Patent classifications
G03F7/70816
Movable body apparatus, exposure apparatus, and device manufacturing method
A stage device is equipped with a surface plate and a wafer stage which is mounted on the surface plate and has an exhausting port formed on a surface facing the surface plate. In a state where the wafer stage lands on the surface plate, an air chamber is formed in between the surface plate and the wafer stage. Pressurized gas blows out from the exhausting port provided at a stage main section into the air chamber, and self-weight of the wafer stage is cancelled by an inner pressure of the air chamber. This allows to the wafer stage which has stopped on the surface plate to be moved manually.
Adjustable magnetic buoyancy gravity compensator
A magnetic gravity compensator comprises a stator (1), a rotor (2), a base (4) and an adjustment mechanism (6). The stator (1) is disposed on the base (4), and the rotor (2) is levitated with respect to the stator (1). The stator (1) comprises a central cylindrical magnet (11) that is fixed to the base (4) by the adjustment mechanism (6) and consists of at least two arc magnets (111). The adjustment mechanism (6) has a first end fixed to the base (4) and a second end securely connected to the at least two arc magnets (111). The adjustment mechanism (6) is configured to drive the at least two arc magnets (111) to synchronously move radially with respect to a central axis of the central cylindrical magnet (11) so as to change a magnetic circuit between the central cylindrical magnet (11) and the rotor (2), and thereby adjust a magnetic levitation force between the stator (1) and the rotor (2).
Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.
Bearing assembly for a lithography system, and lithography system
The disclosure relates to a bearing assembly for a lithography system, having an optical element, a base, and a bearing device that moveably supports the optical element relative to the base. The bearing device has at least one torsion decoupling element that reduces a transmission of torsional moments between the optical element and the base. The torsion decoupling element has at least two leaf springs which have respective opposing narrow sides and which bring about torsional moments about an axis perpendicular to the narrow sides. The at least two leaf springs are also positioned at an angle to one another and are coupled to one another in such a way that a force flow through the torsion decoupling element simultaneously flows through the at least two leaf springs.
STAGE SYSTEM, LITHOGRAPHIC APPARATUS, METHOD FOR POSITIONING AND DEVICE MANUFACTURING METHOD
A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.
POSITIONING DEVICE FOR POSITIONING A MOVABLE ELEMENT
The positioning device for positioning a movable element includes a base including a flat guide surface parallel to first and second directions, and a Gantry beam in the second direction spaced from the guide surface. A Gantry drive for moving the beam relative to the base in the first direction, includes two first linear axes extending in the first direction, each including a linear drive. A first air bearing device includes first and second air bearing arrangements including first and second horizontal air bearings for guiding first and second beam ends on guide surface first and second sections, respectively, a third air bearing arrangement on a beam central section including at least third and fourth horizontal air bearings for guiding the beam central section on a guide surface third section and including at least one lateral air bearing for guiding the beam on a guide beam flat side surface.
Exposure apparatus and prevention method and system for image offset thereof
Provided are an exposure apparatus and a prevention method and system for image offset of the exposure apparatus. The dust cover which is made of transparent material and arranged and arranged at one end of the bearing connected to the lifter enables to check whether the bearing is abraded via manual vision or machine vision, thereby enhancing the yield of the glass substrates achieved by photoetching in the photo process and thus improving the production efficiency of the photo process.
STAGE SYSTEM, LITHOGRAPHIC APPARATUS, METHOD FOR POSITIONING AND DEVICE MANUFACTURING METHOD
A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
Actuator device for use in a positioning system as well as such positioning system
The invention relates to an actuator device for use in a positioning system, wherein the actuator device is linearly movable within a plane with respect to a supporting structure of the positioning system as well as such a positioning system implementing such an actuator device. In an example of the actuator device according to the invention, it comprises a carrier having a longitudinal and a transversal dimension; and multiple groups of coil assemblies mounted in the carrier, each group of coil assemblies being structured to orientate the carrier in at least one degree of freedom. The single design actuator device according to the invention has limited constructional dimensions and allows high accuracy as to motion and position in multiple degrees of freedom.
Vibration-assisted positioning stage
A vibration-assisted positioning stage comprising a stage, a roller bearing, an compliant joint interconnecting the roller bearing to the stage such that the compliant joint is sufficiently compliant in a direction of movement to permit reliable alignment of the stage and further permit dithering, and a dithering force actuator applying a dithering force directly to the roller bearing to permit the dithering of the stage. The dithering forces can be applied out of phase to minimize vibration of the stage. Furthermore, the controller of the stage can be employed to suppress any remnant vibrations of the stage due to dithering. A supervisory control system can intelligently adapt the parameters of the dithering signal to optimize the performance of the stage as friction changes.