A gas pressure within a treatment chamber 2 can be more accurately regulated to a predicted target pressure whereby there can be provided a pressure control apparatus which can easily and speedily regulate the gas pressure for various combination of the treatment chamber 2, a sanction chamber 3 and a valve 4. A required inflow rate (Qi) at which it is necessary for gas to flow into the treatment chamber 2 in order to reach a preset target pressure (Psp) within the treatment chamber is calculated on the basis of the expression of Qi=Qo+(P/t)V and the thus calculated required inflow rate (Qi) is flown into the treatment chamber 2 to control the pressure within the treatment chamber 2 to the required pressure (Psp). In calculation of a current predicted outflow rate (Qo(n)) at which gas is discharged from the treatment chamber on the basis of the expression Qo(n)=P2*f1(P2), using a current pressure (P2) within the suction pump and a known characteristic suction rate (Sp=f1(P2)) of the suction pump under prescribed pressure, the current pressure (P2) within the suction pump is calculated according to the expression P2=P1(Qo(n1)/f2(, P)) from an accurate conductance (Cv(, P)=f2(, P)) calculated by adding the error between the current pressure (P1) actually measured within the treatment chamber and a known specified pressure (P) within the treatment chamber at the characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve to the known characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve, and the current predicted outflow rate Qo(n) at which gas is discharged from the treatment chamber is calculated.

A control system (15) controls a water supply from at least two separate input lines (3i-k) into a sector (1) of a water supply network. The control system (15) is configured to receive input flow information indicative of the water input flow (q.sub.i-k) through each of the input lines (3i-k). The control system (15) is configured to receive input pressure information indicative of the input pressure (p.sub.i) in at least one (3i) of the input lines (3i-k). The control system (15) is configured to receive pressure information indicative of at least one pressure value (p.sub.cri,m,n) determined by a pressure sensor (7m,n) within the sector (1). The control system (15) is configured to control the input pressure (p.sub.i) by controlling at least a pressure regulating system (13i) at an input line (3i) based on the input flow information from all input lines (3i-k) and based on the sector pressure information.

The invention relates to a pressurization unit for use in processing equipment handling high pressure fluid, where the pressurization unit comprises at least one inlet and an outlet, the pressurization unit being adapted to receive a feed fluid at a feed pressure level at the inlet, being adapted to isolate the received feed fluid from the inlet and from the outlet and being adapted to increase the pressure of the fluid to a higher predetermined level and further being adapted to output the fluid through the outlet into the high pressure process while still isolated towards the inlet.

A high integrity protection system includes a flow line including an inlet configured to be connected to a first source of pressure and an outlet configured to be connected to a downstream system. A first subsystem is installed on the flow line between the inlet and the outlet. A second subsystem is installed on the flow line between the inlet and the outlet, and the second subsystem is in a parallel flow configuration in relation to the first subsystem. The system includes a second source of pressure configured to be fluidically connected to the first subsystem and the second subsystem.

An apparatus and method controls an environmental control system to maintain a differential pressure between a room and one or more adjacent areas by (1) determining a differential pressure error based on the differential pressure and a differential pressure set point using a proportional-integral-derivative (PID) controller; (2) increasing an air change per hour set point whenever one or more first parameters are satisfied; (3) decreasing the air change per hour set point whenever one or more second parameters are satisfied; and (4) sending one or more control signals to the environmental control system that maintain the differential pressure between the room and the one or more adjacent areas by adjusting: (a) the leading airflow to be approximately equal to the air flow change set point multiplied by a volume of the room divided by 60, and (b) the tracking airflow to maintain a volume differential set point.

A distribution pump arrangement for a bi-directional hydraulic distribution grid can include a hot conduit control valve in a hot conduit; a first distribution pump having an inlet connected to the hot conduit at a first side of the hot conduit control valve, and an outlet connected to the hot conduit at a second side, opposite the first side, of the hot conduit control valve; a pressure difference determining device arranged beyond the second side of the hot conduit control valve and configured to determine a local pressure difference, ?p, between a local pressure of heat transfer liquid in the hot conduit and a local pressure of heat transfer liquid in the cold conduit; and a controller configured to set the distribution pump arrangement based at least in part on ?p.

A quality of a mechanical connection within an information handling system may be inferred based on pressure. An electronic pressure sensor is disposed between two components operating within the information handling system. The electronic pressure sensor generates an output signal in response to a clamping pressure and/or clamping force between the two components. Performance of a processor operating within the information handling system may be controlled in response to the clamping pressure and/or clamping force. A speed of a cooling fan operating within the information handling system may be controlled in response to the clamping pressure and/or clamping force. Any internal components operating within the information handling system may be controlled in response to the clamping pressure and/or clamping force.

A gas pressure within a treatment chamber 2 can be more accurately regulated to a predicted target pressure whereby there can be provided a pressure control apparatus which can easily and speedily regulate the gas pressure for various combination of the treatment chamber 2, a sanction chamber 3 and a valve 4. A required inflow rate (Qi) at which it is necessary for gas to flow into the treatment chamber 2 in order to reach a preset target pressure (Psp) within the treatment chamber is calculated on the basis of the expression of Qi=Qo+(P/t)V and the thus calculated required inflow rate (Qi) is flown into the treatment chamber 2 to control the pressure within the treatment chamber 2 to the required pressure (Psp). In calculation of a current predicted outflow rate (Qo(n)) at which gas is discharged from the treatment chamber on the basis of the expression Qo(n)=P2*f1(P2), using a current pressure (P2) within the suction pump and a known characteristic suction rate (Sp=f1(P2)) of the suction pump under prescribed pressure, the current pressure (P2) within the suction pump is calculated according to the expression P2=P1(Qo(n1)/f2(, P)) from an accurate conductance (Cv(, P)=f2(, P)) calculated by adding the error between the current pressure (P1) actually measured within the treatment chamber and a known specified pressure (P) within the treatment chamber at the characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve to the known characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve, and the current predicted outflow rate Qo(n) at which gas is discharged from the treatment chamber is calculated.

A spray system includes a fluid source, a sprayer, a pump cylinder, a plunger, a pump motor, first and second inlet and outlet valves, a plurality of valve seals, a seal lubricant reservoir, and gravity fed seal lubricant lines. The pump cylinder is disposed fluidly between the fluid source and the sprayer. The plunger is situated within the pump cylinder and positioned by a displacement rod. The pump motor is configured to drive the displacement rod so as to reciprocate the plunger within the pump cylinder. The valve seals are disposed about the each of the first and second inlet and outlet valves. The lubricant seal lines carry seal lubricant from the reservoir to each of the valve seals.

The present application is directed to a manifold system for low pressure and high pressure fluids. The manifold system may include one or more manifold sub-assemblies that may be assembled together, separated apart and replaced as desired. In oil and gas hydraulic fracturing operations, each manifold sub-assembly includes two or more low pressure fluid lines and two or more high pressure fluid lines for fluidly communicating with hydraulic fracturing pumps. High pressure fluid may exit the manifold system via a single line or multiple lines.