A semiconductor device having a copper wiring and an insulating layer provided on the copper wiring, where after storage in air with a humidity of 5% for 168 hours at 150° C., the area of void portion of the copper wiring is 10% or less at the copper wiring surface in contact with the insulating layer. The insulating layer contains at least one polyimide that has (i) a structure derived from 4,4′-oxydiphthalic acid dianhydride and a structure derived from 4,4′-diaminodiphenyl ether; or (ii) a structure derived from 3,3′4,4′-biphenyltetracarboxylic acid dianhydride and a structure derived from 4,4′-diaminodiphenyl ether; or (iii) a structure derived from 4,4′-oxydiphthalic acid dianhydride and a structure derived from 2,2′-dimethyl-4,4′-diaminobiphenyl.

An onium salt having a partial structure of formula (A) is provided wherein R.sup.a1 and R.sup.a2 are hydrogen or a C.sub.1-C.sub.10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH.sub.2— may be replaced by —O— or —C(═O)—, both R.sup.a1 and R.sup.a2 are not hydrogen at the same time, R.sup.a1 and R.sup.a2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

##STR00001##

An onium salt having a partial structure of formula (A) is provided wherein R.sup.a1 and R.sup.a2 are hydrogen or a C.sub.1-C.sub.10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH.sub.2— may be replaced by —O— or —C(═O)—, both R.sup.a1 and R.sup.a2 are not hydrogen at the same time, R.sup.a1 and R.sup.a2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

##STR00001##

A photosensitive resin composition comprising (A) a polyimide precursor having a polymerizable unsaturated bond; (B) a polymerizable monomer; (C) a photopolymerization initiator; and (D) an ultraviolet absorber.

A photosensitive resin composition comprising (A) a polyimide precursor having a polymerizable unsaturated bond; (B) a polymerizable monomer; (C) a photopolymerization initiator; and (D) an ultraviolet absorber.

An organic EL display device having excellent light-emitting reliability while it has pixel division layer (8) and/or planarization layer (4) having excellent optical properties is provided. An organic EL display device comprising first electrode (10), the pixel division layer (8), light emitting pixel (9), second electrode (5), the planarization layer (4), and substrate (6) wherein the pixel division layer (8) and/or the planarization layer (4) contains a yellow pigment having the benzimidazolone structure represented by the structural formula (1): ##STR00001##

An organic EL display device having excellent light-emitting reliability while it has pixel division layer (8) and/or planarization layer (4) having excellent optical properties is provided. An organic EL display device comprising first electrode (10), the pixel division layer (8), light emitting pixel (9), second electrode (5), the planarization layer (4), and substrate (6) wherein the pixel division layer (8) and/or the planarization layer (4) contains a yellow pigment having the benzimidazolone structure represented by the structural formula (1): ##STR00001##

A photosensitive dry film and uses of the same are provided. The photosensitive dry film comprises a support layer and a photosensitive resin layer disposed on the support layer, wherein the support layer has a first surface and a second surface opposite the first surface, and the first surface is in contact with the photosensitive resin layer and has a non-smooth structure.

A photosensitive dry film and uses of the same are provided. The photosensitive dry film comprises a support layer and a photosensitive resin layer disposed on the support layer, wherein the support layer has a first surface and a second surface opposite the first surface, and the first surface is in contact with the photosensitive resin layer and has a non-smooth structure.

Provided are a resin having a graft structure represented by Formula (1); a curable composition and a cured product of the resin; a color filter including the cured product; a solid-state imaging element or an image display device including the color filter; and a novel polymer compound. In Formula (1), P.sup.1 represents a polymer chain, X.sup.1 represents an alkylene group having a length of 3 or more atoms, L represents a single bond or a divalent linking group, and * represents a connection position with a structure including a main chain.

P.sup.1—S—X.sup.1-L-*  (1)