G02B5/0833

OPTICAL EFFECT STRUCTURES
20210018659 · 2021-01-21 ·

An optical coating structure applied to the surface of an object having scattering structures introduced to the basal, upper or middle layers of a multilayer reflector to cause a particular (calculated) degree of scattering, or to the surface of a black/colour pigmented object. The scattering structures are mainly sub-micron in size, and arranged in a pseudo-random or non-periodic manner. Consequently they serve only to broaden the angular range of the light reflected at the surface normal from a multilayer reflector, or to provide (actual and/or perceived) reduced reflectivity of a surface by deflecting incident light through the surface rather than away from it or by scattering otherwise beam-like (narrow-angle) reflections from a surface into a broad-angle reflection. The scattering structures can include profile elements, which are in the form of elongate bars having convexly curved sides or hemispherical rods, that are introduced to a basal layer of a multilayer reflector.

Fabry-Perot interference filter

A Fabry-Perot interference filter includes a substrate that has a first surface, a first laminate that has a first mirror portion, a second laminate that has a second mirror portion facing the first mirror portion via a gap, an intermediate layer that defines the gap between the first laminate and the second laminate, and a first terminal. The intermediate layer has a first inner surface surrounding the first terminal. The first inner surface is curved such that an edge portion of the intermediate layer on the substrate side is positioned on the first terminal side relative to an edge portion of the intermediate layer on a side opposite to the substrate.

Dual-sensor detection of reflectance signals for thin-film based assays

The present disclosure is directed to a thin-film element that enables analytes to be analyzed on separate surfaces. In an example, a thin-film element includes a first layer for processing a fluid sample to generate a first analyte and a second analyte. The thin-film element also includes a second layer configured to be impermeable to the first analyte to enable the first analyte to be retained by the first layer and permeable to the second analyte to enable the second analyte to pass through the second layer. The thin-film element further includes a third layer configured to retain the second analyte. The second layer includes a first reflective surface and a second reflective surface to provide reflectance signals indicative of analytes present in the first and third layers to sensors located on opposite sides of the thin-film element.

Optical effect structures
10823885 · 2020-11-03 ·

An optical coating structure applied to the surface of an object having scattering structures introduced to the basal, upper or middle layers of a multilayer reflector to cause a particular (calculated) degree of scattering, or to the surface of a black/colour pigmented object. The scattering structures are mainly sub-micron in size, and arranged in a pseudo-random or non-periodic manner. Consequently they serve only to broaden the angular range of the light reflected at the surface normal from a multilayer reflector, or to provide (actual and/or perceived) reduced reflectivity of a surface by deflecting incident light through the surface rather than away from it or by scattering otherwise beam-like (narrow-angle) reflections from a surface into a broad-angle reflection. The scattering structures can include profile elements, which are in the form of elongate bars having convexly curved sides or hemispherical rods, that are introduced to a basal layer of a multilayer reflector.

Near infrared reflective coatings
10816703 · 2020-10-27 · ·

A coating composition comprising 6 to 20 alternating layers of SiO.sub.2 and one of ZrO.sub.2 or Nb.sub.2O.sub.5 wherein the thickness of each individual layer is about 70 nm to 200 nm is described. Also described is a substrate comprising a coating on at least a first major side thereof, the coating comprising 6 to 20 alternating layers of SiO.sub.2 and one of ZrO.sub.2 or Nb.sub.2O.sub.5 wherein the thickness of each individual layer is about 70 nm to 200 nm. The substrate can be glass, plastic, or metal. Also disclosed herein are methods of making the coated substrate. The coatings have good optical transparency and NIR reflectivity.

Optoelectronic semiconductor light source and Bragg mirror

An optoelectronic semiconductor light source includes a semiconductor chip configured to emit primary radiation, a Bragg mirror, and a luminescence conversion element configured to convert at least part of the primary radiation into secondary radiation having a longer wavelength, wherein the Bragg mirror is arranged between the semiconductor chip and the luminescence conversion element, the Bragg mirror is reflective for the secondary radiation and transmissive for the primary radiation, the Bragg mirror includes reflector layers of at least three different materials with different refractive indices, the Bragg mirror includes at least two different kinds of layer pairs, each kind of layer pairs being made up of reflective layers of two different materials, and the different kinds of layer pairs having different Brewster angles for p-polarized radiation.

OPTICAL DEFLECTION ELEMENT, METHOD FOR MANUFACTURING OPTICAL DEFLECTION ELEMENT, AND SYSTEM INCLUDING OPTICAL DEFLECTION ELEMENT
20200301049 · 2020-09-24 · ·

An optical deflection element includes: a reflective surface; and a movable part configured to rotate the reflective surface so as to deflect light incident on the reflective surface. The movable part includes: a metal film; a high reflective layer formed on an upper surface of the metal film; and a protective film continuously covering an upper surface and a side surface of the high reflective layer and a side surface of the metal film.

OPTOELECTRONIC SEMICONDUCTOR LIGHT SOURCE AND BRAGG MIRROR
20200284401 · 2020-09-10 ·

An optoelectronic semiconductor light source includes a semiconductor chip configured to emit primary radiation, a Bragg mirror, and a luminescence conversion element configured to convert at least part of the primary radiation into secondary radiation having a longer wavelength, wherein the Bragg mirror is arranged between the semiconductor chip and the luminescence conversion element, the Bragg mirror is reflective for the secondary radiation and transmissive for the primary radiation, the Bragg mirror includes reflector layers of at least three different materials with different refractive indices, the Bragg mirror includes at least two different kinds of layer pairs, each kind of layer pairs being made up of reflective layers of two different materials, and the different kinds of layer pairs having different Brewster angles for p-polarized radiation.

Electronic device having stacking structure comprising two dimensional materials

An electronic device having a stacking structure including a plurality of 2D material layers is provided. The stacking structure includes a first 2D material layer, among the plurality of 2D material layers, stacked adjacent to a second 2D material layer, among the plurality of 2D material layers, and the first 2D material layer is rotated with respect to the second 2D material layer.

Light source unit
10732332 · 2020-08-04 · ·

A light source unit is provided which makes an excellent contrast between the black display portions and the white display portions if mounted on a display, while having a high frontal luminance. The light source unit includes: a light source; a color conversion material that converts incident light from the light source into light having a longer wavelength than the incident light; and a reflective film that exists between the light source and the color conversion material and that transmits light from the light source incident perpendicularly on the film surface and reflects light from the color conversion material incident perpendicularly on the film surface; wherein the P-Polarized light of the light incident from the light source on the reflective film surface at an angle of 20, 40, and 60 is reflected at a reflectance of R20(%), R40(%), and R60(%) respectively, which satisfy R20<R40<R60.