Patent classifications
G02B6/1225
INTEGRATED BANDGAP TEMPERATURE SENSOR
Absolute temperature measurements of integrated photonic devices can be accomplished with integrated bandgap temperature sensors located adjacent the photonic devices. In various embodiments, the temperature of the active region within a diode structure of a photonic device is measured with an integrated bandgap temperature sensor that includes one or more diode junctions either in the semiconductor device layer beneath the active region or laterally adjacent to the photonic device, or in a diode structure formed above the semiconductor device layer and adjacent the diode structure of the photonic device.
Optical Device
An optical device includes a first reflecting section, a second reflecting section, and a confining section. The first reflecting section is constituted of a thin-wire waveguide-type one-dimensional photonic crystal. The second reflecting section is constituted of a thin-wire waveguide-type one-dimensional photonic crystal of which a lattice constant differs from that of the first reflecting section. The confining section is sandwiched between the first reflecting section and the second reflecting section. A Fabry-Perot optical resonator is constituted by the first reflecting section, the confining section, and the second reflecting section.
METAMATERIAL EDGE COUPLERS IN THE BACK-END-OF-LINE STACK OF A PHOTONICS CHIP
Structures for an edge coupler and methods of forming a structure for an edge coupler. The structure includes a waveguide core over a dielectric layer, and a back-end-of-line stack over the waveguide core and the dielectric layer. The back-end-of-line stack includes an interlayer dielectric layer, a side edge, a first feature, a second feature, and a third feature laterally arranged between the first feature and the second feature. The first feature, the second feature, and the third feature are positioned on the interlayer dielectric layer adjacent to the side edge, and the third feature has an overlapping relationship with a tapered section of the waveguide core.
Materials and structures for optical and electrical III-nitride semiconductor devices and methods
The present invention provides materials, structures, and methods for III-nitride-based devices, including epitaxial and non-epitaxial structures useful for III-nitride devices including light emitting devices, laser diodes, transistors, detectors, sensors, and the like. In some embodiments, the present invention provides metallo-semiconductor and/or metallo-dielectric devices, structures, materials and methods of forming metallo-semiconductor and/or metallo-dielectric material structures for use in semiconductor devices, and more particularly for use in III-nitride based semiconductor devices. In some embodiments, the present invention includes materials, structures, and methods for improving the crystal quality of epitaxial materials grown on non-native substrates. In some embodiments, the present invention provides materials, structures, devices, and methods for acoustic wave devices and technology, including epitaxial and non-epitaxial piezoelectric materials and structures useful for acoustic wave devices. In some embodiments, the present invention provides metal-base transistor devices, structures, materials and methods of forming metal-base transistor material structures for use in semiconductor devices.
Photonic Integrated Package and Method Forming Same
A method includes placing an electronic die and a photonic die over a carrier, with a back surface of the electronic die and a front surface of the photonic die facing the carrier. The method further includes encapsulating the electronic die and the photonic die in an encapsulant, planarizing the encapsulant until an electrical connector of the electronic die and a conductive feature of the photonic die are revealed, and forming redistribution lines over the encapsulant. The redistribution lines electrically connect the electronic die to the photonic die. An optical coupler is attached to the photonic die. An optical fiber attached to the optical coupler is configured to optically couple to the photonic die.
PHOTONIC COMMUNICATION PLATFORM
Described herein are photonic communication platforms that can overcome the memory bottleneck problem, thereby enabling scaling of memory capacity and bandwidth well beyond what is possible with conventional computing systems. Some embodiments provide photonic communication platforms that involve use of photonic modules. Each photonic module includes programmable photonic circuits for placing the module in optical communication with other modules based on the needs of a particular application. The architecture developed by the inventors relies on the use of common photomask sets (or at least one common photomask) to fabricate multiple photonic modules in a single wafer. Photonic modules in multiple wafers can be linked together into a communication platform using optical or electronic means.
Optical Device
A difference Δ1 between an equivalent refractive index of a first reflecting section and an equivalent refractive index of a core in a first region that corresponds to the first reflecting section and a difference between an equivalent refractive index of a second reflecting section and an equivalent refractive index of the core in a second region that corresponds to the second reflecting section is set so as to be greater than a difference between an equivalent refractive index of a confining section and an equivalent refractive index of the core in a third region that corresponds to the confining section.
STRUCTURES AND METHODS FOR HIGH SPEED INTERCONNECTION IN PHOTONIC SYSTEMS
Structures and methods for high speed interconnection in photonic systems are described herein. In one embodiment, a photonic device is disclosed. The photonic device includes: a substrate; a plurality of metal layers on the substrate; a photonic material layer comprising graphene over the plurality of metal layers; and an optical routing layer comprising a waveguide on the photonic material layer.
Resonance enhanced surface illuminated sub-bandgap infrared photodetectors
Photodetectors using photonic crystals (PhCs) in polysilicon film that include an in-plane resonant defect. A biatomic photodetector includes an optical defect mode that is confined from all directions in the plane of the PhC by the photonic bandgap structure. The coupling of the resonance (or defect) mode to out-of-plane radiation can be adjusted by the design of the defect. Further, a “guided-mode resonance” (GMR) photodetector provides in-plane resonance through a second-order grating effect in the PhC. Absorption of an illumination field can be enhanced through this resonance.
ELECTRO-OPTICAL CONVERSION SYSTEM
An electro-optical conversion system including an opto-mechanical conversion device which includes a ring cavity formed by an optical waveguide which extends along an annular closed curve, a micromechanical resonator that comprises at least one microbeam, and a zipper type element integrated into the ring cavity, the zipper type element including a first arm made on a portion of the ring waveguide and a second arm made on the microbeam. The conversion system also includes a capacitor with first and second electrodes separated by a gap which varies when the microbeam oscillates.