Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

The disclosure features systems and methods that include: exposing a biological sample to an ion beam that is incident on the sample at a first angle to a plane of the sample by translating a position of the ion beam on the sample in a first direction relative to a projection of a direction of incidence of the ion beam on the sample; after each translation of the ion beam in the first direction, adjusting a focal length of an ion source that generates the ion beam; and measuring and analyzing secondary ions generated from the sample by the ion beam after adjustment of the focal length to determine mass spectral information for the sample, where the sample is labeled with one or more mass tags and the mass spectral information includes populations of the mass tags at locations of the sample.

A method for analyzing secondary ion mass spectrum data representing respective secondary ion counts for a range of masses at a given mass resolution. The mass spectrum data is obtained by Secondary Ion Mass Spectrometry, SIMS. Automatic quantification of the ion species and/or cluster ions detected in the analyzed spectrum data is provided.

A method for analyzing secondary ion mass spectrum data representing respective secondary ion counts for a range of masses at a given mass resolution. The mass spectrum data is obtained by Secondary Ion Mass Spectrometry, SIMS. Automatic quantification of the ion species and/or cluster ions detected in the analyzed spectrum data is provided.

Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.

Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.

A positive electrode active material has crystalline C having a crystalline major-axis orientation degree DoA of 0.5 to 1 and a crystalline c-axis orientation degree of less than 0.5, wherein among total crystallines in a cross section of a positive electrode active material particle, a ratio of the crystalline C is in a range of 25% to 70%. A positive electrode and a lithium secondary battery which include the same are also provided.

A positive electrode active material has crystalline C having a crystalline major-axis orientation degree DoA of 0.5 to 1 and a crystalline c-axis orientation degree of less than 0.5, wherein among total crystallines in a cross section of a positive electrode active material particle, a ratio of the crystalline C is in a range of 25% to 70%. A positive electrode and a lithium secondary battery which include the same are also provided.

Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.

Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.