G03F7/70525

METHOD, DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
20230028288 · 2023-01-26 ·

A method for operating a magnetic actuator comprises: ascertaining a mathematical model of the actuator which describes a change in a motor constant of the actuator as a function of the electrical drive power supplied; driving the actuator with a first electrical drive power as a function of a predetermined target force; ascertaining the change in the motor constant of the actuator on account of driving the actuator with the first electrical drive power via the mathematical model; ascertaining a correction value for the first electrical drive power as a function of the ascertained change in the motor constant; and driving the actuator with a second electrical drive power as a function of the first electrical drive power and the ascertained correction value.

PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
20230029254 · 2023-01-26 ·

A processing apparatus includes a first structure supported by a vibration reduction mechanism, a drive mechanism supported by the first structure and configured to drive an object to be processed, a second structure supported by the first structure and facing the object, an actuator configured to apply a force to the first structure, a sensor configured to detect a vibration of the second structure, and a controller configured to feedforward-control the actuator based on feedforward control information so as to reduce vibrations of the first structure and the second structure. The feedforward control information includes first control information determined in advance based on an output from the sensor.

METHOD FOR THERMO-MECHANICAL CONTROL OF A HEAT SENSITIVE ELEMENT AND DEVICE FOR USE IN A LITHOGRAPHIC PRODUCTION PROCESS

The invention provides a method for thermo-mechanical control of a heat sensitive element (Ml) subject to a heat load, comprising: -providing a non-linear thermo-mechanical model of the heat sensitive element describing a dynamical relationship between characteristics of the heat load and deformation of the heat sensitive element; -calculating a control signal on the basis of an optimization calculation of the non-linear model, -providing an actuation signal to a heater (HE), wherein the actuation signal is at least partially based on the control signal, -heating the heat sensitive element by the heater on the basis of the actuation signal.

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND ASSOCIATED APPARATUSES
20230221655 · 2023-07-13 · ·

Disclosed is a method for modeling measurement data over a substrate area and associated apparatus. The method comprises obtaining measurement data relating to a first layout; modeling a second model based on said first layout; evaluating the second model on a second layout, the second layout being more dense than said first layout; and fitting a first model to this second model according to the second layout.

Method of Determining the Initial Contact Point for Partial Fields and Method of Shaping a Surface
20230014261 · 2023-01-19 ·

A system and method for shaping a film on a partial field including determining an initial contact point. Receiving information about: a partial field of a substrate; and an edge of a patternable area of the substrate. Determining a chord that connects intersection vertices of the partial field and the edge. Determining coordinates of a bisecting line, wherein the bisecting line bisects the chord, and the bisecting line is orthogonal to the chord. Determining an initial contact point range on the bisecting line in which a template and formable material on the substrate contact each other. Contacting the formable material in the partial field on the substrate with the template at an initial contact point within the initial contact point range.

PROCESS RECIPE, METHOD AND SYSTEM FOR GENERATING SAME, AND SEMICONDUCTOR MANUFACTURING METHOD
20230221702 · 2023-07-13 ·

Embodiments of the present disclosure relate to the field of semiconductors, and provide a process recipe, a method and a system for generating same, and a semiconductor manufacturing method. The method for generating a diffraction-based process recipe includes: providing a basic process recipe, the basic process recipe is used to form an initial alignment pattern; and performing a feedback correction step for at least one time to adjust the basic process recipe and obtain an actual process recipe, which each time includes: obtaining a first pattern and a second pattern based on the basic process recipe prior to a current feedback correction step, the first pattern is the initial alignment pattern that is developed, the second pattern is the initial alignment pattern that is etched; and adjusting the basic process recipe prior to the current feedback correction step based on a difference between the first pattern and the second pattern.

Methods and apparatus for monitoring a manufacturing process, inspection apparatus, lithographic system, device manufacturing method

Multilayered product structures are formed on substrates by a combination of patterning steps, physical processing steps and chemical processing steps. An inspection apparatus illuminates a plurality of target structures and captures pupil images representing the angular distribution of radiation scattered by each target structure. The target structures have the same design but are formed at different locations on a substrate and/or on different substrates. Based on a comparison of the images the inspection apparatus infers the presence of process-induced stack variations between the different locations. In one application, the inspection apparatus separately measures overlay performance of the manufacturing process based on dark-field images, combined with previously determined calibration information. The calibration is adjusted for each target, depending on the stack variations inferred from the pupil images.

Advanced process control system
11551954 · 2023-01-10 · ·

An advanced process control system including a first process tool, a second process tool, and a measurement tool is provided. The first processing tool is configured to process each of a plurality of wafers by one of a plurality of first masks, and provide a first process timing data. The second processing tool is configured to process the wafer processing by the first process tool by one of a plurality of second masks to provide a plurality of works. The second process tool provides a measurement trigger signal according to the first process timing data. The measuring tool is configured to determine whether to perform a measuring operation on each works in response to the measurement trigger signal, and correspondingly provide a measurement result.

System and method for dynamically controlling temperature of thermostatic reticles

A system and method for dynamically controlling a temperature of a thermostatic reticle. A thermostatic reticle assembly that includes a reticle, temperature sensors located in proximity to the reticle, and one or more heating elements. A thermostat component that is in communication with the temperature sensors and the heating element monitors the current temperature of the reticle relative to a steady-state temperature. In response to the current temperature of the reticle being lower than the steady-state temperature, the heating elements are activated to preheat the reticle to the steady-state temperature.

Methods of modelling systems or performing predictive maintenance of lithographic systems

Predictive maintenance methods and systems, including a method of applying transfer entropy techniques to find a causal link between parameters; a method of applying quality weighting to context data based on a priori knowledge of the accuracy of the context data; a method of detecting a maintenance action from parameter data by detecting a step and a process capability improvement; a method of managing unattended alerts by considering cost/benefit of attending to one or more alerts over time and assigning alert expiry time and/or ranking the alerts accordingly; a method of displaying components of a complex system in a functional way enabling improvements in system diagnostics; a method of determining the time of an event indicator in time series parameter data; a method of classifying an event associated with a fault condition occurring within a system; and a method of determining whether an event recorded in parameter data is attributable to an external factor.