An actuator for an optic mount in a vacuum environment includes a bellows around an actuator compartment. The bellows provides a seal around the actuator. A filter assembly is positioned between the actuator compartment and an interior of a vacuum chamber. The filter assembly includes a first particle filter, a second particle filter, and a purifier medium between the first particle filter and the second particle filter. Vacuum conditions in the actuator compartment can be achieved with a pump for the vacuum chamber, but particles and contaminants from the actuator or actuator compartment are captured by the filter assembly.

An exposure device may include an exposure head that may radiate an exposure beam onto a substrate on a stage, a support that may be provided on the stage to support the exposure head, a chamber that may accommodate the stage, the exposure head, and the support. The exposure device may include first protrusions that may be disposed on an outer circumference of the support adjacent to an inner wall of the chamber, and second protrusions that may be disposed on the inner wall of the chamber surrounding the outer circumference of the support. The first and second protrusions may overlap each other in a plan view.

A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.

A reticle stage for holding a reticle assembly is provided. The reticle assembly has a reticle and a pellicle covering the reticle. The reticle stage includes a reticle stage base, a reticle holder disposed on the reticle stage base and for holding the reticle assembly over the reticle stage base, and an electrostatic generator coupled to the reticle assembly. The electrostatic generator is configured to generate static electricity to the reticle assembly. The static electricity alternates between positive electricity and negative electricity.

The present disclosure relates to an extreme ultraviolet lithography, EUVL, device comprising: a reticle comprising a lithographic pattern to be imaged on a target wafer; a light-transmissive pellicle membrane mounted in front of, and parallel to, the reticle, wherein the pellicle membrane scatters transmitted light along a scattering axis; and an extreme ultraviolet, EUV, illumination system configured to illuminate the reticle through the pellicle membrane, wherein an illumination distribution provided by the EUV illumination system is asymmetric as seen in a source-pupil plane of the EUV illumination system; wherein light reflected by the reticle and then transmitted through the pellicle membrane comprises a non-scattered fraction and a scattered fraction formed by light scattered by the pellicle membrane; the EUVL device further comprising: an imaging system having an acceptance cone configured to capture a portion of the light reflected by the reticle and then transmitted through the pellicle membrane.

An exposure device may include an exposure head that may radiate an exposure beam onto a substrate on a stage, a support that may be provided on the stage to support the exposure head, a chamber that may accommodate the stage, the exposure head, and the support. The exposure device may include first protrusions that may be disposed on an outer circumference of the support adjacent to an inner wall of the chamber, and second protrusions that may be disposed on the inner wall of the chamber surrounding the outer circumference of the support. The first and second protrusions may overlap each other in a plan view.

An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device (20) arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element (21) having a first fluid channel (215) arranged therein, the first shield element having a first surface (213) and a second surface (214), the first surface being arranged closer to the radiative element than the second surface; and a second shield element (22) having a second fluid channel (225) arranged therein, the second shield element having a third surface (223) and a fourth surface (224), the third surface being arranged closer to the radiative element than the fourth surface. The first shield element is arranged closer to the radiative element than the second shield element and the second shield element is arranged closer to the heat-sensitive device than the first shield element, the first shield element and the second shield element spaced apart from each other and the second surface and the third surface opposing each other.

An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device (20) arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element (21) having a first fluid channel (215) arranged therein, the first shield element having a first surface (213) and a second surface (214), the first surface being arranged closer to the radiative element than the second surface; and a second shield element (22) having a second fluid channel (225) arranged therein, the second shield element having a third surface (223) and a fourth surface (224), the third surface being arranged closer to the radiative element than the fourth surface. The first shield element is arranged closer to the radiative element than the second shield element and the second shield element is arranged closer to the heat-sensitive device than the first shield element, the first shield element and the second shield element spaced apart from each other and the second surface and the third surface opposing each other.

A component for a projection exposure apparatus includes a printed circuit board arranged in an encapsulated housing and having electronic component parts, and a heat conducting structure for dissipating heat from the electronic component parts to an outer side of the housing.

A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.