Embodiments described herein generally relate to a DMD. The DMD includes a base and a plurality of mirrors disposed on the base. Each mirror of the plurality of mirrors has a surface facing away from the base, and a structure is disposed on the surface of each mirror. The structure enhances the reflectance of the surface of each mirror, which enhances the efficiency of light manipulation and delivery.

A method for producing a reflector element and a reflector element are disclosed. In an embodiment the method includes depositing a layer sequence on a substrate, wherein the layer sequence includes at least one mirror layer and at least one reactive multilayer system and igniting the reactive multilayer system in order to activate heat input in the layer sequence.

A method of reducing surface roughness of DUV reflectance coatings for a DUV mirror to improve the reflectance of the DUV mirror includes: forming the reflectance coating on a substrate, the reflectance coating including a film stack comprising multiple dielectric layers, including an uppermost layer. The method also includes adding to the uppermost layer a cap layer comprising SiO.sub.2 and having an upper surface with an initial RMS amount of surface roughness. The method further includes adding a sacrificial layer to the upper surface of the cap layer, wherein the sacrificial layer comprises SiO.sub.2. The method also includes etching the sacrificial layer down to the cap layer so that the upper surface of the cap layer has a final RMS amount of surface roughness that is less than the initial amount of surface roughness.

A reflective mirror is provided with a base and a multilayer film including a first layer and a second layer laminated alternately on the base and capable of reflecting at least a portion of incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion having a second thickness that is different from the first thickness, and which is provided at a position rotationally symmetric to that of the first portion about an optical axis of the reflective mirror.

A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH).sup.N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer1. The low index dielectric material may have an index of refraction n.sub.L from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction n.sub.H from about 1.8 to about 3.5, wherein n.sub.H>n.sub.L and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

A reflective mirror is provided with a base and a multilayer film including a first layer and a second layer laminated alternately on the base and capable of reflecting at least a portion of incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion having a second thickness that is different from the first thickness, and which is provided at a position rotationally symmetric to that of the first portion about an optical axis of the reflective mirror.

A colored mirror includes a transparent substrate, a reflective metal layer and at least one interface layer between the substrate and the metal layer, wherein the interface layer includes at least one discontinuous metal layer, and at least one overlayer of a dielectric material deposited on the discontinuous layer. The discontinuous metal layer allows the adaptation of the color reflected by the mirror. The nominal thickness thereof and the type of material, as well as the nature and thickness of the dielectric overlayer, play a role in obtaining the color of the mirror.

An expanded cold mirror is provided. The mirror includes a substrate and a coating deposited on the substrate. The coating includes a first coating stack comprising at least one period of a low refractive index metal oxide coating layer and a high refractive index metal oxide coating layer, a second coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal oxide layer, and a third coating stack comprising at least one period of a low refractive index metal fluoride coating layer and a high refractive index metal fluoride coating layer.

An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

The invention relates to an optical lens comprising a substrate having a front main face and a rear main face, at least one main face of which being successively coated with a first high refractive index sheet which does not comprise any Ta.sub.2O.sub.5 layer, a second low refractive index sheet a third high refractive index sheet, a monolayer sub-layer having a thickness higher than or equal to 100 nm, and a multilayer interferential coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer. A mean reflection factor selected from Ruv for UV light, Rv for visible light and RsNIR for near infrared light is higher than or equal to 10-15% on at least one main face.