Patent classifications
G02B5/282
ENERGY CONTROL COATINGS, STRUCTURES, DEVICES, AND METHODS OF FABRICATION THEREOF
Multilayer metallo-dielectric energy control coatings are disclosed in which one or more layers are formed from a hydrogenated metal nitride dielectric, which may be hydrogenated during or after dielectric deposition. Properties of the multilayer coating may be configured by appropriately tuning the hydrogen concentration (and/or the spatial profile thereof) in one or more hydrogenated metal nitride dielectric layers. One or more metal layers of the multilayer coating may be formed on a hydrogenated nitride dielectric layer, thereby facilitating adhesion of the metal with a low percolation threshold and enabling the formation of thin metal layers that exhibit substantial transparency in the visible spectrum. Optical properties of the coating may be tuned through modulation of metal-dielectric interface roughness and dispersion of metal nanoparticles in the dielectric layer. Electrical busbars and micro-nano electrical grids may be integrated with one or more metal layers to provide functionality such as de-icing and defogging.
OPTICAL FILTER
An optical filter including: a substrate; and a dielectric multilayer film laid on or above at least one major surface of the substrate as an outermost layer, in which: the dielectric multilayer film is a laminate including a low refractive index film and a high refractive index film laid on each other; the low refractive index film or the high refractive index film satisfies the spectral characteristics (i-1) and (i-2); the optical filter satisfies all of the spectral characteristics (ii-1) to (ii-3); and the optical filter has a nanoindentation hardness of 5.5 GPa or higher when a measurement load is 1 mN.
Method of increasing strength of glass substrate for optical filter and tempered-glass optical filter made thereby
The present invention provides a method of increasing the strength of a glass substrate for optical filters and a tempered-glass optical filter using a tempered glass substrate manufactured using the same, in which the glass substrate for optical filters is subjected to chemical tempering so that a compressive stress (CS) and a depth of layer (DOL) of the glass substrate are adjusted to increase the bending strength thereof.
OPTICAL FILTER
In the present application, a sharp visible light transmission band can be obtained while efficiently and accurately blocking ultraviolet light near the short-wavelength visible light region and infrared light near the long-wavelength visible light region, and the ripple phenomenon can be minimized regardless of the incident angle. It is possible to provide an optical filter capable of obtaining high visible light transmittance while securing the above characteristics even in the case where a near-infrared absorption glass is used as a substrate.
IR REFLECTIVE FILM
A translucent or transparent film or sheet device shows angular-independent IR reflectance, which comprises a substrate (1) covered with a layer of a dielectric high refractive index material (4) containing a thin metallic layer (3) embedded in said material, and a further layer (5) of translucent or transparent material covering said layer (4) of dielectric high refractive index material, characterized in that the embedded metal layer (3) is periodically interrupted with a periodicity of 50 to 800 nm such that metal covers at least 70% of the substrate area. The device may advantageously be integrated into a window, a glass facade element or especially onto a photovoltaic (PV) device, where it reduces the fraction of IR radiation passing into the building, or reduces heat take-up and thus lowers the operating temperature and improves the efficiency of the PV cell.
MULTILAYER LAMINATED SUBSTRATE
A multilayer laminated substrate is characterized in that at least a transparent resin substrate [A], a metal oxide layer [C], an electroconductive metal layer [D], a high refractive index metal oxide layer [E], and a protection layer [F] containing at least one of an inorganic oxide and an inorganic nitride are stacked in this order and the following (1) and (2) are satisfied: (1) a film thickness of the protection layer [F] is 5 nm to 300 nm; and (2) relative to a sum total of one or more metal elements, one or more semimetal elements, and one or more semiconductor elements contained in the protection layer [F], a content percentage by mass of carbon contained in the protection layer [F] is less than or equal to 50%.
Substrate provided with a stack having thermal properties
A transparent substrate includes a stack of thin layers successively including, starting from the substrate, an alternation of three metallic functional layers, in particular of functional layers based on silver or on silver-comprising metal alloy, and of four antireflective coatings, each antireflective coating including at least one dielectric layer, so that each metallic functional layer is positioned between two antireflective coatings, wherein: the thicknesses of the metallic functional layers, starting from the substrate, increase as a function of the distance from the substrate, the second metallic functional layer is directly in contact with a blocking layer, referred to as second blocking layer, chosen from a blocking underlayer and a blocking overlayer, respectively referred to as second blocking underlayer and second blocking overlayer, the second blocking underlayer and/or the second blocking overlayer exhibits a thickness of greater than 1 nm.
LOW RESISTANCE CONDUCTIVE THIN FILM AND FABRICATION METHOD FOR THE SAME
A low-resistance conductive thin film is disclosed. The present invention provides a low-resistance conductive thin film including: a substrate; a first capping layer disposed on the substrate; a second capping layer disposed on the first capping layer; a metal layer disposed on the second capping layer; a third capping layer disposed on the metal layer; and a fourth capping layer disposed on the third capping layer.
Near infrared cutoff filter
To provide a near infrared cutoff filter capable of suppressing an influence to a captured image when the incidence angle of light to the near infrared cutoff filter is large. The near infrared cutoff filter comprises a substrate to transmit at least light in the visible wavelength region and, on at least one side of the substrate, an infrared reflective layer constituted by a layered film having a high refractive index film H and a low refractive index film L repeatedly laminated, or a layered film having a high refractive index film H, an intermediate refractive index film M and a low refractive index film L′ repeatedly laminated, and has light transmittance characteristics such that the difference between the maximum value and the minimum value among the decrease rates in average transmittance in region R, region G and region B, is at most 0.05.
Near-infrared cut-off filter and imaging device including the same
Provided is a near-infrared cut-off filter having excellent oblique incidence characteristics due to extremely low dependence on the angle of incidence, and a low transmittance in a wavelength region of 1000 nm or more. More particularly, the near-infrared cut-off filter includes a transparent substrate that is formed of glass containing iron atoms and has a half-value wavelength of greater than 630 nm on a long wavelength side of a transmittance curve and an average transmittance of 1% or less in a wavelength region of 1000 to 1200 nm; and a resin layer formed on at least one main surface of the transparent substrate to absorb light of a specific wavelength.