelength range through a second light path; and a camera. At least a portion of the first light path is different from the second light path.