An optical system can include an optical arrangement supported by an optical chassis. A flexure arrangement can support the optical chassis relative to a separate structure to maintain a calibrated distance between optical components of the optical arrangement.

A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method including: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; and determining the input based on the parameter data and on the lens model data.

Provided is a support unit including a support plate on which the substrate is placed, and a support protrusion provided on the support plate and separating the substrate from the support plate, wherein the support plate includes a first protrusion protruding from an upper surface of the support plate, wherein the first protrusion is provided in a support region provided by the support protrusion.

A weight compensating device includes a stator and a translator. The translator is movable relative to the stator along a movement axis. The translator includes a first permanent magnet arrangement with an axial magnetization. The stator includes a second permanent magnet arrangement radially surrounding the first permanent magnet arrangement. The stator includes a third permanent magnet arrangement that is coaxially below the first permanent magnet arrangement and that has an axial magnetization aligned in inverse fashion with respect to the axial magnetization of the first permanent magnet arrangement. The stator includes a magnetic body arrangement that is coaxially above the first permanent magnet arrangement. The first permanent magnet arrangement, the second permanent magnet arrangement, the third permanent magnet arrangement and the magnetic body arrangement form a magnetic unit and, in interaction with one another, form a compensating force that counteracts the weight acting on the translator.

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

An optical element driving mechanism is provided. The optical element driving mechanism includes a first holder, a second holder, a plate, a biasing assembly, and an electromagnetic driving assembly. The first holder holds a first optical element with a first optical axis. The second holder holds a second optical element with a second optical axis. The plate is disposed below the first holder and the second holder. The biasing assembly forces the first holder to move relative to the plate on a plane substantially perpendicular to the first optical axis, and includes a biasing element, wherein when a driving signal is applied to the biasing element, a length of the biasing element is changed. The electromagnetic driving assembly forces the second holder to move relative to the plate and comprising a first magnetic element and a coil.

An optical system comprises at least one mirror having a mirror body and a mirror surface, and at least one actuator device coupled to the mirror body and serving for deforming the mirror surface. The actuator device comprises at least one electrostrictive actuator element for generating a mechanical stress in the mirror body for deforming the mirror surface depending on an electrical drive voltage, and at least one electrostrictive sensor element for outputting a sensor signal depending on a deformation of the sensor element. The at least one sensor element is arranged directly adjacent to the actuator element and/or is arranged in such a way that it is configured at least partly for transferring the mechanical stress generated by the actuator element to the mirror body.

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

An assembly, for example in a microlithographic projection exposure apparatus, comprises an optical element and a joint arrangement for mechanically bearing the optical element. The joint arrangement comprises at least one connecting element secured on the optical element. The mass of the connecting element is distributed over its length so that the moment of inertia of the connecting element is increased in comparison with a connecting element of identical mass and length in which the mass is distributed uniformly over the length.