A laser protection eyewear lens includes a lens substrate comprising an embedded wavelength filter having a first filter function, and a multi-layer dielectric filter applied to at least one of an inside and an outside surface of the lens substrate that comprises a second filter function having at least one center wavelength and bandwidth. The first filter function of the embedded wavelength filter and the second filter function of the multilayer dielectric filter produce a combined filter function that attenuates light reflecting off the multi-layer dielectric filter.

Provided is an optical filter including a spectral filter, and a polarizing filter provided on the same plane as the spectral filter, wherein the spectral filter includes a plurality of spectral unit filters having different central wavelengths, and wherein the polarizing filter includes a plurality of polarization unit filters having different central wavelengths.

Provided is a spectral filter including a first Bragg reflective layer, a second Bragg reflective layer that is spaced apart from the first Bragg reflective layer and includes a cavity, the first resonance layer being provided between the first Bragg reflective layer and the second Bragg reflective layer, a second resonance layer including at least a portion of the first Bragg reflective layer, the second Bragg reflective layer, and the cavity, a third Bragg reflective layer, a fourth Bragg reflective layer spaced apart from the third Bragg reflective layer, wherein the second resonance layer is provided between the third Bragg reflective layer and the fourth Bragg reflective layer.

Provided is a polarization spectral filter, including: a first reflector and a second reflector disposed to face each other in a first direction; and a grating layer disposed between the first reflector and the second reflector. The grating layer includes a plurality of first grating elements and a plurality of second grating elements, the plurality of first grating elements and the plurality of second grating elements being alternately arranged in a second direction perpendicular to the first direction. The plurality of first grating elements include a first dielectric material having a first refractive index. The plurality of second grating elements include a second dielectric material having a second refractive index different from the first refractive index.

The present disclosure provides a near-infrared narrowband filter and a manufacturing method therefor. The filter includes: a substrate; a set of narrowband pass films, disposed on a first side of the substrate; and a set of wideband pass/longwave pass films. The set of wideband pass/longwave pass films is disposed on a second side of the substrate opposite to the first side, and a passband of the set of wideband pass/longwave pass films is wider than that of the set of narrowband pass films. The set of narrowband pass films includes a high refractive index layer having a refractive index greater than 3 and a low refractive index layer having the refractive index less than 3 within a wavelength range of 780 nm to 3000 nm. A reflection color of the near-infrared narrowband filter in a CIE xyz coordinate system satisfies: x<0.509, y<0.363, and z<50%.

A method for manufacturing a multispectral filter for electromagnetic radiation including two colour filters each including a first reflective layer, a second reflective layer, a layer of dielectric material of Fabry-Perot cavity, the thickness of the dielectric layer of both colour filters being different and each of both filters facing a photoelectric transducer. The method includes depositing a resin layer onto a handle substrate, structuring the resin layer to obtain two resin patterns of different heights, at least one of the patterns having a maximum reference height; depositing a dielectric layer to form the dielectric patterns of the Fabry-Perot cavities and planarising; transferring the planarised face of the handle substrate to the upper face of a carrier substrate; removing the handle substrate and the resin and depositing a reflective layer onto the at least two dielectric patterns of Fabry-Perot cavity, forming the second reflective layer.

The present technology relates to a solid-state image capturing apparatus and an electronic device that can acquire a normal image and a narrow band image at the same time. The solid-state image capturing apparatus includes a plurality of substrates laminated in two or more layers, and two or more substrates of the plurality of substrates have pixels that perform photoelectric conversion. At least one substrate of the substrates having the pixels is a visible light sensor that receives visible light, and at least another substrate of the substrates having the pixels is a narrow band light sensor that includes narrow band filters being optical filters permeating light in a narrow wavelength band, and receives narrow band light in the narrow band.

Disclosed is a spectral filter including a plurality of Fabry-Perot structures which are collectively carried by a support, and coupled together so as to produce a coupling resonance that is distinct from individual resonances of each of the Fabry-Perot structures. The coupling resonance may have a higher quality factor than the quality factors of the individual resonances. Each Fabry-Perot structure includes two portions of metal surfaces which are parallel to a face of the substrate, so that electromagnetic radiation wave components propagating within each Fabry-Perot structure, and which contribute to the coupling resonance, have a direction of propagation that is parallel to the face of the substrate.

Provided are a spectral filter, a method of manufacturing the same, and an image sensor and an electronic device each including the spectral filter. The spectral filter includes a plurality of first reflective layers provided spaced apart from each other, and a plurality of cavities provided between the plurality of first reflective layers. The cavities have different thicknesses according to a center wavelength. Each of the cavities includes a plurality of etch stop layers having a constant total thickness according to the center wavelength, and at least one dielectric layer having a total thickness which changes according to the center wavelength, wherein the etch stop layers include materials having etch selectivities different than that of the dielectric layer.

The disclosure relates to an interferometer including a substrate, and an intermediate layer region applied on the substrate. A first mirror device and a second mirror device are aligned plane-parallel with one another and are separated from one another by a first distance and are framed in or on the intermediate layer region, the intermediate layer region removed in at least one of an inner region below the first mirror device and below the second mirror device. A laterally structured electrode including a first subregion and a second laterally separated subregion which are configured to be connected to different electrical potentials. The electrode arranged at a second distance from the first or the second mirror device, the first subregion extending in the inner region and arranged on the intermediate layer region and the second subregion extending in an outer region of the intermediate layer region.