An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

There is provided a reflective image-forming optical system which is applicable to an exposure apparatus using, for example, EUV light and which is capable of increasing numerical aperture while enabling optical path separation of light fluxes. In a reflective imaging optical system (6) forming an image of a first plane (4) onto a second plane (7), the numerical aperture on a side of the second plane with respect to a first direction (X direction) on the second plane is greater than 1.1 times a numerical aperture on the side of the second plane with respect to a second direction (Y direction) crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop (AS) defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction (X direction) is greater than 1.1 times that in a minor axis direction (Y direction).

Reflective optical telescopes and method of observing a scene. One example of a reflective optical telescope includes a primary mirror positioned along a linear axis extending between an entrance aperture and an image plane, configured to receive optical radiation via the entrance aperture, a secondary mirror positioned along the linear axis and configured to receive the optical radiation from the primary mirror and to reflect the optical radiation in a direction of the primary mirror, wherein the optical radiation received by the primary mirror is unobscured by the secondary mirror, a tertiary mirror positioned along the linear axis and configured to receive the optical radiation from the secondary mirror and reflect the optical radiation in a direction of the primary mirror, and a quaternary mirror positioned along the linear axis, configured to receive the optical radiation from the tertiary mirror and reflect the optical radiation to the image plane.

An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.

A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body. In this case, at least one mirror of the plurality of mirrors has at least one layer comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror.

Reflective optical telescopes and method of observing a scene. One example of a reflective optical telescope includes a primary mirror positioned along a linear axis extending between an entrance aperture and an image plane, configured to receive optical radiation via the entrance aperture, a secondary mirror positioned along the linear axis and configured to receive the optical radiation from the primary mirror and to reflect the optical radiation in a direction of the primary mirror, wherein the optical radiation received by the primary mirror is unobscured by the secondary mirror, a tertiary mirror positioned along the linear axis and configured to receive the optical radiation from the secondary mirror and reflect the optical radiation in a direction of the primary mirror, and a quaternary mirror positioned along the linear axis, configured to receive the optical radiation from the tertiary mirror and reflect the optical radiation to the image plane.

An optical system that images a scene at two different fields of view, with switching between fields of view enabled by switchable mirrored surface is disclosed. The two fields of view vary in focal length by a factor of three. Both the wide field of view configuration and the narrow field of view configuration image broad-band short wave infrared radiation at an effective f/number of 1.4. A voltage change across the switchable mirror element generates a change in the reflection and transmission properties of the element, such that the element switches between a mirror state and a lens state. When nested in an annular reflective optic system of a given field of view, the switching element enables the opening of an additional optical path through the center of the reflective optics where a set of refractive optics are assembled into an imaging system for a second field of view. This dual field-of-view system changes field of view with no mechanical movement.

There is provided a reflective imaging optical system forming an image of a first plane onto a second plane, wherein the numerical aperture with respect to a first direction on the second plane is greater than 1.1 times a numerical aperture with respect to a second direction crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction is greater than 1.1 times that in a minor axis direction. The reflective image-forming optical system is applicable to an exposure apparatus using, for example, EUV light and capable of increasing numerical aperture while enabling optical path separation of light fluxes.

A light source apparatus including a light source configured to emit a light flux from an emission region having a predetermined size and a rotationally symmetrical emission intensity distribution; and a condenser configured to condense the light flux to allow the light flux to exit to the outside. The condenser is rotationally symmetrical about an optical axis and is disposed to surround the emission region, and has four or more reflection mirrors each having a reflecting surface for reflecting the light flux emitted from the emission region. The reflection mirrors include elliptical surface reflection mirrors where the reflecting surface is elliptical and spherical surface reflection mirrors where the reflecting surface is spherical, and are alternately arranged in the direction of the optical axis, and a light flux reflected by one spherical surface reflection mirror is further reflected by one elliptical surface reflection mirror oppositely disposed across the emission region.