The present invention is to provide a light screening composition that allow forming of a light screening film having excellent adhesiveness to a substrate and excellent residue removability at the time of development. The light screening composition according to the invention contains (A) any one of light screening particles and a light screening dye; (B) a dispersing resin; (C) a binder polymer having an acid value of 50 mg KOH/g or less and a weight-average molecular weight of 8,000 to 50,000; and (D) a polymerizable compound.

A method of producing a flexographic printing plate using a continuous liquid interphase is provided herein. This method allows for significantly reduced production times and fewer preparation steps compared to standard non-continuous techniques and results in less waste than typical methods for preparing flexographic printing plates. The printing plate provided by using continuous liquid interphase production results in a printing plate with desirable elastomeric elongation, desirable hardness, plate thickness in the range of 0.030 inches to 0.250 inches, and comprises printing dots with desirable characteristics.

A method of producing a flexographic printing plate using a continuous liquid interphase is provided herein. This method allows for significantly reduced production times and fewer preparation steps compared to standard non-continuous techniques and results in less waste than typical methods for preparing flexographic printing plates. The printing plate provided by using continuous liquid interphase production results in a printing plate with desirable elastomeric elongation, desirable hardness, plate thickness in the range of 0.030 inches to 0.250 inches, and comprises printing dots with desirable characteristics.

Provided according to embodiments of the invention are methods for the rapid production of a composition that includes a reactive blocked prepolymer. Such methods may include continuously mixing a first precursor composition and a second precursor composition, the first precursor composition including a polyisocyanate oligomer and the second precursor composition including an amine (meth)acrylate to produce the composition that includes a reactive blocked prepolymer.

A photosensitive resin composition comprises a polymer having a repeating structural unit of the following Formula (1): ##STR00001##
(wherein R.sub.1 and R.sub.2 are each independently a single bond, a methylene group, or an ethylene group, Y is an alkylene group of Formula (2) or a combination of the alkylene group of Formula (2) with an alkylene group of Formula (3), n is an integer of 1 to 110, and X is a divalent aliphatic hydrocarbon group, a divalent alicyclic hydrocarbon group, or a divalent aromatic hydrocarbon group) and a (meth)acryloyl group at both ends, a bifunctional (meth)acrylate compound, a polyfunctional thiol compound, a photo-radical generator and an organic solvent, and then the bifunctional (meth)acrylate compound contained in an amount of 5% to 50% by mass and the polyfunctional thiol compound is contained in an amount of 0.1% to 10% by mass, relative to the content of the polymer.

A photosensitive resin composition comprises a polymer having a repeating structural unit of the following Formula (1): ##STR00001##
(wherein R.sub.1 and R.sub.2 are each independently a single bond, a methylene group, or an ethylene group, Y is an alkylene group of Formula (2) or a combination of the alkylene group of Formula (2) with an alkylene group of Formula (3), n is an integer of 1 to 110, and X is a divalent aliphatic hydrocarbon group, a divalent alicyclic hydrocarbon group, or a divalent aromatic hydrocarbon group) and a (meth)acryloyl group at both ends, a bifunctional (meth)acrylate compound, a polyfunctional thiol compound, a photo-radical generator and an organic solvent, and then the bifunctional (meth)acrylate compound contained in an amount of 5% to 50% by mass and the polyfunctional thiol compound is contained in an amount of 0.1% to 10% by mass, relative to the content of the polymer.

A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.

A photolithiographic method for fabricating bank structures with improved non-wetting properties to form well regions on a substrate using a photoresist composition comprising a cresol novolak resin, a photoactive diazonaphthoquinone sulfonic ester of a polyhydroxybenzophenone compound with at least one free hydroxyl group, and a non-ionic urethane polyglycol fluorosurfactant. Inkjet methods can be used to deposit active materials into the well areas. Color filter arrays and optoelectronic devices such as OLED devices can be made by this method.

The present invention relates to a photopolymer composition comprising a photopolymerizable component and a photoinitiator system comprising a chain-substituted cyanine dye. The invention further provides a photopolymer comprising a photopolymer composition according to the invention, a holographic medium comprising a photopolymer according to the invention, the use of a holographic medium according to the invention, and a process for producing a holographic medium by using the photopolymer according to the invention and the exposure of the corresponding holographic medium with the aid of pulsed laser radiation.

A photocurable resin composition according to the present invention contains an anionic-group-containing photosensitive resin comprising a photosensitive urethane resin, a photopolymerization initiator and a thermal curing agent, wherein the photosensitive urethane resin is produced by reacting a raw material mixture containing (A) a polyol having at least an ester bond and also having an unsaturated bond at least in the main chain thereof, (B) a compound having at least one active-hydrogen-containing group and at least one anionic group in the molecule thereof, (C) a polyisocyanate and (D) a compound having at least one active-hydrogen-containing group and an unsaturated bond group in the molecule thereof, and the photosensitive urethane resin has an ester bond and an unsaturated bond in the main chain in the same molecule, wherein at least one of a side chain and a terminal has an anionic group and a side chain has an unsaturated bond group.