Techniques for forming a photonic device that includes a suspended photonic structure suspended over a silicon substrate are described. A sealed cavity is positioned between the silicon substrate and the photonic structure, and one or more regions of dielectric material act to seal the cavity. Additional structure(s) may be formed on top of the dielectric material.

A ceramic micro-truss structure. In one embodiment green state polymer micro-truss structure is formed by exposing a photomonomer resin through a mask to collimated light from three or more directions. The green state polymer micro-truss structure is shaped and post-cured to form a cured polymer micro-truss structure. The cured polymer micro-truss structure is pyrolyzed to form a ceramic micro-truss structure, which may subsequently be coated with metal.

A method of co-manufacturing silicon waveguides, SiN waveguides, and semiconductor structures in a photonic integrated circuit. A silicon waveguide structure can be formed using a suitable process, after which it is buried in a cladding. The cladding is polished, and a silicon nitride layer is disposed to define a silicon nitride waveguide. The silicon nitride waveguide is buried in a cladding, and annealed. Thereafter, cladding above the silicon waveguide structure can be trenched through, and low-temperature operations can be performed to or with an exposed surface of the silicon waveguide structure.

Disclosed is a package comprising a substrate having a patterned surface with an optical contact area, an optical redistribution layer (oRDL) feature, and a build-up material extending over the patterned surface of the substrate and around portions of the oRDL features. In some embodiments, the package comprises a liner sheathing the oRDL features. In some embodiments, the oRDL feature extends through openings in an outer surface of the build-up material and forms posts extending outward from the outer surface. In some embodiments, the package comprises an electrical redistribution layer (eRDL) feature, at least some portion of which overlap at least some portion of the oRDL feature. In some embodiments, the package comprises an optical fiber coupled to the oRDL features.

Disclosed is a package comprising a substrate having a patterned surface with an optical contact area, an optical redistribution layer (oRDL) feature, and a build-up material extending over the patterned surface of the substrate and around portions of the oRDL features. In some embodiments, the package comprises a liner sheathing the oRDL features. In some embodiments, the oRDL feature extends through openings in an outer surface of the build-up material and forms posts extending outward from the outer surface. In some embodiments, the package comprises an electrical redistribution layer (eRDL) feature, at least some portion of which overlap at least some portion of the oRDL feature. In some embodiments, the package comprises an optical fiber coupled to the oRDL features.

This photodiode includes: a core of a first waveguide that terminates in a tapered termination that extends above a core, made of germanium or of SiGe, of a second waveguide, a matching strip that extends opposite the tapered termination on one side and opposite the core of the second waveguide on the opposite side, this matching strip being coupled optically to the core of the second waveguide by an evanescent coupling and including a first zone inside which its effective propagation index is equal to the effective propagation index of a second zone of the tapered termination, these first and second zones optically coupling the tapered termination to the matching strip through a modal coupling, and a low-index layer that extends between the matching strip and the tapered termination.

A method includes providing a sacrificial wafer, contacting the sacrificial wafer to a photonic device wafer, and bonding the sacrificial wafer to the photonic device wafer. The sacrificial wafer includes a substrate and an electro-optical material strip disposed within a dielectric matrix. The photonic device wafer includes a photonic device die, and the electro-optical material strip is disposed proximate to the photonic device die. A photonic device structure includes a photonic device wafer and a sacrificial wafer. The photonic device structure includes a device wafer substrate and a photonic device die fabricated in a device wafer dielectric layer. The sacrificial wafer includes a sacrificial wafer substrate and an electro-optical material strip embedded in a sacrificial wafer dielectric matrix. The sacrificial wafer dielectric matrix is bonded to the device wafer dielectric layer, and the electro-optical material strip is disposed proximate to the photonic device die.

In a duplex optical connector plug 10A, when one of first and second optical connector assemblies 11a, 11b is rotated around its axis in a clockwise direction or a counterclockwise direction, a rotational force of one of first and second gears is transmitted to the other of the gears by an intermediate gear. Thereby, interlockingly with the one of the optical connector assemblies 11a, 11b, the other of the optical connector assemblies 11a, 11b is rotated around its axis in the clockwise direction or the counterclockwise direction which is the same direction as the optical connector assemblies 11a, 11b.

In a duplex optical connector plug 10A, when one of first and second optical connector assemblies 11a, 11b is rotated around its axis in a clockwise direction or a counterclockwise direction, a rotational force of one of first and second gears is transmitted to the other of the gears by an intermediate gear. Thereby, interlockingly with the one of the optical connector assemblies 11a, 11b, the other of the optical connector assemblies 11a, 11b is rotated around its axis in the clockwise direction or the counterclockwise direction which is the same direction as the optical connector assemblies 11a, 11b.

In a semiconductor device, first dummy patterns including a different material from transmission lines (first optical waveguide and second optical waveguide) are formed in a first region close to the transmission lines, and second dummy patterns, which include the same material as the transmission lines and do not function as the transmission lines, are formed in a second region apart from the transmission lines.