G02B17/0657

Imaging optics and projection exposure installation for microlithography with an imaging optics
09639004 · 2017-05-02 · ·

An imaging optics has at least six mirrors, which image an object field in an object plane in an image field in an image plane. An entry pupil of the imaging optics is arranged in the imaging beam path in front of the object field. At least one of the mirrors has a through-opening for the passage of imaging light. A mechanically accessible pupil, in which an obscuration stop is arranged for the central shading of the pupil of the imaging optics, is located in a pupil plane in the imaging beam path between the object field and a first of the through-openings. A first imaging part beam directly after a second mirror in the imaging beam path after the object field and a second imaging part beam directly after a fourth mirror in the imaging beam path after the object field intersect one another in an intersection region. The result is an imaging optics, in which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light is achieved.

REFLECTIVE IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
20170115574 · 2017-04-27 · ·

A reflective imaging optical system which forms, on a second plane, an image of a pattern arranged on a first plane and illuminated with light from an illumination optical system includes a plurality of reflecting mirrors including first and second reflecting mirrors by which the light reflected by the first plane is reflected first, second, respectively. An area on the first plane illuminated with the light from the illumination optical system is an illumination objective area, the illumination objective area is positioned on a predetermined side of an optical axis of the reflecting mirrors, and reflection areas of the first and second reflecting mirrors are positioned on the predetermined side of the optical axis of the reflecting mirrors; and the first and second reflecting mirrors are arranged so that an optical path of the light from the illumination optical system is positioned between the first and second reflecting mirrors.

FIVE-MIRROR AFOCAL WIDE FIELD OF VIEW OPTICAL SYSTEM
20170090171 · 2017-03-30 ·

A five-mirror all-reflective afocal anastigmat. In one example, a five mirror afocal anastigmat includes five mirrors arranged to sequentially reflect from one another electromagnetic radiation received via a system entrance pupil to produce a collimated output beam of the electromagnetic radiation at a system exit pupil, the five mirrors consisting of three positive-powered mirrors and two negative-powered mirrors, wherein optical powers of the five mirrors are balanced to achieve a flat field condition at the system exit pupil.

Aero-wave instrument for the measurement of the optical wave-front disturbances in the airflow around airborne systems

The aircraft includes a fuselage and at least one aerodynamic interface surface. It further includes a gimbaled mirror system which includes a mirror supported by a gimbal to receive a light beam from a light emitting source and reflect the light beam to a first periscope fold mirror. A wave front measuring system includes at least five reflective which reflects the light beam to a fast steering mirror. The fast steering mirror reflects the light beam directly to a beam splitter wherein the light beam is split into a transmitted portion and a reflected portion of the light beam.

Image-forming optical system, exposure apparatus, and device producing method
09557548 · 2017-01-31 · ·

There is provided a reflective imaging optical system forming an image of a first plane onto a second plane, wherein the numerical aperture with respect to a first direction on the second plane is greater than 1.1 times a numerical aperture with respect to a second direction crossing the first direction on the second plane. The reflecting imaging optical system has an aperture stop defining the numerical aperture on the side of the second plane, and the aperture stop has an elliptic-shaped opening of which size in a major axis direction is greater than 1.1 times that in a minor axis direction. The reflective image-forming optical system is applicable to an exposure apparatus using, for example, EUV light and capable of increasing numerical aperture while enabling optical path separation of light fluxes.

Reflective image-forming optical system, exposure apparatus, and device manufacturing method
09541842 · 2017-01-10 · ·

A reflective imaging optical system which forms, on a second plane, an image of a pattern arranged on a first plane and illuminated with light from an illumination optical system includes a plurality of reflecting mirrors including first and second reflecting mirrors by which the light reflected by the first plane is reflected first, second, respectively. An area on the first plane illuminated with the light from the illumination optical system is an illumination objective area, the illumination objective area is positioned on a predetermined side of an optical axis of the reflecting mirrors, and reflection areas of the first and second reflecting mirrors are positioned on the predetermined side of the optical axis of the reflecting mirrors; and the first and second reflecting mirrors are arranged so that an optical path of the light from the illumination optical system is positioned between the first and second reflecting mirrors.

Imaging optics, microlithography projection exposure apparatus having same and related methods
09535337 · 2017-01-03 · ·

An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.

Reflective pupil relay optics for mems scanning system

An optical module includes a fast-axis mirror that scans a laser beam along a fast-axis, a magnification mirror set formed by three discrete mirrors shaped to magnify the laser beam as it is scanned along the fast-axis and reflect the laser beam after magnification toward a slow-axis mirror that scans the laser beam along the slow-axis, and an Offner mirror relay that receives the laser beam as it is scanned along the slow-axis and reflects the laser beam out an exit aperture. The laser beam as output from the exit aperture is received at an input diffractive grating of a diffractive waveguide, with a user's eye being positioned adjacent an output diffractive grating of the waveguide such that the user's eye views ambient light entering the waveguide from objects within the user's field of view as well as light from the laser beam as it exits the output diffractive grating.