Patent classifications
G03F7/3057
Treatment device and treatment method
Provided are a treatment device and a treatment method capable of easily reusing a used rinsing liquid, and reducing the amount of waste liquid. A treatment device has: a developing portion which is provided with a developing unit which performs development by removing a non-exposed portion of a flexographic printing plate precursor after imagewise exposure using a developer containing a washing solution; a rinsing portion which is provided with a rinsing liquid supply portion which supplies a rinsing liquid containing substantially only water as a component to at least a surface of the flexographic printing plate precursor after development, from which the non-exposed portion of the flexographic printing plate precursor has been removed; a developer storage portion which has a developer storage tank which stores the developer which is used for the development in the developing portion; a first liquid feeding path through which the developer after development is fed to the developer storage tank of the developer storage portion; and a second liquid feeding path different from the first liquid feeding path, through which the rinsing liquid supplied by the rinsing portion is fed to the developer storage tank of the developer storage portion, and the developing portion repeatedly uses the developer stored in the developer storage tank of the developer storage portion to perform the development.
Manufacturing method for cured substance, manufacturing method for laminate, and manufacturing method for semiconductor device, and treatment liquid
There is provided a manufacturing method for a cured substance, which makes it possible to obtain a cured substance having excellent breaking elongation, a manufacturing method for a laminate, including the manufacturing method for a cured substance, a manufacturing method for a semiconductor device, including the manufacturing method for a cured substance or the manufacturing method for a laminate, and there is provided a treatment liquid that is used in the manufacturing method for a cured substance. The manufacturing method for a cured substance includes a film forming step of applying a resin composition containing a precursor of a cyclization resin onto a base material to form a film, a treatment step of bringing a treatment liquid into contact with the film, and a heating step of heating the film after the treatment step, in which the treatment liquid contains at least one compound selected from the group consisting of a basic compound having an amide group and a base generator having an amide group.
PROCESS AND APPARATUS FOR FEEDING A FLEXOGRAPHIC PRINTING PLATE PROCESSOR
A plate processing line and methods for producing a flexographic printing plate. An imaging station applies image information to a first plate. A first exposure station cures the first plate. One or more of water, a solvent, and/or a thermal process is further applied to the first plate. A drying station or an after-exposure station is configured to expose the plate to further radiation. A feeding station is configured to feed the first plate cured by the exposure station and a second plate cured by a second exposure station to the processing station. A transportation cart may transport the plate between the first or second exposure stations and the processing station.
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
The inventive concept provides a substrate treating method. The substrate treating method includes pre-treating a substrate by cleaning the substrate; etching the substrate by supplying an etchant and heating a substrate supplied with the etchant; and post-treating the substrate after the etching the substrate, and wherein the pre-treating the substrate, the etching the substrate, and the post-treating the substrate are each performed in different chambers, a substrate on which the pre-treating the substrate is completed is transferred in a dry state to a chamber at which the etching the substrate is performed, and a substrate on which the etching the substrate is completed is transferred in a wetted state with a liquid to a chamber at which the post-treating the substrate is performed.
COATING AND DEVELOPING METHOD AND COATING AND DEVELOPING APPARATUS
A coating and developing method includes: a step that applies a resist containing a metal to a front surface of a substrate to form a resist film, and exposes the resist film; a developing step that supplies a developer to the front surface of the substrate to develop the resist film; and a step that forms, before the developing step, a first protective film on a peripheral part of the substrate on which the resist film is not formed, so as to prevent the developer from coming into contact with the peripheral part of the substrate, wherein the first protective film is formed at least on a peripheral end surface and a peripheral portion of a rear surface of the substrate in the peripheral part of the substrate.
AQUEOUS PROCESSING METHOD FOR FLEXOGRAPHIC PRINTING PLATES
A method for processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous processing solution including a first dispersing agent while the photosensitive flexographic printing plate is being subjected to mechanical cleaning. Used aqueous processing solution containing the removed photopolymer is returned back into a processing solution tank. A secondary processing unit is used to wash the developed relief image with secondary aqueous processing solution including a second dispersing agent to remove debris from the developed relief image. Used secondary aqueous processing solution containing the removed photopolymer is directed into the processing solution tank. A portion of the aqueous processing solution from the processing solution tank is removed to keep a volume of aqueous processing solution in the processing solution tank below a predefined maximum volume.
Coating and developing method and coating and developing apparatus
A coating and developing method includes: a step that applies a resist containing a metal to a front surface of a substrate to form a resist film, and exposes the resist film; a developing step that supplies a developer to the front surface of the substrate to develop the resist film; and a step that forms, before the developing step, a first protective film on a peripheral part of the substrate on which the resist film is not formed, so as to prevent the developer from coming into contact with the peripheral part of the substrate, wherein the first protective film is formed at least on a peripheral end surface and a peripheral portion of a rear surface of the substrate in the peripheral part of the substrate.
DEVELOPING APPARATUS AND DEVELOPING METHOD THEREOF
The present disclosure provides a developing apparatus, which includes a developing mechanism and a heating mechanism, and the heating mechanism includes a plurality of heating units. The plurality of heating units are provided above or below the developing mechanism, and each heating unit of the plurality of heating units is disposed independently.
CHEMICAL LIQUID, CHEMICAL LIQUID STORAGE BODY, MANUFACTURING METHOD OF CHEMICAL LIQUID, AND MANUFACTURING METHOD OF CHEMICAL LIQUID STORAGE BODY
An object of the present invention is to provide a chemical liquid which has excellent defect inhibition performance and hardly breaks a transfer pipe line that a device for manufacturing the chemical liquid includes at the time of manufacturing the chemical liquid. Another object of the present invention is to provide a chemical liquid storage body, a manufacturing method of a chemical liquid, and a manufacturing method of a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent and an ion of at least one kind of atom selected from the group consisting of an Fe atom, a Cr atom, a Ni atom, and a Pb atom, in which in a case where the chemical liquid contains one kind of the ion, a content of the metal ion is 0.1 to 100 mass ppt, in a case where the chemical liquid contains two or more kinds of the ions, a content of each of the metal ions is 0.1 to 100 mass ppt, and a charge potential is equal to or lower than 100 mV.
REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATES
A processing system includes a processing unit that processes the flexographic printing plate with a processing liquid. The processing unit includes a hollow tube having a length extending across a cross-track dimension of the flexographic printing plate. A processing liquid supply system supplies pressurized processing liquid into an interior of the hollow tube. A plurality of pressure-compensating emitters is distributed along the length of the tube which deliver processing liquid onto a surface of the flexographic printing plate, wherein processing liquid flows from the interior of the hollow tube through the pressure-compensating emitters at a controlled flow rate.