Patent classifications
G05D7/0635
Gas flow, pressure and BTU/hour analyzer with a smart device
A system monitors gas flow and pressure to a gas appliance in a fluid network comprising an analyzer. The analyzer has a housing defining an inlet, an outlet, and an interior in fluid communication with the inlet and the outlet. At least one sensor is coupled to the analyzer and configured to generate at least one signal related to gas being supplied to the gas appliance. A smart device communicates with the analyzer, wherein the smart device has a user interface and is configured to monitor, store and display data. The smart device can present any or all of a plurality of parameters such as the flow of gas, a capacity of the flow of gas, a temperature, a pressure of the gas and the like to a user based on signals from sensors.
Apparatuses for facilitating relieving pressure in a fluid transportation system
Disclosed is an apparatus for relieving pressure in a fluid transportation system. Further, the apparatus may include an actuator configured to be mounted onto the handle of the flow control member. Further, the apparatus may include a valve sensor configured to be attached to a pressure relieving valve. Further, the apparatus may include an image capturing device configured to capture an image of a pressure gauge. Further, the apparatus may include a processing device communicatively coupled to the actuator, the valve sensor and the image capturing device. Further, the apparatus may include a storage device communicatively coupled to the processing device. Further, the apparatus may include a wireless transceiver communicatively coupled to the processing device. Further, the apparatus may include a touchscreen display device communicatively coupled to the processing device.
SYSTEMS AND METHODS FOR CONTROLLING OPERATIONS OF A FLUID DISTRIBUTION SYSTEM
A first valve of a manifold for a fluid distribution system may regulate a fluid flow to a first fluid handling device (“FHD”). A second valve of the manifold may communicate with a second FHD, a reservoir, or a recirculation line. A target flow condition for the manifold may be determined by a manifold control system (“MCS”) based on a device setting received for the first FHD. The MCS may determine a fluid distribution system operation for obtaining the target flow condition based on the target flow condition, a flowrate of the fluid flow, and an operational state of a supply device. The operation may include the MCS controlling at least one of the supply device, the first valve, and the second valve to change the flowrate. The MCS may continuously operate at least one manifold valve to maintain the target flow condition once exhibited by the manifold.
OXYGEN CONTROL SYSTEM WITH IMPROVED PRESSURE REGULATOR
Described are oxygen control systems that utilize compressed air or oxygen. The oxygen control systems may include a control device having a first inlet that enables the flow of a supply gas from a high pressure gas source at an input pressure into the control device. The control device also includes a second inlet that enables a flow of atmospheric air into the control device and an outlet in fluid communication with the first inlet and the second inlet. The control device also includes a pressure regulator that is operable in a first mode and a second mode. In the first mode, the pressure regulator reduces input pressure of the gas to a first outlet pressure at the outlet, and, in the second mode, the pressure regulator reduces the input pressure of the gas to a second outlet pressure at the outlet that is greater than the first outlet pressure.
FLOW RATE CONTROL DEVICE AND FLOW RATE CONTROL METHOD
A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal E1 output to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.
THERMAL MANAGEMENT SYSTEM FOR A VEHICLE UTILIZING A MULTI-PORT VALVE ASSEMBLY
A thermal management system and method for a vehicle, including: a heat-cold source thermal management circuit; an energy storage system thermal management circuit; a power electronics thermal management circuit; and a multi-port valve assembly coupled to the heat-cold source thermal management circuit, the energy storage system thermal management circuit, and the power electronics thermal management circuit and adapted to, responsive to an operating state of the vehicle, selectively couple and isolate the heat-cold source thermal management circuit, the energy storage system thermal management circuit, and the power electronics thermal management circuit to and from one another.
Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve device
A valve device capable of precisely adjusting a flow rate includes: an operating member for operating a diaphragm and provided movably between a closed position at which diaphragm closes a flow path and an open position at which diaphragm opens the flow path; a main actuator that receives pressure from a supplied drive fluid and moves the operating member to the open position or the closed position; an adjusting actuator for adjusting the position of the operating member positioned in the open position by using a passive element which expands and contracts in response to a given input signal; a position detecting mechanism for detecting the position of the operating member with respect to a valve body; and an origin position determining unit that uses a valve closed state in which the diaphragm contacts to valve seat to determine an origin position of the position detecting mechanism.
Control, integration, and modulation systems and methods for regulating hydraulic fracturing systems when combined with a pressure exchange system
A method for optimizing pressure exchange includes providing a first pressure exchange system comprising an energy recovery device (ERD). A second system supplies high-pressure fluid, energized by a positive displacement pump, to the ERD. A third system supplies low-pressure fluid to the ERD. The first system energizes the low-pressure fluid with the high-pressure fluid to form a high-pressure fracking fluid, which is delivered from the first system to a well-head. A rate of required flow is input into a control system, which determines a rate of flow of the high-pressure fluid, a rate of flow of the low-pressure fluid, and an actual rate of flow of the fracking fluid at the well-head. The control system then adjusts to equilibrium: the rate of flow of the high-pressure fluid based on the actual rate of flow; and the rate of flow of the low-pressure fluid based on the actual rate of flow.
Product dispensing system
A flow sensor includes a fluid chamber configured to receive a fluid. A diaphragm assembly is configured to be displaced whenever the fluid within the fluid chamber is displaced. A transducer assembly is configured to monitor the displacement of the diaphragm assembly and generate a signal based, at least in part, upon the quantity of fluid displaced within the fluid chamber.
GAS SUPPLY AMOUNT MEASUREMENT METHOD AND GAS SUPPLY AMOUNT CONTROL METHOD
A gas supply amount measurement method is performed in a gas supply system including a vaporization section, a control valve provided downstream of the vaporization section, and a supply pressure sensor for measuring the supply pressure between the vaporization section and the control valve. The method comprises: a step of measuring an initial supply pressure by the supply pressure sensor in a state where the control valve is closed; a step of opening the control valve for only a predetermined time; a step of measuring for a plurality of times of the supply pressure in a period of time between a time at which the pressure starts to fall from the initial supply pressure and a time at which a predetermined time has elapsed when the control valve is open for only a predetermined time, and a step of determining the gas supply amount when the control valve is open for only a predetermined time by calculation based on the measured values of the plurality of supply pressures.