In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

A liquid immersion exposure apparatus has: a projection system with an optical element; a substrate stage having a holder by which a substrate is held; an immersion area forming member having an opening through which exposure light is projected, a plurality of liquid recovery ports arranged facing downwardly and surrounding the opening, and a plurality of liquid supply ports arranged facing downwardly and between the opening and the liquid recovery ports; and a sensor having a transparent member and a light receiver, with the transparent member being provided at the substrate stage and the light receiver receiving light from the projection system through the transparent member and liquid between the end surface of the optical element and the transparent member.

A component for a lithography tool, the component including a member having a primary surface; a conduit defined within the member and configured to receive a fluid under pressure; a compressible region within the member and located between the conduit and the primary surface; and a deformable region between the compressible region and the conduit, wherein the compressible region and the deformable region are configured to accommodate local deformation of the member resulting from the pressure of the fluid.

A vibration isolation apparatus includes a support unit that elastically supports an object to a mounting surface, a measurement sensor that measures a displacement of the object relative to the mounting surface, a drive unit that drives the object, and a storage unit. The storage unit stores data indicating a relationship between the displacement of the object and information that indicates a non-linear force produced by an elastic element including a support unit and that corresponds to the displacement. The drive unit drives the object in accordance with the displacement of the object and the data.

A vibration-assisted positioning stage comprising a stage, a roller bearing, an compliant joint interconnecting the roller bearing to the stage such that the compliant joint is sufficiently compliant in a direction of movement to permit reliable alignment of the stage and further permit dithering, and a dithering force actuator applying a dithering force directly to the roller bearing to permit the dithering of the stage. The dithering forces can be applied out of phase to minimize vibration of the stage. Furthermore, the controller of the stage can be employed to suppress any remnant vibrations of the stage due to dithering. A supervisory control system can intelligently adapt the parameters of the dithering signal to optimize the performance of the stage as friction changes.

The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.

A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.

A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that includes at least a portion disposed below the first member, that is capable of being opposite to the object and that is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.

A vibration isolation system including a support, a forward actuator and a return device. The support is for supporting the body on a base. The support has a body engaging surface and a base engaging surface. The base engaging surface is arranged to couple to the base. The support couples the body engaging surface to the body in a coupled state. The support uncouples the body engaging surface from the body in an uncoupled state. The forward actuator moves the body and the body engaging surface together relatively to the base in a first direction from a first initial position to an end position in the coupled state. The return device is configured to move the body engaging surface relatively to the body opposite to the first direction from the end position to a second initial position in the uncoupled state.