An electronic device may include conductive structures having a visible-light-reflecting coating. The coating may include a seed layer, transition layers, a neutral-color base layer, and an uppermost layer that forms a single-layer interference film. The neutral-color base layer may be opaque to visible light. The interference film may include silicon and may have an absorption coefficient between 0 and 1. The interference film may include, for example, CrSiN or CrSiCN. The composition of the interference film, the thickness of the interference film, and/or the composition of the base layer may be selected to provide the coating with a desired color near the middle of the visible spectrum (e.g., at green wavelengths). The color may be relatively stable even if the thickness of the coating varies across its area.

A bandpass filter may include a set of layers. The set of layers may include a first subset of layers. The first subset of layers may include hydrogenated germanium (Ge:H) with a first refractive index. The set of layers may include a second subset of layers. The second subset of layers may include a material with a second refractive index. The second refractive index may be less than the first refractive index.

A method for producing an optical element (2), in particular for a projection exposure system (400), according to which a protective layer (11) consisting of a protective material is applied to a surface of a main body (7) until a protective layer thickness is obtained. The main body (7) has a substrate (17) and a reflective layer (18) applied to the substrate (17). The protective layer (11) is at least substantially defect-free.

An aerospace mirror having a reaction bonded (RB) silicon carbide (SiC) mirror substrate, and a SiC cladding on the RB SiC mirror substrate forming an optical surface on a front side of the aerospace mirror. A method for manufacturing an aerospace mirror comprising obtaining a green mirror preform comprising porous carbon, silicon carbide (SiC), or both, the green mirror preform defining a front side of the aerospace mirror and a back side of the aerospace mirror opposite the front side; removing material from the green mirror preform to form support ribs on the back side; infiltrating the green mirror preform with silicon to create a reaction bonded (RB) SiC mirror substrate from the green mirror preform; forming a mounting interface surface on the back side of the aerospace mirror from the RB SiC mirror substrate, and forming a reflector surface of the RB SiC mirror substrate on the front side of the aerospace mirror. Additionally, the method can comprise cladding the reflector surface of the RB SiC mirror substrate with SiC to form an optical surface of the aerospace mirror.

A multilayer mirror comprises a reflector section including a plurality of alternating layers of a high index material and a low index material, and a filter section over the reflector section. The filter section comprises a first filter layer including a low index material on a layer of high index material of the reflector section; a second filter layer on the first filter layer, the second filter layer comprising a high index material that is different than the high index material in the reflector section; and a third filter layer on the second filter layer, the third filter layer comprising a low index material. Each filter layer has an optical thickness greater than or equal to the optical thickness of each layer of the alternating layers. The filter section substantially blocks ultraviolet (UV) energy, thereby preventing UV energy from substantially impinging on the high index material of the reflector section.

An electronic device may include conductive structures having a visible-light-reflecting coating. The coating may include a seed layer, transition layers, a neutral-color base layer, and an uppermost layer that forms a single-layer interference film. The neutral-color base layer may be opaque to visible light. The interference film may include silicon and may have an absorption coefficient between 0 and 1. The interference film may include, for example, CrSiCN or CrSiC. The composition of the interference film, the thickness of the interference film, and/or the composition of the base layer may be selected to provide the coating with a desired color in the visible spectrum (e.g., at blue or purple wavelengths). The color may be relatively stable even if the thickness of the coating varies across its area.

A multi-color dielectric coating is formed using interleaved layers of dielectric material, having alternating refractive index, to create reflections at selected wavelengths, thus appearing as different colors. Etching of selected layers at selected locations changes the color appearance of the etched locations, thus generating a coating having multiple colors. The thicknesses of the layers are chosen such that the path-length differences for reflections from different high-index layers are integer multiples of the wavelength for which the coating is designed.

An optoelectronic light source includes a semiconductor laser configured to produce polarized primary radiation, a converter material configured to absorb at least part of the primary radiation and convert the primary radiation into a secondary radiation of an increased wavelength, a planar multi-layered mirror located between the semiconductor laser and the converter material, the multi-layered mirror configured to transmit the primary radiation and reflect the secondary radiation, and an optical element provided between the semiconductor laser and the multi-layered mirror, wherein the optical element is configured such that the primary radiation coming from the semiconductor laser impinges on the multi-layered mirror at a Brewster angle.

An electrochromic device composed of a pattern forming layer, an optical coating layer, an electrochromic component, and an opaque white layer arranged is revealed. The pattern forming layer has at least one pattern-shaded hollow hole for exposure of the optical coating layer. The optical coating layer which includes at least two layers of high and low refractive index material stacked alternately is the main layer to render colors. When transmittance of the electrochromic component which generates color changes is lower than 50%, a difference in the transmittance at 500 nm, 600 nm, and 700 nm is no more than 10%. Under such colored state, the color of light reflected by the optical coating layer is enhanced. The opaque white layer is for a sharper color contrast of the reflected light. Thereby light reflected by the optical coating layer show colors different from those of the electrochromic component in bleached and colored states.

Optical thin film designs are provided that achieve significantly improved laser damage thresholds and ultra-low-loss. These advances may be achieved by utilizing materials with electronic band gaps and refractive indices that are higher than those that are conventionally used.