G03F7/2016

SYSTEM AND METHOD FOR MITIGATING TRAILING EDGE VOIDS IN FLEXO PRINTING

Methods, systems, and non-transitory memory media embodying computer readable instructions for minimizing voids in front of a trailing edge of a solid rendition or linework print region printed using a photocurable flexographic printing plate having a printing surface corresponding to information in an image file. At least one solid rendition or linework image region corresponding to the solid rendition or linework print region has a pattern of on and off single pixels that correspond to openings formed by an imager in a mask layer of the plate. Micro-screen openings in an edge region of the solid rendition or linework mask region are imaged with a different size than micro-screen openings in a center region of the solid rendition or linework mask region.

Method for producing flexible printed wiring board

A method for producing a flexible printed wiring board using a photoresist includes placing the photoresist, including a first region and a second region, on a substrate, placing a first photomask including a first light-transmitting portion such that the first light-transmitting portion faces the first region to expose the photoresist through the first light-transmitting portion, and placing a second photomask including a second light-transmitting portion such that the second light-transmitting portion faces the second region to expose the photoresist through the second light-transmitting portion. The first region is adjacent to the second region such that an edge portion of the first region overlaps an edge portion of the second region. The first light-transmitting portion has a linear shape including a first tip having a tapered shape.

Imprint method for fabrication of low density nanopore membrane
12585192 · 2026-03-24 · ·

A method of manufacturing a synthetic nanopore device for DNA sequencing disclosed herein includes providing a base template, forming a guiding layer on top of the base template, and forming a photoresist layer on top of the guiding layer. The photoresist layer is patterned, and the guiding layer is etched for form a guiding pattern. The photoresist layer is removed to form a guiding template and a self-assembled monolayer is deposited on at least a portion of the guiding template to form a patterned template. The patterned template is exposed to one or more etch processes to form a nanoimprint lithography template. A membrane is imprinted with the nanoimprint lithography template to form an array of nanopores in the membrane.

Composition for forming organic film, patterning process, and compound

A composition for forming an organic film, including: a compound represented by the following general formula (1); and an organic solvent, wherein in the general formula (1), X represents any one group of X1 to X3 represented by the following general formulae (2), (3), and (5), and two or more kinds of X are optionally used in combination, wherein in the general formula (3), W represents a carbon atom or a nitrogen atom; n1 represents 0 or 1; n2 represents an integer of 1 to 3; and R.sub.1 independently represents any one of groups represented by the following general formula (4), and wherein in the general formula (5), R.sub.2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and R.sub.3 represents any one of the following groups. ##STR00001## ##STR00002##