A display assembly includes: a display module including a plurality of pixel islands; and a plurality of lens arrays laminated at a light-exiting side of the display module. Each lens array includes a substrate, a cover plate, a first transparent electrode, a second transparent electrode, and a liquid crystal layer and a diffraction lens grating arranged between the first and second transparent electrodes. The diffraction lens grating includes a plurality of diffraction lens grating units corresponding to the plurality of pixel islands. A voltage is applied to each of the first and the second transparent electrodes in such a manner that a refractive index of a liquid crystal molecule in the liquid crystal layer is equal to or not equal to a refractive index of the diffraction lens grating.

A maskless, extreme ultraviolet (EUV) lithography scanner uses an array of microlenses, such as binary-optic, zone-plate lenses, to focus EUV radiation onto an array of focus spots (e.g. about 2 million spots), which are imaged through projection optics (e.g., two EUV mirrors) onto a writing surface (e.g., at 6X reduction, numerical aperture 0.55). The surface is scanned while the spots are modulated to form a high-resolution, digitally synthesized exposure image. The projection system includes a diffractive mirror, which operates in combination with the microlenses to achieve point imaging performance substantially free of geometric and chromatic aberration. Similarly, a holographic EUV lithography stepper can use a diffractive photomask in conjunction with a diffractive projection mirror to achieve substantially aberration-free, full-field imaging performance for high-throughput, mask-projection lithography. Maskless and holographic EUV lithography can both be implemented at the industry-standard 13.5-nm wavelength, and could potentially be adapted for operation at a 6.7-nm wavelength.

The present disclosure is directed to systems and methods useful for providing a low profile metalens array that provides a relatively uniform far-field illumination in the visible and/or near-infrared electromagnetic spectrum using a plurality of vertical cavity surface emitting lasers (VCSELs) disposed a distance from a plurality of metalenses forming a metalens array, in which the VCSELs are decorrelated from the metalenses forming the metalens array.

A device includes at least one transient image having optical properties which vary depending on the angle of observation, with the image(s) consisting of a set of three-dimensional microstructures arranged in a plurality of subsets. Each subset consists of microstructures having an equivalent or identical planar angle θ. A security document can include such a device and the device can be used as a security element.

An image sensing device includes a pixel array configured to include a first pixel group and a second pixel group that are contiguous to each other, each of the first pixel group and second pixel group including a plurality of imaging pixels to convert light into pixel signals, and a light field lens array disposed over the pixel array to direct light to the imaging pixels and configured as a moveable structure that is operable to move between a first position and a second position in a horizontal direction by a predetermined distance corresponding to a width of the first pixel group or a width of the second pixel group, the light field lens array configured to include one or more lens regions each including a light field lens and one or more open regions formed without the light field lens to enable both light filed imaging and conventional imaging.

The invention relates to a high resolution full material Fresnel Zone Plate array comprising a plurality of full material Fresnel Zone Plates on a common carrier, a method for producing a full material Fresnel Zone Plate precursor array by providing a common carrier comprising a plurality of micro-pillars and deposition of alternating layers of at least two different materials onto at least some of the micro-pillars and an apparatus for producing high resolution full material Fresnel Zone Plate (FZP) arrays. The apparatus for producing a full material Fresnel Zone Plate arrays, comprises a first device for providing a plurality of micro-pillars in a common carrier, a deposition device which applies alternating layers of at least two different materials onto at least some of the micro-pillars arranged on the common carrier and a slicing device which slices a full material Fresnel Zone Plate out of a pillar.

A display switching device, a display device and an electronic device are provided. The display switching device includes: a controller; and a lens array, including a plurality of diffractive lenticular lenses, wherein each of the diffractive lenticular lenses includes: a first substrate, including a diffraction phase grating array; a liquid crystal element, including liquid crystal being filled in the diffraction phase grating array; a first electrode layer and a second electrode layer configured to apply a voltage to the liquid crystal element, wherein the controller is configured to acquire a corresponding display mode and apply a control voltage corresponding to the display mode to the first electrode layer and the second electrode layer according to the display mode to change a refractive index state of the liquid crystal element.

Embodiments of the present disclosure provide a polarizer, a display panel, a display apparatus, and a wearable device. The polarizer includes a polarizing layer and a lens layer arranged in stack, wherein the lens layer includes at least one converging lens.

A microlens array may be formed by nanoimprint lithography. Each microlens of the array comprises a plurality of concentric ridges extending from the substrate and separated by concentric grooves. A ratio F of a width of the concentric ridges to a pitch p of the concentric ridges is a function of a radial distance r from a microlens center to the concentric ridges. An effective refractive index n of microlenses depends on a fill ratio of a binary pattern, which depends on the radial distance from the microlens center. A method of manufacturing a microlens array includes forming an imprint resist layer on a substrate, and imprinting the imprint resist layer with a mold having an inversed microlens nanostructure.

A diffraction device includes a ZnS member and a ZnSe member coupled to the ZnS member, and a diffraction grating is provided on the ZnSe member.