A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.

An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

The invention provides a vibration isolation device configured to support a structure, comprising: an air mount having a base part mounted on a reference structure and a vibration isolated part, and an inverted pendulum device, wherein a lower end of the inverted pendulum device is mounted on the vibration isolated part of the air mount and an upper end of the inverted pendulum device support the structure to be supported, wherein the vibration isolation device comprises a stiffness adjustment device configured to adjust the stiffness of the inverted pendulum device.

In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.

A substrate stage apparatus includes: a fine movement stage movable along the XY plane; an XY two-dimensional stage apparatus (an X beam and an X carriage) which guides the fine movement stage in a direction parallel to the XY plane; a plurality of weight-canceling devices movable in the direction parallel to the XY plane synchronously with the fine movement stage and also working together to support the weight of the fine movement stage; a first Y step guide provided at the +Y side of the X beam in a direction parallel to the Y-axis, that guides a part of the plurality of weight-canceling devices moving in a direction parallel to the X-axis; and a second Y step guide provided at the other side of the X beam in the direction parallel to the Y-axis, that guides the other part of the plurality of weight-canceling devices moving parallel to the X-axis.

The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises:

a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions,

a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction,

wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.

A displacement device including a stage and a stator, wherein the stator is shaped to provide a working region and the stator includes: a plurality of magnet blocks of the first kind, each magnet block of the first kind including a plurality of first magnets generally linearly elongated in the X-direction, and a plurality of magnet blocks of the second kind, each magnet block of the second kind including a plurality of second magnets generally linearly elongated in the Y-direction. The stage is movably arranged next to the stator in the Z-direction, and the stage includes: a coil block of the first kind, each coil block of the first kind including a plurality of electric conductors generally linearly elongated in the X-direction; and a coil block of the second kind, each coil block of the second kind including a plurality of electric conductors generally linearly elongated in the Y-direction.

A substrate stage apparatus includes: a fine movement stage movable along the XY plane; an XY two-dimensional stage apparatus (an X beam and an X carriage) which guides the fine movement stage in a direction parallel to the XY plane; a plurality of weight-canceling devices movable in the direction parallel to the XY plane synchronously with the fine movement stage and also working together to support the weight of the fine movement stage; a first Y step guide provided at the +Y side of the X beam in a direction parallel to the Y-axis, that guides a part of the plurality of weight-canceling devices moving in a direction parallel to the X-axis; and a second Y step guide provided at the other side of the X beam in the direction parallel to the Y-axis, that guides the other part of the plurality of weight-canceling devices moving parallel to the X-axis.

In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.