A method for processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous processing solution including a first dispersing agent while the photosensitive flexographic printing plate is being subjected to mechanical cleaning. Used aqueous processing solution containing the removed photopolymer is returned back into a processing solution tank. A secondary processing unit is used to wash the developed relief image with secondary aqueous processing solution including a second dispersing agent to remove debris from the developed relief image. Used secondary aqueous processing solution containing the removed photopolymer is directed into the processing solution tank. A portion of the aqueous processing solution from the processing solution tank is removed to keep a volume of aqueous processing solution in the processing solution tank below a predefined maximum volume.

There are provided a washout processor and a washing method that suppress generation of a brush mark and that suppress generation of development unevenness. There is provided a washout processor that develops an imagewise exposed flexographic printing plate precursor using a washing solution with a developing brush, the washout processor including a development unit that performs development using the washing solution by simultaneously performing circular movement and linear reciprocation of the developing brush on the flexographic printing plate precursor, in which the circular movement and the linear reciprocation of the developing brush by the development unit satisfy at least one of the following condition (a) or (b). Condition (a) In a case where a stop time in a case of switching between directions of the linear reciprocation of the developing brush is t seconds and a rotation speed of the circular movement of the developing brush is R times per second, t<R is satisfied. Condition (b) In a case where the number of times of linear reciprocation per unit time in the linear reciprocation of the developing brush is f times per second and the rotation speed of the circular movement of the developing brush is R times per second, f<R is satisfied.

An apparatus for treating a relief precursor having a back side and a relief side. The apparatus includes a housing, a treating means for treating the relief precursor with at least one liquid, a removal means for removing debris and/or liquid from the relief precursor, the removal means arranged downstream of the treating means, and a conveying mechanism configured for transporting the relief precursor in a transport direction through the housing. The removal means includes a liquid removal and guidance body mounted for removing liquid from the back side of the relief precursor. The conveying mechanism is configured for pulling the relief precursor over and against said liquid removal and guidance body whilst the relief precursor is moved in the transport direction, such that in operation liquid is removed from the back side.

A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light. The photo-sensitive layer is baked. The photo-sensitive layer is developed. Humidity is introduced in at least one of: the applying, the baking, or the developing.

A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light. The photo-sensitive layer is baked. The photo-sensitive layer is developed. Humidity is introduced in at least one of: the applying, the baking, or the developing.

A method and apparatus for processing a lithographic printing plate includes development with an alkaline solution and gumming with a first gum solution and subsequently with a second gum solution, wherein both gum solutions are provided in a cascade configuration whereby the second gum solution overflows into the first gum solution.

A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light. The photo-sensitive layer is baked. The photo-sensitive layer is developed. Humidity is introduced in at least one of: the applying, the baking, or the developing.

A method for processing a heat-sensitive lithographic printing plate material includes the steps of first treating the plate material with an alkaline development solution followed by treating the plate material with an aqueous solution containing a buffer.

A method for processing a lithographic printing plate includes development with an alkaline solution and gumming with a first gum solution and subsequently with a second gum solution, wherein both gum solutions are provided in a cascade configuration in which the second gum solution overflows into the first gum solution and wherein an alkaline silicate-free developer is used.

An apparatus for processing a lithographic printing plate material includes a development unit and a closed loop recirculation system including at least one inlet opening for removing a development solution and at least one inlet opening for injecting the development solution.