A textured reflector for a solar cell of thin film type is produced by deposition of a metal film on a support through openings of a mask. The mask is formed by a thin film formed by coplanar and preferably joined balls, the gaps between the balls forming the openings of the mask. The thin film is further advantageously formed by balls made from silica or from polymer material.

A composite film may include a first transparent substrate, a dielectric layer and at least two infra-red reflection stacks. The dielectric layer may be located between the at least two infra-red reflection stacks and each of the infra-red reflection stacks may include two blocker layers and a functional layer. The blocker layers in each infra-red reflection stack may each include NiCr. The functional layer in each infra-red reflection stack may include silver and may be located between the two blocker layers.

A reflective optical element (50) having a substrate (52) and a multilayer system (51) that has a plurality of partial stacks (53), each with a first layer (54) of a first material and a second layer (55) of a second material. The first material and the second material differ from one another in refractive index at an operating wavelength of the optical element. Each of the partial stacks has a thickness (D.sub.i) and a layer thickness ratio (.sub.i), wherein the layer thickness ratio is the quotient of the thickness of the respective first layer and the partial stack thickness (D.sub.i). In a first section of the multilayer system, for at least one of the two variables of partial stack thickness (D.sub.i) and layer thickness ratio (.sub.i), the mean square deviation from the respective mean values therefor is at least 10% less than in a second section of the multilayer system.

A method for manufacturing a multilayer film-deposited substrate includes stacking a plurality of lamination units on the substrate while rotating the substrate around a rotational axis perpendicular to a substrate surface. Each of the lamination units has a plurality of layers formed by a dry deposition process. When a plurality of the multilayer film-deposited substrates are manufactured by the dry deposition process, a deposition is performed in a condition satisfying at least one of the following requirements (1) and (2), with estimating a change with time in a deposition rate: [T.sub.depo-unit/T.sub.r<(m0.02) or (m+0.02)<T.sub.depo-unit/T.sub.r] (1), and [(n0.02)T.sub.i/T.sub.r(n+0.02)] (2). m and n are independently any integer. T.sub.i is a time interval between the depositions among each layer of the plurality of layers. T.sub.depo-unit is a deposition unit time required for depositing the one lamination unit. T.sub.r is a rotation period of the substrate.

A reflective mirror is provided with a base and a multilayer film including a first layer and a second layer laminated alternately on the base and capable of reflecting at least a portion of incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion having a second thickness that is different from the first thickness, and which is provided at a position rotationally symmetric to that of the first portion about an optical axis of the reflective mirror.

A radio frequency identification (RFID) enabled mirror includes a mirror comprising a reflective layer. The reflective layer comprises at least one layer of a metallic material. At least one portion of the reflective layer is removed to form a booster antenna from a remaining portion of the reflective layer. A dielectric coating is applied to the mirror where the reflective layer was removed. The RFID-enabled mirror further includes an RFID chip coupled to the booster antenna.

A reflective mirror is provided with a base and a multilayer film including a first layer and a second layer laminated alternately on the base and capable of reflecting at least a portion of incident light. The multilayer film is provided with a first portion having a first thickness, and with a second portion having a second thickness that is different from the first thickness, and which is provided at a position rotationally symmetric to that of the first portion about an optical axis of the reflective mirror.

An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

A radio frequency identification (RFID) enabled mirror includes a mirror comprising a reflective layer. The reflective layer comprises at least one layer of a metallic material. At least one portion of the reflective layer is removed to form a booster antenna from a remaining portion of the reflective layer. A dielectric coating is applied to the mirror where the reflective layer was removed. The RFID-enabled mirror further includes an RFID chip coupled to the booster antenna.

A reflective optical element, in particular for a microlithographic projection exposure apparatus has a substrate (101), a reflection layer system (110) and a defect structure (120) of channel-shaped defects (121) which extend inward from the optical effective surface (100a), or from an interface oriented toward the substrate as far as the reflection layer system, and permit egress of hydrogen from the reflection layer system. The channel-shaped defects (121) increase a diffusion coefficient that is characteristic for the egress of the hydrogen from the reflection layer system (110) by at least 20%, in comparison to a similar layer construction without these channel-shaped defects.