Patent classifications
G03F7/031
Lithographic Photopolymer Printing Plate Precursor with Improved Daylight Stability
A lithographic printing plate precursor is disclosed which comprises a support, a photopolymerizable image recording layer and an overcoat which comprises a low-molecular radical inhibitor. After image-wise exposure, the plate is heated whereby the radical inhibitor diffuses from the overcoat to the image recording layer, resulting in an increase of the daylight stability of the exposed and heated precursor. Such plate is especially suitable for on-press processing.
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT
Provided is a resist underlayer film-forming composition that is used in a lithographic process in semiconductor manufacturing and has excellent storage stability. The resist underlayer film-forming composition contains: a polymer having a disulfide bond in a main chain; a radical trapping agent; and a solvent. The radical trapping agent is preferably a compound having a ring structure or a thioether structure. The ring structure is preferably an aromatic ring structure having 6-40 carbon atoms or a 2,2,6,6-tetramethylpiperidine structure.
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT
Provided is a resist underlayer film-forming composition that is used in a lithographic process in semiconductor manufacturing and has excellent storage stability. The resist underlayer film-forming composition contains: a polymer having a disulfide bond in a main chain; a radical trapping agent; and a solvent. The radical trapping agent is preferably a compound having a ring structure or a thioether structure. The ring structure is preferably an aromatic ring structure having 6-40 carbon atoms or a 2,2,6,6-tetramethylpiperidine structure.
UV CURABLE FORMULATIONS CONTAINING DIPROPYLENE GLYCOL DIACRYLATE
Described herein are photopolymerizable compositions for use in 3D printing. The compositions contain dipropylene glycol diacrylate and one or more urethane acrylate oligomers, optionally with a photoinitiator. Also described are methods for fabricating three dimensional objects utilizing these compositions, and three dimensional objects made from these compositions.
PHOTOSENSITIVE COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Provided are a photosensitive composition including a coloring material, a photopolymerization initiator, a polymerizable monomer, and a resin, in which the photopolymerization initiator includes an oxime compound OX having an aromatic ring group Ar.sup.OX1 in which an electron withdrawing group is introduced into an aromatic ring, and a value obtained by dividing a mass of the polymerizable monomer by a mass of the photopolymerization initiator is 0.5 to 5.5; a film; an optical filter; a solid-state imaging element; and an image display device.
PHOTOSENSITIVE COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Provided are a photosensitive composition including a coloring material, a photopolymerization initiator, a polymerizable monomer, and a resin, in which the photopolymerization initiator includes an oxime compound OX having an aromatic ring group Ar.sup.OX1 in which an electron withdrawing group is introduced into an aromatic ring, and a value obtained by dividing a mass of the polymerizable monomer by a mass of the photopolymerization initiator is 0.5 to 5.5; a film; an optical filter; a solid-state imaging element; and an image display device.
Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof
Embodiments in accordance with the present invention encompass polyamic acid or polyimide polymers containing a reactive maleimide end group as well as photosensitive compositions made therefrom which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. The negative images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.
PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT
A liquid photosensitive ink composition capable of forming a cured product with a high refractive index and a high transparency, a cured product of the photosensitive ink composition, a display panel having a film consisting of the cured product, and a method for producing the cured product using the photosensitive ink composition. In a photosensitive ink composition including a photopolymerizable compound, and a photopolymerization initiator, a sulfide compound having specific structure and a (meth)acrylate compound having specific structure are used as the photopolymerizable compound, and a phosphine oxide compound and an oxime ester compound are used as the photopolymerization initiator.
PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT
A liquid photosensitive ink composition capable of forming a cured product with a high refractive index and a high transparency, a cured product of the photosensitive ink composition, a display panel having a film consisting of the cured product, and a method for producing the cured product using the photosensitive ink composition. In a photosensitive ink composition including a photopolymerizable compound, and a photopolymerization initiator, a sulfide compound having specific structure and a (meth)acrylate compound having specific structure are used as the photopolymerizable compound, and a phosphine oxide compound and an oxime ester compound are used as the photopolymerization initiator.
Positive photoresist composition, via-forming method, display substrate and display device
The present disclosure provides a positive photoresist composition including a major adhesive material and a photosensitizer, wherein the photoresist composition further includes a photoisomerizable compound which would be converted into an ionic structure with an increased degree of molecular polarity after ultraviolet irradiation. The formation of the ionic structure with increased polarity of the molecule reduces the adhesion between the positive photoresist and the organic film layer, facilitates stripping after formation of the via, and improves the product rate of pass. Further, the present disclosure provides a via-forming method using the positive resist composition, a display substrate including the via formed by the via-forming method, and a display device including the display substrate.