A method for fabricating a semiconductor device is provided. The method for fabricating the semiconductor device includes forming a semiconductor pattern including a first layer and a second layer on a substrate, forming a coating layer on a surface of the first layer, forming a dyeing substance in which one of an antibody or a protein is combined with a fluorophore, attaching the dyeing substance to a surface of the coating layer to form a dyeing layer, and photographing the fluorophore with an ultra-high resolution microscope to detect the semiconductor pattern.

A method for fabricating a semiconductor device is provided. The method for fabricating the semiconductor device includes forming a semiconductor pattern including a first layer and a second layer on a substrate, forming a coating layer on a surface of the first layer, forming a dyeing substance in which one of an antibody or a protein is combined with a fluorophore, attaching the dyeing substance to a surface of the coating layer to form a dyeing layer, and photographing the fluorophore with an ultra-high resolution microscope to detect the semiconductor pattern.

Method for manufacturing a microarray and verifying the quality of said microarray, wherein the method comprises: —providing at least one reagent, —loading said at least one reagent in a dispensing print head, in a predetermined arrangement, —moving the print head with respect to a substrate and dispensing said at least one reagent on the substrate, during a print pass, to obtain a microarray, —illuminating the substrate using illumination means and obtaining an image of the printed microarray on the substrate, using a camera, —processing the obtained image to verify the quality of the microarray, wherein the step of obtaining an image of the printed microarray comprises: —illuminating the substrate and obtaining an image of the microarray by means of illumination means and a camera which are connected to and move together with the print head with respect to the substrate, the illumination means and the camera being adapted to move behind the print head.

Method for manufacturing a microarray and verifying the quality of said microarray, wherein the method comprises: —providing at least one reagent, —loading said at least one reagent in a dispensing print head, in a predetermined arrangement, —moving the print head with respect to a substrate and dispensing said at least one reagent on the substrate, during a print pass, to obtain a microarray, —illuminating the substrate using illumination means and obtaining an image of the printed microarray on the substrate, using a camera, —processing the obtained image to verify the quality of the microarray, wherein the step of obtaining an image of the printed microarray comprises: —illuminating the substrate and obtaining an image of the microarray by means of illumination means and a camera which are connected to and move together with the print head with respect to the substrate, the illumination means and the camera being adapted to move behind the print head.

A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.

An inspection apparatus is an inspection apparatus includes an excitation light source that generates excitation light to irradiate the object, a dichroic mirror that separates fluorescence from the sample by transmitting or reflecting the fluorescence according to a wavelength, a camera that images fluorescence reflected by the dichroic mirror, a camera that images fluorescence transmitted through the dichroic mirror, and a control apparatus that derives color irregularity information of a light-emitting element based on a first fluorescence image acquired by the camera and a second fluorescence image acquired by the camera, and an edge shift width corresponding to a width of a wavelength band in which transmittance and reflectance change according to a change in wavelength in the dichroic mirror is wider than a full width at half maximum of a normal fluorescence spectrum of the light-emitting element.

An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.

A method of installing a glass panel on a vehicle that includes an opaque coating formed about a perimeter of the glass panel that includes a plurality of voids where the opaque coating is absent. The method includes determining whether a primer has been applied to the opaque coating by inspecting the glass panel to determine whether at least some of the plurality of voids have been covered by the primer. After determining whether a primer has been applied to the opaque coating, it is determined whether the primer has been correctly applied to the opaque coating by inspecting the glass panel to determine whether each of the plurality of voids has been covered by the primer. Then, after determining whether the primer has been correctly applied, an adhesive may be applied to the primer and the glass panel may be installed on the vehicle.