A mirror for extreme ultraviolet light includes: a substrate (41); a multilayer film (42) provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer (53) provided on the multilayer film, and the capping layer includes a first layer (61) containing an oxide of a metal, and a second layer (62) arranged between the first layer and the multilayer film and containing at least one of a boride of the metal and a nitride of the metal.

Systems and methods for providing invisible sensor aperture for electronic devices. In one embodiment, an example device may have a display that includes a cover layer, a first layer disposed on the cover layer, the first layer having a substantially white ink that is translucent, a second layer disposed on the first layer, the second layer having the substantially white ink, a third layer disposed on the second layer, the third layer having the substantially white ink, and a fourth layer comprising a dark-colored ink, wherein the fourth layer includes a first aperture aligned with a sensor of the device located beneath the fourth layer.

An electrochromic device composed of a pattern forming layer, an optical coating layer, an electrochromic component, and an opaque white layer arranged is revealed. The pattern forming layer has at least one pattern-shaded hollow hole for exposure of the optical coating layer. The optical coating layer which includes at least two layers of high and low refractive index material stacked alternately is the main layer to render colors. When transmittance of the electrochromic component which generates color changes is lower than 50%, a difference in the transmittance at 500 nm, 600 nm, and 700 nm is no more than 10%. Under such colored state, the color of light reflected by the optical coating layer is enhanced. The opaque white layer is for a sharper color contrast of the reflected light. Thereby light reflected by the optical coating layer show colors different from those of the electrochromic component in bleached and colored states.

A goggle lens suitable for golfers to wear all-weather and a method of manufacturing the same are provided. The goggle lens comprises: a substrate, by weight, comprising: 1000 parts of resin, 0.038998 parts of yellow pigment, 0.041715 parts of green pigment, 0.014272 parts of blue pigment, 0.024569 parts of purple pigment, 0.0021 parts of orange pigment, and 0.010859 parts each of 580 nm light absorber and 490 nm light absorber; a high-reflection layer arranged on one surface of the substrate that is adapted to be away from eyes of the golfer; an anti-reflection layer arranged on another surface of the substrate that is adapted to be adjacent to the eyes of the golfer; two hardened layers arranged between the high-reflection layer and the substrate, and between the anti-reflection layer and the substrate; and one photocatalytic antibacterial layer; wherein a light transmittance of the goggle lens is between 27% and 29%.

The present disclosure relates to semiconductor structures and, more particularly, to a photonic chip security structure and methods of manufacture. The structure includes an optical component over a substrate material, and at least one vertical wall including a reflecting material within a dielectric stack of material and surrounding the optical component.

A reflective optical element (17), in particular for an illumination optical unit of a projection exposure apparatus includes: a structured surface (25a) that preferably forms a grating structure (29), and a reflective coating (36) that is applied to the structured surface (25a). The reflective coating (36) covers the structured surface (25a) discontinuously, and the reflective optical element (17) has at least one protective layer (37) that covers the structured surface (25a) continuously. Also disclosed are an illumination optical unit (4) for a projection exposure apparatus (1) including at least one reflective optical element (17) of this type, to a projection exposure apparatus (1) including an illumination optical unit (4) of this type, and to a method for producing a protective layer (37) on a reflective optical element (17) of this type.

The optical product includes an optical multilayer film which is disposed on one surface or both surfaces of a base directly or via an intermediate film. The optical multilayer film is obtained by alternately disposing an SiO.sub.2 layer and a ZrO.sub.2 layer, forming nine layers in total, such that a first layer counting from the base is the SiO.sub.2 layer. The optical thickness of the SiO.sub.2 layer as the first layer is not greater than 0.120×λ/4 when a design wavelength is λ (500 nm), the optical thickness of the ZrO.sub.2 layer as a second layer is not less than 0.400×λ/4, the optical thickness of the SiO.sub.2 layer as a third layer is not less than 0.230×λ/4, and the optical thickness of the SiO.sub.2 layer as a seventh layer is not less than 0.450×λ/4.

According to at least one feature of the present disclosure, a method of forming an optical element, includes: Depositing an aluminum layer atop a glass substrate via a physical deposition process; depositing a first fluorine containing layer atop the aluminum layer via a physical deposition process; depositing a second fluorine containing layer atop the first fluorine containing layer via a physical deposition process; and depositing a third fluorine containing layer atop the first fluorine containing layer via an atomic layer deposition process.

A multilayer coating has a substrate, an optical layer, and a buffer layer between the substrate and the optical layer. The buffer layer has a coefficient of thermal expansion between that of the substrate and the optical layer. The multilayer coating has properties that enable its use in deep ultraviolet (DUV) wavelengths, such as for a multilayer mirror or edge filter. This multilayer coating with a buffer layer provides improved thermal stability and lifetime.

Multilevel leaky-mode optical elements, including reflectors, polarizers, and beamsplitters. Some of the elements have a plurality of spatially modulated periodic layers coupled to a substrate. For infrared applications, the optical elements may have a bandwidth larger than 600 nanometers.