A method of making a multi-layer coating on a substrate is provided and involves applying a mirror coating to a substrate then spraying a silicate topcoat onto the mirror coating. Applying the mirror coating can involve applying a reflective material to the substrate to form a reflective layer and applying an oxide layer to the reflective layer to form the mirror coating. The oxide layer can be made of one or more oxide layers, and each of the one or more oxide layers can include aluminum oxide, silicon oxide, or a combination thereof. The multi-layer coating provides increased IR emittance and decreased solar absorptance relative to conventional thermal control coatings.

The present invention relates to a layer system, comprising a metallic substrate (1) having the following layers applied on a side (A) thereof from the inside to the outside in the specified order: 4) a layer composed of a material selected from among substoichiometric oxides and oxynitrides of titanium and zirconium or from among metals, selected from among titanium, zirconium, molybdenum, platinum, and chromium or an alloy using one of these metals or of at least two of these metals, 5a) a layer composed of a nickel alloy having chromium, aluminum, vanadium, molybdenum, cobalt, iron, titanium, and/or copper as an alloying partner, or composed of a metal selected from among copper, aluminum, chromium, molybdenum, tungsten, tantalum, titanium, platinum, ruthenium, rhodium, and alloys using one of these metals, or of at least two of these metals, or composed of iron, steel or stainless steel, provided the layer may only consist of aluminum if the reflector layer 6) is formed of aluminum and that, in this case, the aluminum of layer 5a) has been sputtered, 6) an optically dense, high-purity metal reflector layer, 7) a layer selected from among substoichiometric oxides of titanium, zirconium, hafnium, vanadium, tantalum, niobium or chromium and from among metals selected from among chromium, titanium, zirconium, hafnium, vanadium, niobium, tantalum, tungsten, molybdenum, rhodium, and platinum and alloys using one of these metals or at least two of these metals, 9) a layer having a low refractive index (“LI layer”) in relation to a directly adjoining layer 10) (“HI layer”), and 10) a layer directly adjoining layer 9) and having a higher refractive index (“HI layer”) in relation to layer 9) (“LI layer”). The layer system can be used, e.g. as a surface reflector, preferably in applications with LEDs, particularly MC-COB for LEDs, as a solar reflector or as a laser mirror, in particular for color wheels in DLP laser projectors.

Provided are a lens structure capable of increasing a light absorbance and reducing optical crosstalk by manufacturing a multilayered aperture having a form of a metal layer-dielectric layer-metal layer stacked in a vertical direction and pore patterns formed on both metal layers as an aperture of a microlens array, and a manufacturing method thereof.

A coated substrate having a coating and a method of forming the same is disclosed, wherein the coating includes a plurality of discrete layers. The coating includes three reflective layers, an alloy layer disposed between two of the reflective layers, and two oxide layers and has a total thickness of 4000 Å or less.

A method aleviating blistering, cracking and chipping in topmost layers of a multilayer system exposed to reactive hydrogen, when producing a reflective optical element (50) having a maximum reflectivity at an operating wavelength of 5 nm to 20 nm. A multilayer system (51) composed of 30-60 stacks (53) is applied to a substrate (52). Each stack has a layer (54) of thickness d.sub.MLs composed of a high refractive index material and a layer (55) of thickness d.sub.MLa composed of a low refractive index material. The thickness ratio is d.sub.MLa/(d.sub.MLa+d.sub.MLs)=Γ.sub.ML. Two to five further stacks (56) are applied to the multilayer system. at least one further stack having a layer (54) of thickness d.sub.s composed of a high refractive index material and a layer (55) of thickness d.sub.a composed of a low refractive index material, wherein the thickness ratio is d.sub.a/(d.sub.a+d.sub.s)=Γ and wherein Γ≠Γ.sub.ML.

An optical element (1) for reflecting EUV radiation (4) includes: a substrate (2); a coating (3) applied to the substrate (2), which coating reflects the EUV radiation (4); a top layer (5) protecting the reflective coating (3), which top layer is applied to the reflective coating (3); and an intermediate layer (6) having at least one reactive material (7) which, together with an activating gas (O2) penetrating through a gap (5a) in the top layer 95), forms at least one reaction product (8) sealing the gap (5a). A related EUV lithography system has at least one such reflective optical element (1), and a related method for sealing a gap (5a) in the top layer (5) of such an optical element (1) are also disclosed.

A coated article includes a low-E coating having an absorbing layer located over a functional layer (IR reflecting layer) and designed to cause the coating to have an increased outside reflectance (e.g., in an IG window unit) and good selectivity. In certain embodiments, the absorbing layer is metallic, or substantially metallic, and is provided directly over and contacting a lower of two IR reflecting layers. In certain example embodiments, a nitride based layer (e.g., silicon nitride or the like) may be located directly over and contacting the absorbing layer in order to reduce or prevent oxidation thereof during heat treatment (e.g., thermal tempering, heat bending, and/or heat strengthening) thereby permitting predictable coloration, high outside reflectance values, and/or good selectivity to be achieved. Coated articles according to certain example embodiments of this invention may be used in the context of insulating glass (IG) window units, vehicle windows, other types of windows, or in any other suitable application.

A display device may include a display unit disposed on a substrate and a mirror substrate facing the substrate with respect to the display unit. The mirror substrate may include a first minor layer extending continuously on a surface of a transparent substrate and a plurality of minor patterns on the first mirror layer. The first minor layer is formed on both a region in which the plurality of minor patterns are formed and a region in which the plurality of minor patterns are not formed. External light is incident to and reflected by the first minor layer, thus reducing an image haze and enhancing a display quality of the display device. In addition, the first mirror layer and the plurality of mirror patterns may be formed by using a single halftone mask to simplify the manufacturing process and increase a productivity of the mirror substrate.

A projection assembly for a head-up display (HUD) includes a windshield, including an outer and inner pane joined to one another via a thermoplastic intermediate layer, and having an HUD region; and a projector directed at the HUD region. The radiation of the projector is predominantly p-polarised, and the windshield is provided with a reflective coating, which is suitable for reflecting p-polarised radiation. The reflective coating has exactly one electrically conductive layer and arranged one above and one below the electrically conductive layer are two dielectric layer sequences, each including n low-optical-refraction layers having an index of refraction less than 1.8 and (n+1) high-optical-refraction layers having an index of refraction greater than 1.8, arranged alternatingly in each case, wherein n is an integer greater than or equal to 1.

A display device may include a display unit disposed on a substrate and a mirror substrate facing the substrate with respect to the display unit. The mirror substrate may include a first mirror layer extending continuously on a surface of a transparent substrate and a plurality of mirror patterns on the first mirror layer. The first mirror layer is formed on both a region in which the plurality of mirror patterns are formed and a region in which the plurality of mirror patterns are not formed. External light is incident to and reflected by the first mirror layer, thus reducing an image haze and enhancing a display quality of the display device. In addition, the first mirror layer and the plurality of mirror patterns may be formed by using a single halftone mask to simplify the manufacturing process and increase a productivity of the mirror substrate.